Acid generator compounds are provided that are particularly useful as photoresist composition components. Preferred acid generators include cyclic sulfonium compounds that comprise a covalently linked acid-labile group.
ANTIREFLECTIVE COMPOSITIONS WITH THERMAL ACID GENERATORS
申请人:Rohm and Haas Electronic Materials Korea Ltd.
公开号:US20190085173A1
公开(公告)日:2019-03-21
New methods and substrates are provided that include antireflective compositions that comprise one or more thermal acid generators.
提供了包括一个或多个热酸发生剂的防反射组分的新方法和基板。
Chiral thiouronium salts: synthesis, characterisation and application in NMR enantio-discrimination of chiral oxoanions
作者:Magdalena B. Foreiter、H. Q. Nimal Gunaratne、Peter Nockemann、Kenneth R. Seddon、Paul J. Stevenson、David F. Wassell
DOI:10.1039/c2nj40632b
日期:——
N′-bis(dehydroabietyl)thiouronium bistriflamide. It was confirmed that the chiral recognition occurred not only for carboxylates but also for sulfonates and phosphonates. Further 1H NMRstudies confirmed a 1 : 1 recognition mode between the chiralagent (host) and the substrate (guest); binding constants were determined by 1H NMR titrations in solutions of DMSO-d6 in CDCl3. It was also found that the
COATING COMPOSITIONS SUITABLE FOR USE WITH AN OVERCOATED PHOTORESIST
申请人:Amara John P.
公开号:US20110003250A1
公开(公告)日:2011-01-06
In one aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise that comprise a diene/dienophile reaction product. In another aspect, organic coating compositions, particularly antireflective coating compositions, are provided that comprise a component comprising a hydroxyl-naphthoic group, such as a 6-hydroxy-2-naphthoic group Preferred compositions of the invention are useful to reduce reflection of exposing radiation from a substrate back into an overcoated photoresist layer and/or function as a planarizing, conformal or via-fill layer.
Hydrofluoroalkanesulfonic acids from fluorovinyl ethers
申请人:Junk P. Christopher
公开号:US20060276670A1
公开(公告)日:2006-12-07
Hydrofluoroalkanesulfonates of the general formula R—O—CXH—CX
2
—SO
3
M, where R is selected from the group consisting of alkyl groups, functionalized alkyl groups, and alkenyl groups; X is selected from the group consisting of hydrogen and fluorine with the proviso that at least one X is fluorine; and M is a cation, are made by reacting fluorovinyl ether with aqueous sulfite solution. Organic onium hydrofluoroalkanesulfonates are useful as ionic liquids and photoacid generators.