Positive photosensitive composition, polymer compound used for the positive photosensitive composition, production method of the polymer compound, and pattern forming method using the positive photosensitive composition
申请人:FUJIFILM Corporation
公开号:EP1925979A1
公开(公告)日:2008-05-28
A polymer compound having a structure represented by the formula (1) as defined herein at a main chain terminal, and a positive photosensitive composition containing a polymer compound having a structure represented by the following formula (1) as defined herein at a main chain terminal and a photoacid generator capable of generating an acid upon irradiation with actinic rays or radiation
一种高分子化合物,其主链末端具有本文定义的式(1)所代表的结构,以及一种正性光敏组合物,其主链末端含有具有本文定义的下式(1)所代表结构的高分子化合物和一种光酸发生器,该光酸发生器能够在光射线或辐射照射时产生一种酸