二(2-羟基乙基)-甲基-(苯基甲基)铵氢氧化物 | 33667-49-1

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 中文名称: 二(2-羟基乙基)-甲基-(苯基甲基)铵氢氧化物
• 中文别名: 苄基二(2-羟乙基)甲基氢氧化铵
• 英文名称: Benzenemethanaminium, N,N-bis(2-hydroxyethyl)-N-methyl-, hydroxide
• 英文别名: benzyl-bis(2-hydroxyethyl)-methylazanium;hydroxide
• CAS: 33667-49-1
• 化学式: C12H21NO3
• 分子量: 227.3
• InChiKey: ZHRRAVIVNPZSEW-UHFFFAOYSA-M

计算性质

• 辛醇/水分配系数(LogP)：
  0.44
• 重原子数：
  16
• 可旋转键数：
  6
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.5
• 拓扑面积：
  41.5
• 氢给体数：
  3
• 氢受体数：
  3

文献信息

• Positive photoresist composition
  申请人：FUJI PHOTO FILM CO., LTD.

  公开号：US20020172886A1

  公开（公告）日：2002-11-21

  A positive photoresist composition comprising the components of: (a) a resin which decomposes by the action of an acid, thereby having an increased solubility in an alkali developer; and (b) a compound which is represented by the formula (1) and generates an acid by exposure to active rays or radiation, and a compound which is represented by the formula (2) and generates an acid by exposure to active rays or radiation.

  一种正向光致变色胶组合物，包括以下组成部分：(a)一种树脂，通过酸的作用分解，从而在碱性显影剂中具有增加的溶解度；和(b)一种化合物，其由公式(1)表示，并通过暴露于活性光线或辐射而产生酸，以及一种由公式(2)表示的化合物，通过暴露于活性光线或辐射而产生酸。
• Cu-Low K Cleaning and Protection Compositions
  申请人：Wu Jiali

  公开号：US20160300730A1

  公开（公告）日：2016-10-13

  This disclosure relates post chemical mechanical planarization cleaning composition of semiconductor substrate for advanced electronics fabrication and packaging. It provides novel corrosion inhibition and quality upmost Cu-low K surfaces to the demanding reliability of nano device and Cu interconnection. Its efficacious cleaning without changing of ultra-low K dielectric and interfering with ultimate electronics performance also offers a cleaning solution to the Cu-low K structure of post reactive ion etching as well as resist ashing in semiconductor fabrication process flow.
• US6296985B1
  申请人：——

  公开号：US6296985B1

  公开（公告）日：2001-10-02
• US6743562B2
  申请人：——

  公开号：US6743562B2

  公开（公告）日：2004-06-01
• US7022456B2
  申请人：——

  公开号：US7022456B2

  公开（公告）日：2006-04-04