tert-Butyl 2-[4-(diphenylsulphonium)phenoxy]acetate, nonaflate salt | 857285-80-4

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: tert-Butyl 2-[4-(diphenylsulphonium)phenoxy]acetate, nonaflate salt
• 英文别名: [4-[2-[(2-methylpropan-2-yl)oxy]-2-oxoethoxy]phenyl]-diphenylsulfanium;1,1,2,2,3,3,4,4,4-nonafluorobutane-1-sulfonate
• CAS: 857285-80-4
• 化学式: C28H25F9O6S2
• 分子量: 692.6
• InChiKey: QGJXWNMBTQGAFT-UHFFFAOYSA-M

物化性质

• 熔点：
  62-63°C

计算性质

• 辛醇/水分配系数(LogP)：
  7.46
• 重原子数：
  45
• 可旋转键数：
  10
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.32
• 拓扑面积：
  102
• 氢给体数：
  0
• 氢受体数：
  15

文献信息

• Radiation-sensitive resin composition
  申请人：Suzuki Aki

  公开号：US20050158657A1

  公开（公告）日：2005-07-21

  A radiation-sensitive resin composition comprising (A) a photoacid generator such as 2,4,6-trimethylphenyldiphenylsulfonium 2,4-difluorobenzenesulfonate or 2,4,6-trimethylphenyldiphenylsulfonium 4-trifluoromethylbenzenesulfonate and (B) a resin having an acetal structure typified by a poly(p-hydroxystyrene) resin in which a part of hydrogen atoms of phenolic hydroxyl groups have been replaced by 1-ethoxyethyl groups, 1-ethoxyethyl groups and t-butoxycarbonyl groups, or 1-ethoxyethyl groups and t-butyl groups. The resin composition is sensitive to deep ultraviolet rays and charged particles such as electron beams, exhibits excellent resolution performance and pattern shape-forming capability, and suppresses a nano-edge roughness phenomenon to a minimal extent.

  一种辐射敏感树脂组合物，包括(A)光酸发生器，如 2,4,6-三甲基二苯基锍 2,4-二氟苯磺酸盐或 2,4、(B) 具有缩醛结构的树脂，例如聚（对羟基苯乙烯）树脂，其中酚羟基的部分氢原子被 1-乙氧基乙基、1-乙氧基乙基和叔丁氧基羰基或 1-乙氧基乙基和叔丁基取代。这种树脂组合物对深紫外线和带电粒子（如电子束）敏感，具有优异的分辨性能和图案成型能力，并能在最小程度上抑制纳米边缘粗糙度现象。
• COMPOSITIONS AND PROCESSES FOR PHOTOLITHOGRAPHY
  申请人：WANG Deyan

  公开号：US20120264053A1

  公开（公告）日：2012-10-18

  Topcoat layer compositions are provided that are applied above a photoresist composition. The compositions find particular applicability to immersion lithography processing.
• OVERCOAT COMPOSITIONS AND METHODS FOR PHOTOLITHOGRAPHY
  申请人：Rohm and Haas Electronic Materials Korea Ltd.

  公开号：US20160320703A1

  公开（公告）日：2016-11-03

  Topcoat compositions are provided that are suitably applied above a photoresist composition. Preferred topcoat compositions comprise a first polymer that comprises (i) first units comprising a nitrogen-containing moiety that comprises an acid-labile group; and (ii) second units that (1) comprise one or more hydrophobic groups and (2) are distinct from the first units.
• US6899989B2
  申请人：——

  公开号：US6899989B2

  公开（公告）日：2005-05-31
• US7060414B2
  申请人：——

  公开号：US7060414B2

  公开（公告）日：2006-06-13