CMP composition of boron surface-modified abrasive and nitro-substituted sulfonic acid and method of use
申请人:Compton Frederick Timothy
公开号:US20070054495A1
公开(公告)日:2007-03-08
A composition and associated method for chemical mechanical planarization (or other polishing) are described. The composition contains a boron surface-modified abrasive, a nitro-substituted sulfonic acid compound, a per-compound oxidizing agent, and water. The composition affords high removal rates for barrier layer materials in metal CMP processes. The composition is particularly useful in conjunction with the associated method for metal CMP applications (e.g., step 2 copper CMP processes).