申请人:Sumitomo Chemical Company, Limited
公开号:EP1167349A1
公开(公告)日:2002-01-02
A chemical amplifying type positive resist composition which provides a resist pattern having an exceedingly improved line edge roughness, and is excellent in various resist performances such as dry etching resistance, sensitivity and resolution; and comprises:
(A) an acid generator containing (a) a sulfonium salt represented by the following formula (I):
wherein Q1 and Q2 is alkyl or a cycloalkyl, or Q1 and Q2 form, together with a sulfur atom to which Q1 and Q2 are adjacent, an heteroalicyclic group; Q3 represents a hydrogen atom, Q4 represents alkyl or a cycloalkyl, or Q3 and Q4 form, together with a CHC(O) group to which Q3 and Q4 are adjacent, a 2-oxocycloalkyl group; and Q5SO3- represents an organosulfonate ion, and
(b) at least one onium salt selected from a triphenylsulfonium salt represented by the following formula (IIa), and a diphenyliodonium salt represented by the following formula (IIb):
wherein P1 to P5 represent hydrogen, a hydroxyl group, alkyl, or alkoxy; and P6SO3- and P7SO3- each independently represent an organosulfonate ion; and
(B) a resin which has a polymerization unit having a group instable against an acid, and is alkali-insoluble or -slightly soluble itself, but is converted to alkali-soluble by the action of an acid.
一种化学放大型正极抗蚀剂组合物,其抗蚀图案的线边缘粗糙度得到了极大的改善,并且在抗干蚀刻性、灵敏度和分辨率等各种抗蚀性能方面都非常出色;该组合物包括
(A) 酸发生器,其中含有 (a) 下式 (I) 所代表的锍盐:
其中 Q1 和 Q2 是烷基或环烷基,或 Q1 和 Q2 与 Q1 和 Q2 相邻的硫原子一起构成杂环基;Q3 代表氢原子,Q4 代表烷基或环烷基,或 Q3 和 Q4 与 Q3 和 Q4 相邻的 CHC(O) 基一起构成 2-氧代环烷基;以及 Q5SO3- 代表有机磺酸根离子,和
(b) 至少一种鎓盐,选自下式(IIa)代表的三苯基锍盐和下式(IIb)代表的二苯基碘 锍盐:
其中 P1 至 P5 代表氢、羟基、烷基或烷氧基;P6SO3- 和 P7SO3-各自独立地代表有机磺酸根离子;以及
(B) 一种树脂,其聚合单元具有对酸不稳定的基团,本身不溶于碱或微溶于碱,但在酸的作用下转化为溶于碱。