1,1-Diphenylethyl 2-methylprop-2-enoate | 56958-95-3

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 1,1-Diphenylethyl 2-methylprop-2-enoate
• CAS: 56958-95-3
• 化学式: C₁₈H₁₈O₂
• 分子量: 266.3
• InChiKey: TXLHVCXHFRFNCE-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.5
• 重原子数：
  20
• 可旋转键数：
  5
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.17
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• POSITIVE TYPE RADIATION-SENSITIVE COMPOSITION AND PROCESS FOR PRODUCING PATTERN WITH THE SAME
  申请人：TORAY INDUSTRIES, INC.

  公开号：EP1229390A1

  公开（公告）日：2002-08-07

  The present invention relates to a positive-working radiation-sensitive composition which is characterized in that it contains a compound meeting any of conditions a1) to a3), and b) an acid generator which generates acid by irradiation with radiation; and also to a method for the production of a resist pattern employing same. a1) A compound wherein a carboxyl group is protected by an acid labile group represented by general formula (1) (R1 and R2 are aromatic rings, and R3 represents an alkyl group, a substituted alkyl group, a cycloalkyl group or an aromatic ring. R1 to R3 may be the same or different.) a2) A compound in which an alkali-soluble group is protected by an acid labile group represented by general formula (2) (R4 to R6 are each an alkyl group, a substituted alkyl group, a cycloalkyl group or an aromatic ring, and at least one of R4 to R6 is an aromatic ring with an electron-donating group. R4 to R6 may be the same or different.) a3) A compound in which an alkali-soluble group is protected by an acid labile group a, and either acid labile group a has an alkali-soluble group or acid labile group a has an alkali-soluble group protected by an acid labile group b. With this constitution, it is possible by means of the present invention to obtain a positive-working radiation-sensitive composition of high sensitivity having a resolution which enables sub-quarter micron pattern processing to be carried out.

  本发明涉及一种正向工作的辐射敏感组合物，其特征在于它含有符合 a1) 至 a3) 中任一条件的化合物，以及 b) 一种通过辐射产生酸的酸发生器；本发明还涉及一种使用这种组合物生产抗蚀剂图案的方法。 a1)一种化合物，其中的羧基被通式(1)代表的酸性基团所保护 (R1和R2为芳香环，R3代表烷基、取代烷基、环烷基或芳香环。R1 至 R3 可以相同或不同）。 a2)一种化合物，其中的碱溶性基团被通式（2）所代表的酸性基团所保护 (R4至R6各自为烷基、取代烷基、环烷基或芳香环，且R4至R6中至少有一个为带有电子奉献基团的芳香环。R4 至 R6 可以相同或不同)。 a3)碱溶性基团被酸性基团 a 保护，且酸性基团 a 具有碱溶性基团或酸性基团 a 具有被酸性基团 b 保护的碱溶性基团的化合物。 通过这种结构，本发明可以获得一种高灵敏度的正向工作辐射敏感组合物，其分辨率可以进行四分之一微米以下的图案加工。
• Positive type radiation-sensitive composition and process for processing for producing pattern with the same
  申请人：——

  公开号：US20030003392A1

  公开（公告）日：2003-01-02

  The present invention relates to a positive-working radiation-sensitive composition which is characterized in that it contains a compound meeting any of conditions a1) to a3), and b) an acid generator which generates acid by irradiation with radiation; and also to a method for the production of a resist pattern employing same. a1) A compound wherein a carboxyl group is protected by an acid labile group represented by general formula (1) 1 (R 1 and R 2 are aromatic rings, and R 3 represents an alkyl group, a substituted alkyl group, a cycloalkyl group or an aromatic ring. R 1 to R 3 may be the same or different.) a2) A compound in which an alkali-soluble group is protected by an acid labile group represented by general formula (2) 2 (R4 to R6 are each an alkyl group, a substituted alkyl group, a cycloalkyl group or an aromatic ring, and at least one of R4 to R6 is an aromatic ring with an electron-donating group. R 4 to R 6 may be the same or different.) a3) A compound in which an alkali-soluble group is protected by an acid labile group a, and either acid labile group a has an alkali-soluble group or acid labile group a has an alkali-soluble group protected by an acid labile group b. With this constitution, it is possible by means of the present invention to obtain a positive-working radiation-sensitive composition of high sensitivity having a resolution which enables sub-quarter micron pattern processing to be carried out.

  本发明涉及一种积极工作的辐射敏感组合物，其特征在于它含有符合 a1）至 a3）中任一条件的化合物，以及 b）一种通过辐射产生酸的酸发生器；本发明还涉及一种用其生产抗蚀剂图案的方法。 a1)一种化合物，其中的羧基被通式(1)代表的易酸基团所保护 1 (R 1 和 R 2 是芳香环，R 3 代表烷基、取代烷基、环烷基或芳香环。R 1 至 R 3 可以相同或不同）。 a2) 碱溶性基团被通式（2）所代表的酸性基团保护的化合物 2 (R4 至 R6 各为烷基、取代烷基、环烷基或芳香环，且 R4 至 R6 中至少有一个是带有电子奉献基团的芳香环。R 4 至 R 6 可以相同或不同）。 a3)碱溶性基团被酸性基团 a 保护，且酸性基团 a 具有碱溶性基团或酸性基团 a 具有被酸性基团 b 保护的碱溶性基团的化合物。 通过这种结构，本发明可以获得一种高灵敏度的正向工作辐射敏感组合物，其分辨率可以进行四分之一微米以下的图案加工。
• Responsive microgel and methods related thereto
  申请人：——

  公开号：US20030152623A1

  公开（公告）日：2003-08-14

  A responsive microgel is provided which responds volumetrically and reversibly to a change in one or more aqueous conditions selected from the group consisting of (temperature, pH, and ionic conditions) comprised of an ionizable network of covalently cross-linked homopolymeric ionizable monomers wherein the ionizable network is covalently attached to an amphiphilic copolymer to form a plurality of ‘dangling chains’ and wherein the ‘dangling chains’ of amphiphilic copolymer form immobile micelle-like aggregates in aqueous solution. A responsive microgel is further provided that comprises at least one therapeutic entity and delivers a substantially linear and sustained release of the therapeutic entity under physiological conditions.

  本发明提供了一种响应型微凝胶，该微凝胶可对选自由温度、pH 值和离子条件组成的组中的一种或多种水性条件的变化作出体积上和可逆的响应、和离子条件）组成的共价交联均聚可离子化单体的可离子化网络，其中可离子化网络与两性共聚物共价连接，形成多条 "悬链"，两性共聚物的 "悬链 "在水溶液中形成不动的胶束状聚集体。还提供了一种响应性微凝胶，它包含至少一种治疗实体，并能在生理条件下提供治疗实体的线性和持续释放。
• PROCESS FOR PRODUCTION OF POLYOXYMETHYLENE INJECTION MOULDED OBJECTS
  申请人：SABIC Global Technologies B.V.

  公开号：EP3390535A1

  公开（公告）日：2018-10-24
• POLYMER COMPOSITION COMPRISING A (METH)ACRYLIC POLYMER HAVING GOOD OPTICAL PROPERTIES AND HEAT RESISTANCE
  申请人：SABIC Global Technologies B.V.

  公开号：EP3417008A1

  公开（公告）日：2018-12-26