Tosyl hydroxyketone | 1449673-98-6

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: Tosyl hydroxyketone
• 英文别名: (4-methylphenyl)sulfonylformic acid
• CAS: 1449673-98-6
• 化学式: C₈H₈O₄S
• 分子量: 200.215
• InChiKey: GLUXPRMHPHUQLM-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.4
• 重原子数：
  13
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.12
• 拓扑面积：
  79.8
• 氢给体数：
  1
• 氢受体数：
  4

反应信息

• 作为反应物：
  描述：

  (E)-3-(3-hydroxy-4-methoxyphenyl)-1-(5-methoxy-2,2-dimethyl-2H-chromen-8-yl)prop-2-en-1-one 、 Tosyl hydroxyketone 在 4-二甲氨基吡啶 、 盐酸-N-乙基-Nˊ-(3-二甲氨基丙基)碳二亚胺 作用下， 以 二氯甲烷 为溶剂， 反应 12.0h， 以79%的产率得到(E)-2-methoxy-5-(3-(5-methoxy-2,2-dimethyl-2H-chromen-8-yl)-3-oxoprop-1-en-1-yl)phenyl 4-methylbenzenesulfonate
  参考文献：
  名称：

  Synthesis and biological evaluation of novel pyranochalcone derivatives as a new class of microtubule stabilizing agents

  摘要：

  Twenty-five novel pyranochalcone derivatives were synthesized and evaluated for their in vitro and in vivo antiproliferative activities. Among them, compound 10i exhibited superior potent activity against 21 tumor cell lines including multidrug resistant phenotype with the IC50 values ranged from 0.09 to 1.30 mu M. In addition, 10i significantly induced cell cycle arrest in G2/M phase, promoted tubulin polymerization into microtubules and caused microtubule stabilization. Further studies confirmed that 10i significantly suppressed the growth of tumor volume in HepG2 xenograft tumor model. Our study demonstrated that 10i could have beneficial antitumor activity as a novel microtubule stabilizing agent. (C) 2013 Elsevier Masson SAS. All rights reserved.

  DOI：

  10.1016/j.ejmech.2013.01.007

文献信息

• (E)-2-ISOPROPYL-5-METHYL-3,5-HEXADIENOATE COMPOUND, METHOD FOR PRODUCING THE SAME, AND METHODS FOR PRODUCING (E)-2-ISOPROPYL-5-METHYL-3,5-HEXADIENOL AND (E)-2-ISOPROPYL-5-METHYL-3,5-HEXADIENYL CARBOXYLATE BY USING THE SAME
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20170050913A1

  公开（公告）日：2017-02-23

  Provided is a geometrically selective method for producing (±)-(E)-2-isopropyl-5-methyl-3,5-hexadienyl acetate, which is a sex pheromone of grape pineapple mealybug (GPMB). Specifically provided is a method for producing a an (E)-2-isopropyl-5-methyl-3,5-hexadienyl carboxylate compound (4), the method comprising the steps of: dehydrating a 3-hydroxy-2-isopropyl-5-methyl-4-hexenoate compound (1) to obtain an (E)-2-isopropyl-5-methyl-3,5-hexadienoate compound (2); reducing the alkoxycarbonyl group of the compound (2) to obtain (E)-2-isopropyl-5-methyl-3,5-hexadienol (3); and esterifying the compound (3) to obtain the compound (4).

  提供了一种几何选择性方法，用于制备（±）-（E）-2-异丙基-5-甲基-3,5-己二烯基醋酸酯，这是葡萄凤梨介壳虫（GPMB）的性信息素。具体提供了一种制备（E）-2-异丙基-5-甲基-3,5-己二烯酸酯化合物（4）的方法，该方法包括以下步骤：脱水3-羟基-2-异丙基-5-甲基-4-己烯酸酯化合物（1）以获得（E）-2-异丙基-5-甲基-3,5-己二烯酸酯化合物（2）；还原化合物（2）的烷氧羰基以获得（E）-2-异丙基-5-甲基-3,5-己二烯醇（3）；酯化化合物（3）以获得化合物（4）。
• [EN] PROCESS AND METHOD FOR THE EFFICIENT PREPARATION OF FULLERYNES<br/>[FR] PROCÉDÉ ET MÉTHODE POUR LA PRÉPARATION EFFICACE DE FULLERYNES
  申请人：UNIV AKRON

  公开号：WO2012005762A1

  公开（公告）日：2012-01-12

  The preparation of novel fullerynes which are fullerenes (e.g. C60, C70, C80, etc.) that contain one or more alkyne functionalities and may contain additional functional groups such as hydroxyls, halogens, esters, haloesters, phenyl, oligo(ethylene glycol)s, perfluorinated alkyl chains, and the like. Two desired preparation routes are disclosed. The first one is the Fischer esterification in desired solvents using a special designed reactor in contrast to the heretofore initial Steglich reaction that results in side reactions and low yields. The second one uses acetylide Grignard reagents that have reduced nucleophilicity and higher stability in contrast to the use of heretofore initial lithium organyls or other Grignard reagents that would add to C60 with possible multi-additions in an uncontrollable manner.

  制备新型富勒烯，该富勒烯（例如C60，C70，C80等）含有一个或多个炔基官能团，并可能含有额外的官能团，例如羟基，卤素，酯，卤代酯，苯基，寡聚（乙二醇）和全氟烷基等。文中介绍了两种所需的制备路线。第一种是在特定溶剂中使用特殊设计的反应器进行Fischer酯化反应，与此前的Steglich反应相比，可以避免副反应和低收率。第二种方法使用乙炔基格氏试剂，其亲核性降低且稳定性更高，相比于此前使用的锂有机化合物或其他格氏试剂，可以避免多次无法控制的加成反应。
• RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICONE HAVING ONIUM GROUP
  申请人：Shibayama Wataru

  公开号：US20110143149A1

  公开（公告）日：2011-06-16

  There is provided a resist underlayer film forming composition for lithography for forming a resist underlayer film capable of being used as a hard mask or a bottom anti-reflective coating, or a resist underlayer film causing no intermixing with a resist and having a dry etching rate higher than that of the resist. A film forming composition comprising a silane compound having an onium group, wherein the silane compound having an onium group is a hydrolyzable organosilane having, in a molecule thereof, an onium group, a hydrolysis product thereof, or a hydrolysis-condensation product thereof. The composition uses as a resist underlayer film forming composition for lithography. A composition comprising a silane compound having an onium group, and a silane compound having no onium group, wherein the silane compound having an onium group exists in the whole silane compound at a ratio of less than 1% by mol, for example 0.01 to 0.95% by mol. The hydrolyzable organosilane may be a compound of Formula: R 1 a R 2 b Si(R 3 ) 4-(a+b) . A resist underlayer film obtained by applying the composition as claimed in any one of claims 1 to 14 onto a semiconductor substrate and by baking the composition.

  提供一种用于光刻的抗蚀底层膜形成组合物，用于形成可用作硬掩膜或底部防反射涂层的抗蚀底层膜，或者是不与抗蚀剂混合且具有比抗蚀剂更高的干法刻蚀速率的抗蚀底层膜。该组合物包括具有离子基的硅烷化合物，其中具有离子基的硅烷化合物是一种可水解的有机硅烷，其分子中具有一个离子基、其水解产物或水解缩合产物。该组合物用作光刻的抗蚀底层膜形成组合物。组合物包括具有离子基的硅烷化合物和不具有离子基的硅烷化合物，其中具有离子基的硅烷化合物在整个硅烷化合物中的摩尔比例小于1％，例如为0.01到0.95％。可水解的有机硅烷可以是式的化合物：R1aR2bSi（R3）4-（a+b）。通过将所述组合物按照权利要求1至14中的任一项涂布到半导体基片上并烘烤所得到的抗蚀底层膜。
• RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING ANION GROUP
  申请人：Shibayama Wataru

  公开号：US20110287369A1

  公开（公告）日：2011-11-24

  There is provided a resist underlayer film forming composition for lithography for forming a resist underlayer film capable of being used as a hardmask. A resist underlayer film forming composition for lithography comprising a silane compound containing an anion group, wherein the silane compound containing an anion group is a hydrolyzable organosilane in which an organic group containing an anion group is bonded to a silicon atom and the anion group forms a salt structure, a hydrolysis product thereof, or a hydrolysis-condensation product thereof. The anion group may be a carboxylic acid anion, a phenolate anion, a sulfonic acid anion, or a phosphonic acid anion. The hydrolyzable organosilane may be a compound of Formula (1): R 1 a R 2 b Si(R 3 ) 4−(a+b) (1). A composition comprising a mixture of a hydrolyzable organosilane of Formula (1), and at least one organic silicon compound selected from the group consisting of a compound of Formula (2): R 4 a Si(R 5 ) 4−a (2) and a compound of Formula (3): [R 6 c Si(R 7 ) 3−c ] 2 Y b (3); a hydrolysis product of the mixture; or a hydrolysis-condensation product of the mixture.

  提供了一种用于光刻的抗蚀底层膜形成组合物，用于形成可用作硬膜的抗蚀底层膜。该抗蚀底层膜形成组合物包括含有阴离子基团的硅烷化合物，其中含有阴离子基团的硅烷化合物是一种可水解的有机硅烷，其中含有阴离子基团的有机基团与硅原子键合，阴离子基团形成盐结构，其水解产物或水解缩合产物。阴离子基团可以是羧酸阴离子、酚酸盐阴离子、磺酸盐阴离子或磷酸盐阴离子。可水解的有机硅烷可以是式（1）的化合物：R1aR2bSi（R3）4−（a+b）（1）。组合物包括式（1）的可水解有机硅烷的混合物，以及选择自化合物组中的至少一种有机硅化合物的混合物，该组具有式（2）的化合物：R4aSi（R5）4−a（2）和式（3）的化合物：[R6cSi（R7）3−c] 2Yb（3）；该混合物的水解产物；或该混合物的水解缩合产物。
• RESIST UNDERLAYER FILM FORMING COMPOSITION CONTAINING SILICON HAVING NITROGEN-CONTAINING RING
  申请人：Nakajima Makoto

  公开号：US20120315765A1

  公开（公告）日：2012-12-13

  There is provided a resist underlayer film forming composition for lithography for forming a resist underlayer film capable of being used as a hardmask. A resist underlayer film forming composition for lithography, includes as a silane compound, a hydrolyzable organosilane, a hydrolysis product thereof, or a hydrolysis-condensation product thereof, wherein the hydrolyzable organosilane is a hydrolyzable organosilane of Formula (1): R 1 a R 2 b Si(R 3 ) 4−(a+b) Formula (1) wherein R 1 is Formula (2): in which R 4 is an organic group, and R 5 is a C 1-10 alkylene group, a hydroxyalkylene group, a sulfide bond, an ether bond, an ester bond, or a combination thereof, X 1 is Formula (3), Formula (4), or Formula (5): R 2 is an organic group, and R 3 is a hydrolysable group.

  提供了一种用于制备可用作硬面膜的光刻胶底层膜的抗性底层膜形成组合物。一种用于光刻胶底层膜形成的抗性底层膜形成组合物，包括硅烷化合物作为成分，所述硅烷化合物是可水解的有机硅烷、其水解产物或其水解缩合物，其中所述可水解的有机硅烷是式(1)的可水解的有机硅烷： R1aR2bSi(R3)4−(a+b) 式(1) 其中R1是式(2)： 其中R4是有机基团，R5是C1-10烷基、羟基烷基、硫化键、醚键、酯键或其组合，X1是式(3)、式(4)或式(5)： R2是有机基团，R3是可水解基团。