4-tert-Butyl-3-methylbenzene-1-thiol | 89403-64-5

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 4-tert-Butyl-3-methylbenzene-1-thiol
• 英文别名: 4-tert-butyl-3-methylbenzenethiol
• CAS: 89403-64-5
• 化学式: C₁₁H₁₆S
• 分子量: 180.31
• InChiKey: XEQLOBCWMSSZTP-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.9
• 重原子数：
  12
• 可旋转键数：
  1
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.45
• 拓扑面积：
  1
• 氢给体数：
  1
• 氢受体数：
  1

文献信息

• CHEMICALLY AMPLIFIED PHOTOSENSITIVE COMPOSITION, PHOTOSENSITIVE DRY FILM, METHOD OF MANUFACTURING PATTERNED RESIST FILM, METHOD OF MANUFACTURING SUBSTRATE WITH TEMPLATE, METHOD OF MANUFACTURING PLATED ARTICLE, AND COMPOUND
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US20200209739A1

  公开（公告）日：2020-07-02

  A chemically amplified photosensitive composition which forms a resist pattern whose cross-sectional shape is rectangular, and which has a wide depth of focus margin; a photosensitive dry film having a photosensitive layer made from the composition; a method of manufacturing a patterned-resist film using the composition; a method of manufacturing a substrate with a template using the composition; a method of manufacturing a plated article using the substrate with a template; and a novel compound. An acid diffusion suppressing agent having a specific structure is blended into the composition including an acid generator which generates acid upon exposure to an irradiated active ray or radiation.

  一种化学增感光敏组合物，形成一个截面形状为矩形的抗蚀图案，具有宽广的焦深度余量；一种具有由该组合物制成的感光层的感光干膜；使用该组合物制造图案抗蚀膜的方法；使用该组合物制造带有模板的基板的方法；使用带有模板的基板制造电镀物品的方法；以及一种新型化合物。酸扩散抑制剂与包括在暴露于辐射活性光线或辐射时生成酸的酸发生剂的组合物中混合，具有特定的结构。
• Cleaning solution, method of removing a removal target and method of etching a substrate using said cleaning solution
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US10363585B2

  公开（公告）日：2019-07-30

  A cleaning liquid which includes 3-alkoxy-3-methyl-1-butanol represented by the following general formula (1); at least one of diethylene glycol monomethyl ether and triethylene glycol monomethyl ether; and quaternary ammonium hydroxide: in which R1 represents an alkyl group having 1 to 5 carbon atoms.

  一种清洁液，包括以下通式 (1) 所代表的 3-烷氧基-3-甲基-1-丁醇；二乙二醇单甲醚和三乙二醇单甲醚中的至少一种；以及氢氧化季铵： 其中 R1 代表具有 1 至 5 个碳原子的烷基。
• Chemically amplified positive-type photosensitive resin composition, photosensitive dry film, method of manufacturing photosensitive dry film, method of manufacturing patterned resist film, method of manufacturing substrate with template and method of manufacturing plated article
  申请人：TOKYO OHKA KOGYO CO., LTD.

  公开号：US11131927B2

  公开（公告）日：2021-09-28

  A chemically amplified positive-type photosensitive resin composition which is highly sensitive and in which it is easy to form a resist pattern whose cross-sectional shape is rectangular, a photosensitive dry film which includes a photosensitive resin layer formed from the composition, a method of manufacturing the photosensitive dry film, a method of manufacturing a patterned resist film using the composition, a method of manufacturing a substrate with a template using the composition and a method of manufacturing a plated article using the substrate with the template. A Lewis acid compound is included in the composition that also includes an acid generator which generates an acid by application of an active ray or radiation, and a resin whose solubility in alkali is increased by action of an acid.

  一种化学放大的正型光敏树脂组合物，它具有高灵敏度，并且易于形成横截面形状为矩形的抗蚀剂图案；一种光敏干膜，它包括由该组合物形成的光敏树脂层；一种制造光敏干膜的方法；一种使用该组合物制造图案抗蚀膜的方法；一种使用该组合物制造带有模板的基片的方法；以及一种使用带有模板的基片制造电镀物品的方法。组合物中包含一种路易斯酸化合物，该组合物还包括一种酸发生器（通过应用活性射线或辐射产生一种酸）和一种树脂（通过酸的作用增加其在碱中的溶解度）。
• JPH02243668A
  申请人：——

  公开号：JPH02243668A

  公开（公告）日：1990-09-27
• NONAQUEOUS CLEANING LIQUID AND METHOD FOR ETCHING PROCESSING OF SILICON SUBSTRATE
  申请人：Tokyo Ohka Kogyo Co., Ltd.

  公开号：US20140017902A1

  公开（公告）日：2014-01-16

  A nonaqueous cleaning liquid comprising a fluoroalkanol, a quaternary ammonium hydroxide, and an organic solvent. Compounds represented by formulae (1) and (2). Fluoroalkanol compounds include (1) H(CF 2 ) a CH 2 —OH and (2) F(CF 2 ) b (CH 2 ) c —OH In which a and b are each an integer of from 2 to 6, and c is an integer of 1 or 2.