1-[(4-Methylbenzene-1-sulfonyl)oxy]-1H-pyrrole-2,5-dione | 158500-77-7

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 1-[(4-Methylbenzene-1-sulfonyl)oxy]-1H-pyrrole-2,5-dione
• 英文别名: (2,5-dioxopyrrol-1-yl) 4-methylbenzenesulfonate
• CAS: 158500-77-7
• 化学式: C₁₁H₉NO₅S
• 分子量: 267.26
• InChiKey: YKRBPJSPGKXSEQ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1
• 重原子数：
  18
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.09
• 拓扑面积：
  89.1
• 氢给体数：
  0
• 氢受体数：
  5

文献信息

• On-spot selectively activated hydrophobic slide and preparation thereof
  申请人：——

  公开号：US20020106785A1

  公开（公告）日：2002-08-08

  An on-spot selectively activated hydrophobic slide/microarray. The preparation method relates to a hydrophobic copolymer prepared by blending, grafting or co-polymerization of a hydrophobic material and a compound bearing a functional group protected by a protecting group, wherein the functional group is imide or cyclic amide, and the protecting group is a photo acid group such as a tosyloxy group. The hydrophobic copolymer coated on a substrate is then subjected to selective photolithographical activation so that the slide will have functional active copolymer spots separated by inactive copolymers. The resulting slide is suitable for the preparation of high-density and high-efficiency bio-chip/microarray.

  一种现场选择性激活的疏水性载玻片/微阵列。该制备方法涉及一种疏水性共聚物，其制备方法是将疏水性材料与带有受保护基团保护的官能团的化合物进行混合、接枝或共聚，其中官能团为酰亚胺或环酰胺，保护基团为对甲苯磺酰氧基等光酸基团。然后将涂布在基底上的疏水共聚物进行选择性光刻活化，使载玻片上的功能性活性共聚物点被非活性共聚物隔开。这样制成的载玻片适用于制备高密度、高效率的生物芯片/微阵列。
• PHOTOSENSITIVE RESIN COMPOSITION, POLYMER COMPOUND, METHOD OF FORMING A PATTERN, AND ELECTRONIC DEVICE
  申请人：HIKITA Masanori

  公开号：US20100080963A1

  公开（公告）日：2010-04-01

  A polymer compound is provided which is excellent in heat resistance and insulating property, and a photosensitive resin composition is provided which includes the polymer compound, and may form a cured pattern or a cured film excellent in pattern forming property, resolution, heat resistance and insulating property. Also, a method for forming a cured pattern excellent in pattern forming property, resolution, heat resistance and insulating property using the photosensitive resin composition, and an electronic device having high reliance for a semiconductor device or for a display device are provided. The photosensitive resin composition includes a polymer compound obtained by reacting a monomer represented by Formula (1) and a monomer represented by Formula (2), and a photosensitizing agent.
• HALOGEN-FREE SULPHONIC ACID ESTER AND/OR SULPHINIC ACID ESTER AS FLAME RETARDANT, FLAME RETARDANT SYNERGISTS AND RADICAL GENERATORS IN PLASTICS
  申请人：FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E. V.

  公开号：US20200231783A1

  公开（公告）日：2020-07-23

  The present invention relates to the use of halogen-free sulphonic acid esters and/or sulphinic acid esters as flame retardant and/or flame retardant synergists in plastics. The invention furthermore relates to the use of said compounds as radical generators in plastics, particularly in order to increase the molecular weight of the plastics, to branch and/or cross-link the plastics, to reduce the molecular weight of the plastics, to influence the molecular weight distribution of the plastics and to graft unsaturated monomers to the plastics. The present invention furthermore relates to the use of flame-retardant plastic compositions in the electrical or electronics industry, construction industry, transport industry, preferably automobiles, aircraft, trains and ships, for medical applications, for household appliances, vehicle parts, consumer products, packaging, furniture and textiles.
• US7105340B2
  申请人：——

  公开号：US7105340B2

  公开（公告）日：2006-09-12
• US7118908B2
  申请人：——

  公开号：US7118908B2

  公开（公告）日：2006-10-10