POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD USING THE SAME
申请人:Tsuchihashi Toru
公开号:US20100248146A1
公开(公告)日:2010-09-30
A positive resist composition comprising (A) a resin which contains all of the repeating units represented by formulae (I) to (III), and becomes soluble in an alkali developer by the action of an acid, and (B) a compound capable of generating an acid upon irradiation with an actinic ray or radiation; and a pattern forming method using the composition. A represents a group capable of decomposing and leaving by the action of an acid, each R
1
independently represents hydrogen or a methyl group, R
2
represents a phenyl group or a cyclohexyl group, m represents 1 or 2, and n represents an integer of 0 to 2. By virtue of this construction, a resist composition ensuring high resolution, good pattern profile, sufficient depth of focus, little defects after development, and sufficiently high plasma etching resistance is provided.
Palladium-Catalyzed Esterification of Carboxylic Acids with Aryl Iodides
作者:Hiroyuki Kitano、Hideto Ito、Kenichiro Itami
DOI:10.1021/acs.orglett.8b00775
日期:2018.4.20
The first palladium-catalyzed esterification of carboxylicacids with aryl iodides is described. A palladium-based catalytic system consisting of IBnF (1,3-bis((pentafluorophenyl)methyl)imidazole-2-ylidene) ligand was found to significantly accelerate the aryl–O bond-forming esterification reaction. A series of aryl iodides and carboxylicacids undergoes a palladium-catalyzed coupling reaction to provide