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{[2-(Ethenyloxy)ethyl]sulfanyl}cyclohexane | 309758-97-2

中文名称
——
中文别名
——
英文名称
{[2-(Ethenyloxy)ethyl]sulfanyl}cyclohexane
英文别名
2-ethenoxyethylsulfanylcyclohexane
{[2-(Ethenyloxy)ethyl]sulfanyl}cyclohexane化学式
CAS
309758-97-2
化学式
C10H18OS
mdl
——
分子量
186.32
InChiKey
AOCYHHWGIGAWMX-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    3.3
  • 重原子数:
    12
  • 可旋转键数:
    5
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.8
  • 拓扑面积:
    34.5
  • 氢给体数:
    0
  • 氢受体数:
    2

文献信息

  • Positive photosensitive composition, polymer compound used for the positive photosensitive composition, production method of the polymer compound, and pattern forming method using the positive photosensitive composition
    申请人:FUJIFILM Corporation
    公开号:EP1925979A1
    公开(公告)日:2008-05-28
    A polymer compound having a structure represented by the formula (1) as defined herein at a main chain terminal, and a positive photosensitive composition containing a polymer compound having a structure represented by the following formula (1) as defined herein at a main chain terminal and a photoacid generator capable of generating an acid upon irradiation with actinic rays or radiation
    一种高分子化合物,其主链末端具有本文定义的式(1)所代表的结构,以及一种正性光敏组合物,其主链末端含有具有本文定义的下式(1)所代表结构的高分子化合物和一种光酸发生器,该光酸发生器能够在光射线或辐射照射时产生一种酸
  • POSITIVE PHOTOSENSITIVE COMPOSITION, POLYMER COMPOUND USED FOR THE POSITIVE PHOTOSENSITIVE COMPOSITION, PRODUCTION METHOD OF THE POLYMER COMPOUND, AND PATTERN FORMING METHOD USING THE POSITIVE PHOTOSENSITIVE COMPOSITION
    申请人:SHIBUYA Akinori
    公开号:US20080187863A1
    公开(公告)日:2008-08-07
    A polymer compound having a structure represented by the formula (1) as defined herein at a main chain terminal, and a positive photosensitive composition containing a polymer compound having a structure represented by the following formula (1) as defined herein at a main chain terminal and a photoacid generator capable of generating an acid upon irradiation with actinic rays or radiation
  • US7794916B2
    申请人:——
    公开号:US7794916B2
    公开(公告)日:2010-09-14
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