METHOD FOR PRODUCING POLYMER, POLYMER, COMPOSITION FOR FORMING INSULATING FILM, METHOD FOR PRODUCING INSULATING FILM, AND INSULATING FILM
申请人:JSR Corporation
公开号:EP1705206A1
公开(公告)日:2006-09-27
There are provided a method for producing a polymer, a polymer, an insulating-film-forming composition, a method for producing an insulating film, and an insulating film capable of forming a film which is suitably used as an interlayer dielectric for semiconductor devices or the like and exhibits a low relative dielectric constant, excellent mechanical strength and adhesion, and uniform quality.
A method for producing a polymer of the invention comprises hydrolyzing and condensing (B) a hydrolyzable-group-containing silane monomer in the presence of (A) a polycarbosilane, the polycarbosilane (A) being a polymer (I) obtained by reacting (a) a compound shown by the following general formula (1) and (b) at least one compound selected from the group consisting of a compound shown by the following general formula (2) and a compound shown by the following general formula (3) in an organic solvent in the presence of at least one of an alkali metal and an alkaline earth metal,
R1kCX4-k (1)
R2kSiY4-k (2)
R3mY3-mSiCR4nX3-n (3)
wherein R1 to R4 individually represent a monovalent organic group or a hydrogen atom, X represents a halogen atom, Y represents a halogen atom or an alkoxy group, k represents an integer from 0 to 3, and m and n individually represent integers from 0 to 2.
本发明提供了一种聚合物的生产方法、一种聚合物、一种绝缘成膜组合物、一种绝缘膜的生产方法,以及一种能够形成薄膜的绝缘膜,该薄膜适合用作半导体器件或类似器件的层间电介质,并具有较低的相对介电常数、优异的机械强度和附着力以及均匀的质量。
生产本发明聚合物的方法包括在(A)聚碳酸酯硅烷存在下水解和缩合(B)含可水解基团的硅烷单体、聚碳硅烷(A)为聚合物(I),由(a)下式(1)所示化合物和(b)至少一种选自下式(2)所示化合物和下式(3)所示化合物组成的组的化合物在有机溶剂中,在碱金属和碱土金属中至少一种存在下反应而得、
R1kCX4-k (1)
R2kSiY4-k (2)
R3mY3-mSiCR4nX3-n (3)
其中 R1 至 R4 分别代表一价有机基团或氢原子,X 代表卤素原子,Y 代表卤素原子或烷氧基,k 代表 0 至 3 的整数,m 和 n 分别代表 0 至 2 的整数。