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(3-Phenoxyphenyl)methyl 2-methylprop-2-enoate | 134096-28-9

中文名称
——
中文别名
——
英文名称
(3-Phenoxyphenyl)methyl 2-methylprop-2-enoate
英文别名
——
(3-Phenoxyphenyl)methyl 2-methylprop-2-enoate化学式
CAS
134096-28-9
化学式
C17H16O3
mdl
——
分子量
268.31
InChiKey
HRYZIYWIOWUKIP-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    4.5
  • 重原子数:
    20
  • 可旋转键数:
    6
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    0.12
  • 拓扑面积:
    35.5
  • 氢给体数:
    0
  • 氢受体数:
    3

文献信息

  • RESIN COMPOSITION FOR OPTICAL MOLDING
    申请人:Kuraray Noritake Dental Inc.
    公开号:EP3900693A1
    公开(公告)日:2021-10-27
    The present invention provides a resin composition for optical shaping that emits a weaker odor, enables easy fabrication of an object by virtue of its low viscosity, and can be made into a fabricated product having desirable toughness and water resistance when used for stereolithographic fabrication (particularly by vat stereolithography) and that is particularly suited for dental occlusal splints, mouth guards, and denture base materials. The present invention relates to a resin composition for optical shaping comprising: an α,β-unsaturated double bond group-containing compound (A) having a ring structure (a) containing a nitrogen atom; a (meth)acrylic acid ester compound (B) having a boiling point of 280°C or more at normal pressure, having a carbocyclic group, and having no nitrogen-containing heterocyclic group; a photopolymerization initiator (C); and optionally, a polyfunctional polymerizable monomer (E) having a molecular weight of 500 or less and not comprised in the α,β-unsaturated double bond group-containing compound (A) and the (meth)acrylic acid ester compound (B), wherein the content of the polyfunctional polymerizable monomer (E) having a molecular weight of 500 or less is 20 mass% or less relative to the total amount of polymerizable compounds comprised in the resin composition for optical shaping.
    本发明提供了一种用于光学整形的树脂组合物,该组合物散发的气味较弱,因其粘度低而易于制造物体,在用于立体光刻制造(特别是大桶立体光刻)时,可制成具有理想韧性和耐水性的制成品,特别适用于牙科咬合夹板、护齿板和义齿基底材料。本发明涉及一种用于光学塑形的树脂组合物,包括具有含氮原子的环结构 (a) 的含 α、β-不饱和双键基团的化合物 (A);(甲基) 丙烯酸酯化合物 (B),在常压下的沸点为 280°C 或更高,具有碳环基团,且不含含氮杂环基团;光聚合引发剂 (C);以及可选的分子量为 500 或以下且不包含在含α,β-不饱和双键基团的化合物(A)和(甲基)丙烯酸酯化合物(B)中的多功能可聚合单体(E),其中分子量为 500 或以下的多功能可聚合单体(E)的含量占光学成型用树脂组合物中可聚合化合物总量的 20% 或以下。
  • CURABLE COMPOSITION AND STEREOLITHOGRAPHIC RESIN COMPOSITION COMPRISING SAME
    申请人:Kuraray Co., Ltd.
    公开号:EP3991958A1
    公开(公告)日:2022-05-04
    To provide a curable composition that is readily modeled with low viscosity and excellent curing capability in modeling by stereolithography, and provides a cured article excellent in toughness and water resistance, and a resin composition for stereolithography prepared therefrom. To provide a resin composition for stereolithography that is favorable particularly for a dental mouthpiece and a denture base material. A curable composition containing 79.0 to 99.0% by mass of a polymerizable monomer (a), 0.1 to 10.0% by mass of a photopolymerization initiator (b), and 0.01 to 20.0% by mass of a compound represented by the following general formula (I) as a polyfunctional polymerizable compound (c): wherein R1 and R2 each independently represent at least one kind selected from the group consisting of a hydrogen atom, an alkyl group having 1 to 6 carbon atoms, an alkenyl group having 2 to 6 carbon atoms, an aryl group, and an aralkyl group; R3 represents at least one kind of a polymerizable functional group selected from the group consisting of a (meth)acryloyl group, a 4-vinylphenyl group, and an alkenyl group having 2 to 5 carbon atoms; and n represents an arbitrary integer of 0 to 5.
    提供一种可固化组合物,该组合物在用立体光刻法进行建模时具有低粘度和优异的固化能力,并提供一种具有优异韧性和耐水性的固化物,以及由其制备的立体光刻法用树脂组合物。提供一种立体光刻用树脂组合物,该组合物尤其适用于牙科口模和义齿基底材料。一种可固化组合物,含有 79.0 至 99.0%(质量百分比)的可聚合单体 (a)、0.1 至 10.0%(质量百分比)的光聚合引发剂 (b),以及 0.01 至 20.0%(质量百分比)的由以下通式 (I) 代表的化合物作为多官能团可聚合化合物 (c): 其中 R1 和 R2 各自独立地代表至少一种选自氢原子、具有 1 至 6 个碳原子的烷基、具有 2 至 6 个碳原子的烯基、芳基和芳烷基的官能团;R3 代表至少一种选自(甲基)丙烯酰基、4-乙烯基苯基和具有 2 至 5 个碳原子的烯基的可聚合官能团;n 代表 0 至 5 的任意整数。
  • CURABLE COMPOSITION, AND RESIN COMPOSITION FOR STEREOLITHOGRAPHY PREPARED THEREFROM
    申请人:Kuraray Co., Ltd.
    公开号:EP3992216A1
    公开(公告)日:2022-05-04
    To provide a curable composition that is readily modeled with low viscosity and excellent curing capability in modeling by stereolithography, and provides a cured article excellent in toughness and water resistance, and a resin composition for stereolithography prepared therefrom. To provide a resin composition for stereolithography that is favorable particularly for a dental mouthpiece and a denture base material. A curable composition containing 79.0 to 99.0% by mass of a polymerizable monomer (a), 0.1 to 10.0% by mass of a photopolymerization initiator (b), and 0.01 to 20.0% by mass of a compound (c) represented by the following general formula (I):
    提供一种可固化组合物,该组合物在用立体光刻法进行建模时具有低粘度和优异的固化能力,并提供一种具有优异韧性和耐水性的固化物,以及由其制备的立体光刻法用树脂组合物。提供一种立体光刻用树脂组合物,该组合物尤其适用于牙科口模和义齿基底材料。一种可固化组合物,含有 79.0 至 99.0%(质量百分比)的可聚合单体 (a)、0.1 至 10.0%(质量百分比)的光聚合引发剂 (b),以及 0.01 至 20.0%(质量百分比)的由以下通式 (I) 代表的化合物 (c):
  • Photocurable resin composition and method of forming patterns using the same
    申请人:CHEM OPTICS INC.
    公开号:US10752718B2
    公开(公告)日:2020-08-25
    The present invention relates to a photocurable resin composition usable in a nanoimprint process which is capable of overcoming low productivity of conventional semiconductor processes for optical devices and electronic devices, and a method of forming patterns using the same. Specifically, the present invention relates to a photocurable resin composition including a specific perfluorinated acrylic compound for improving release property between a nanoimprint mold and the photocurable resin composition, and a method of forming patterns using the same.
    本发明涉及一种可用于纳米压印工艺的光固化树脂组合物,该组合物能够克服用于光学设备和电子设备的传统半导体工艺的低生产率问题,本发明还涉及一种使用该组合物形成图案的方法。具体地说,本发明涉及一种包括特定全氟丙烯酸化合物的光固化树脂组合物,用于改善纳米压印模具与光固化树脂组合物之间的脱模性能,以及使用该组合物形成图案的方法。
  • COMPOSITION AND FILM
    申请人:TOYO GOSEI CO., LTD.
    公开号:US20160208127A1
    公开(公告)日:2016-07-21
    Compositions that are especially suitable for optical components are disclosed.
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