Di-tert-butyl 4,4'-oxydibenzoate | 145531-13-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: Di-tert-butyl 4,4'-oxydibenzoate
• 英文别名: tert-butyl 4-[4-[(2-methylpropan-2-yl)oxycarbonyl]phenoxy]benzoate
• CAS: 145531-13-1
• 化学式: C₂₂H₂₆O₅
• 分子量: 370.4
• InChiKey: ZLLAPZNKUYCNEA-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  5.1
• 重原子数：
  27
• 可旋转键数：
  8
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.36
• 拓扑面积：
  61.8
• 氢给体数：
  0
• 氢受体数：
  5

文献信息

• PHOTOSENSITIVE COMPOSITION FOR INTERLAYER DIELECTRIC AND METHOD OF FORMING PATTERNED INTERLAYER DIELECTRIC
  申请人：AZ Electronic Materials (Japan) K.K.

  公开号：EP1548499A1

  公开（公告）日：2005-06-29

  There is provided a photosensitive composition which possesses excellent storage stability and can yield an interlayer insulation film with an improved film thickness limit. The photosensitive composition comprises a modified polysilsesquiazane having a weight average molecular weight of 500 to 200,000 comprising basic constitutional units represented by formula -[SiR1(NR2)1.5]- wherein R1's each independently represent an alkyl group having 1 to 3 carbon atoms or a substituted or unsubstituted phenyl group; R2's each independently represent hydrogen, an alkyl group having 1 to 3 carbon atoms, or a substituted or unsubstituted phenyl group, up to 50% by mole of the basic constitutional units having been replaced by a linking group other than the silazane bond; and a photoacid generating agent.

  本发明提供了一种光敏组合物，它具有优异的贮存稳定性，并能产生具有改进的膜厚度极限的层间绝缘膜。该光敏组合物包括一种改性聚硅烷基噻嗪，其重量平均分子量为 500 至 200,000，包含由式-[SiR1(NR2)1.5]-其中 R1 各自独立地代表具有 1 至 3 个碳原子的烷基或取代或未取代的苯基；R2 各自独立地代表氢、具有 1 至 3 个碳原子的烷基或取代或未取代的苯基，以摩尔计最多有 50%的基本构型单元被硅烷键以外的连接基团取代；以及一种光酸生成剂。
• Photosensitive composition for interlayer dielectric and method of forming patterned interlayer dielectric
  申请人：Nagahara Tatsuro

  公开号：US20050287469A1

  公开（公告）日：2005-12-29

  There is provided a photosensitive composition which possesses excellent storage stability and can yield an interlayer insulation film with an improved film thickness limit. The photosensitive composition is characterized by comprising: a modified polysilsesquiazane having a weight average molecular weight of 500 to 200,000 comprising basic constitutional units represented by formula —[SiR 1 (NR 2 ) 1.5 ]— wherein R 1 's each independently represent an alkyl group having 1 to 3 carbon atoms or a substituted or unsubstituted phenyl group; R 2 's each independently represent hydrogen, an alkyl group having 1 to 3 carbon atoms, or a substituted or unsubstituted phenyl group, up to 50% by mole of the basic constitutional units having been replaced by a linking group other than the silazane bond; and a photoacid generating agent.

  本发明提供了一种光敏组合物，该组合物具有优异的储存稳定性，并能生成具有改进的膜厚度极限的层间绝缘膜。该光敏组合物的特征在于：包含由式-[SiR]表示的基本构型单元的改性聚硅氧烷，其重量平均分子量为 500 至 200,000 1 (NR 2 ) 1.5 其中 R 1 各自独立地代表具有 1 至 3 个碳原子的烷基或取代或未取代的苯基；R 2 各自独立地代表氢、具有 1 至 3 个碳原子的烷基或取代或未取代的苯基，最多 50%（摩尔）的基本结构单元被硅烷键以外的连接基团取代；以及一种光酸生成剂。