Deoxygenation of sulfoxides, selenoxides, telluroxides, sulfones, selenones and tellurones with Mg–MeOH
作者:Jitender M. Khurana、Vandana Sharma、Silvi A. Chacko
DOI:10.1016/j.tet.2006.11.027
日期:2007.1
The deoxygenation of a variety of sulfoxides, selenoxides, telluroxides, sulfones, selenones and tellurones has been reported with Mg–MeOH at room temperature in nearly quantitative yields. The deoxygenation is proposed to proceed by SET from Mg to the substrate.
Hexafluoropropene oxide (HFPO) is shown to be a good reagent for the nucleophilic formation of the element–fluorine bond in organoelement compounds. Fluorides of Bi, Sb, Se, Te and I were prepared from appropriate oxygen compounds
Two types of macrocyclic multi-telluranes with hypervalent
TeâO apical linkages in the main chain were prepared by the reaction
of a telluronium salt or a cationic ditelluroxane with phthalate
via [3 + 3] and [2 + 2] assembly, respectively.
Insertion of an Oxygen Atom between Tellurium Atoms upon Oxidation of a Diaryl Telluride with NOBF4 or (CF3SO2)2O/O2: Dicationic Bis[diaryltellurium(IV)] Oxide
NO and O2 molecules are the source of the oxygen atom for dicationic µ-oxo(diaryltellurium) dimers 2 (X=BF4- , CF3 SO3- ), which form upon chemical oxidation of 1 with NOBF4 (method A) or (CF3 SO2 )2 O/O2 [method B, Eq. (a)]. The fate of the nitrogen atom of the oxidizing agent NOBF4 remains uncertain at this stage.
NO和O 2分子可用于双阳离子μ氧代的氧原子的源极(diaryltellurium)二聚体2(X = BF 4 -,CF 3 SO 3 - ),其形式在与NOBF 1化学氧化4(方法A)或(CF 3 SO 2)2 O / O 2 [方法B,等式。(一种)]。在该阶段,氧化剂NOBF 4的氮原子的命运仍然不确定。
Dicationic oligotelluroxane or mononuclear telluronium cation? Elucidation of the true catalytic species and activation mechanism of the benzylic carbon-halogen bond
The application of diaryltelluronium cations as chalcogen bonding organocatalysts was investigated for the Ritter-like reaction using time-course NMR analysis. The resistance to water of dicationic oligotelluroxanes differed depending on the oligomer chain length and counter anions. The activation mechanism of the substrate was discussed based on DFT calculations.