3,5-Pyridinediamine, 2,4-dimethyl- | 1261269-85-5

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 吡啶及其衍生物
• 英文名称: 3,5-Pyridinediamine, 2,4-dimethyl-
• 英文别名: 2,4-dimethylpyridine-3,5-diamine
• CAS: 1261269-85-5
• 化学式: C₇H₁₁N₃
• 分子量: 137.18
• InChiKey: LEMQVTVJYPORFL-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  0.3
• 重原子数：
  10
• 可旋转键数：
  0
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.29
• 拓扑面积：
  64.9
• 氢给体数：
  2
• 氢受体数：
  3

文献信息

• POSITIVE PHOTOSENSITIVE POLYIMIDE COMPOSITION
  申请人：PI R & D Co Ltd

  公开号：EP1024407A1

  公开（公告）日：2000-08-02

  A photosensitive polyimide composition which is soluble in an organic solvent, which is excellent in adhesiveness, heat resistance, mechanical properties and flexibility, which shows the property of highly sensitive positive-type photoresist that is soluble in alkali upon irradiation with light is disclosed. The polyimide composition of the present invention contains a photoacid generator and a solvent-soluble polyimide which shows positive-type photosensitivity in the presence of said photoacid generator.

  本发明公开了一种可溶于有机溶剂的光敏聚酰亚胺组合物，该组合物具有优异的粘合性、耐热性、机械性能和柔韧性，在光照射下显示出可溶于碱的高灵敏度正型光刻胶特性。本发明的聚酰亚胺组合物包含一种光酸发生器和一种可溶于溶剂的聚酰亚胺，该聚酰亚胺在所述光酸发生器的存在下显示出正型光敏性。
• NEGATIVE PHOTOSENSITIVE POLYIMIDE COMPOSITION AND METHOD OF FORMING IMAGE FROM THE SAME
  申请人：PI R & D Co., Ltd.

  公开号：EP1326138A1

  公开（公告）日：2003-07-09

  Disclosed is a composition of a negative-type photosensitive polyimide which is solvent soluble, which is excellent in adhesiveness, heat resistance, mechanical properties and in flexibility, which shows characteristics of alkali-soluble highly sensitive negative-type photoresist upon irradiation with light. The composition according to the present invention comprises a photo radical initiator and a solvent-soluble polyimide which shows negative-type photosensitivity in the presence of the photo radical initiator.

  本发明公开了一种负型光敏聚酰亚胺组合物，该组合物溶于溶剂，具有优异的粘合性、耐热性、机械性能和柔韧性，在光照射下显示出碱溶性高灵敏度负型光刻胶的特性。根据本发明的组合物包括一种光自由基引发剂和一种可溶于溶剂的聚酰亚胺，在光自由基引发剂的存在下，该聚酰亚胺显示出负型光敏性。
• Negative photosensitive polymide composition and method for forming image the same
  申请人：——

  公开号：US20040041129A1

  公开（公告）日：2004-03-04

  Disclosed is a composition of a negative-type photosensitive polyimide which is solvent soluble, which is excellent in adhesiveness, heat resistance, mechanical properties and in flexibility, which shows characteristics of alkali-soluble highly sensitive negative-type photoresist upon irradiation with light. The composition according to the present invention comprises a photo radical initiator and a solvent-soluble polyimide which shows negative-type photosensitivity in the presence of the photo radical initiator.
• US6627377B1
  申请人：——

  公开号：US6627377B1

  公开（公告）日：2003-09-30
• US7648815B2
  申请人：——

  公开号：US7648815B2

  公开（公告）日：2010-01-19