guanidium 2-(3-benzoylphenyl)propionate

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: guanidium 2-(3-benzoylphenyl)propionate
• 英文别名: guanidinium 2-(3-benzoylphenyl)propionate；2-(3-Benzoylphenyl)propanoic acid;guanidine；2-(3-benzoylphenyl)propanoic acid;guanidine
• 化学式: CH₅N₃*C₁₆H₁₄O₃
• 分子量: 313.356
• InChiKey: MGVBVRJCXZHQDI-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -1.21
• 重原子数：
  23
• 可旋转键数：
  3
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.12
• 拓扑面积：
  135
• 氢给体数：
  3
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  酮基布洛芬 、 碳酸胍 以 甲醇 为溶剂， 反应 0.17h， 以72%的产率得到guanidium 2-(3-benzoylphenyl)propionate
  参考文献：
  名称：

  염기 발생제, 이 염기 발생제를 함유하는 염기 반응성 조성물 및 염기 발생 방법

  摘要：

  本发明旨在提供一种广泛用于有机溶剂中的高溶解度，可直接溶解环氧化合物等碱性反应性化合物，并具有高热稳定性和低核碱性性能的强碱生成剂，含有该碱生成剂和碱性反应性化合物的碱性反应性组合物，以及生成碱的方法。 本发明涉及一种以通式（A）表示的化合物，包括该化合物的碱生成剂，含有该碱生成剂和碱性反应性化合物的碱性反应性组合物，以及生成碱的方法等。（在上述式中，R～R分别独立地表示氢原子，烷基，取代基或含取代基的芳基或含取代基的芳基烷基，R表示氢原子，烷基，烯基，烷烃基，取代基或含取代基的芳基或含取代基的芳基烷基， R表示氢原子，氨基，烷基，取代基或含取代基的芳基或含取代基的芳基烷基，Z表示特定结构的羧酸衍生物的阴离子。）

  公开号：

  KR20160025587A

文献信息

• BASE GENERATOR, BASE-REACTIVE COMPOSITION CONTAINING SAID BASE GENERATOR, AND BASE GENERATION METHOD
  申请人：WAKO PURE CHEMICAL INDUSTRIES, LTD.

  公开号：US20160122292A1

  公开（公告）日：2016-05-05

  It is a subject of the present invention to provide a base generator which has high solubility to general-purpose organic solvents, can dissolve directly into a base-reactive compound, such as an epoxy-based compound, further is provided with both performance of high heat resistance and low nucleophilicity, and generates a strong base, a base-reactive composition comprising the base generator and a base-reactive compound, as well as a method for generating a base, etc. The present invention relates to a compound represented by the general formula (A), a base generator comprising the compound, a base-reactive composition which comprises the base generator and a base-reactive compound, as well as a method for generating a base, etc. (wherein R 1 to R 5 each independently represent a hydrogen atom; an alkyl group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, R 6 represents a hydrogen atom; an alkyl group which may have a substituent; an alkenyl group; an alkynyl group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, R 7 represents a hydrogen atom; an alkyl group which may have an amino group; an aryl group which may have a substituent; or an arylalkyl group which may have a substituent, and Z − represents an anion derived from a carboxylic acid having a specific structure.)

  本发明的一个目的是提供一种基发生剂，其对通用有机溶剂具有高溶解度，可以直接溶解为一种碱反应性化合物，例如基于环氧树脂的化合物，进一步具有高耐热性和低亲核性的性能，并生成强碱，包括基发生剂和碱反应性化合物的碱反应性组合物，以及生成碱的方法等。本发明涉及一种由通式（A）表示的化合物，包括该化合物的基发生剂，包括基发生剂和碱反应性化合物的碱反应性组合物，以及生成碱的方法等。（其中R1至R5各自独立地表示氢原子；烷基基团；可能具有取代基的芳基团；或可能具有取代基的芳基烷基基团，R6表示氢原子；可能具有取代基的烷基基团；烯基基团；炔基基团；可能具有取代基的芳基团；或可能具有取代基的芳基烷基基团，R7表示氢原子；可能具有氨基的烷基基团；可能具有取代基的芳基团；或可能具有取代基的芳基烷基基团，Z-表示从具有特定结构的羧酸衍生的阴离子。）
• Compound, Photopolymerization Initiator Containing Said Compound, and Photosensitive Resin Composition Containing Said Photopolymerization Initiator
  申请人：Nippon Kayaku Kabushiki Kaisha

  公开号：US20200392079A1

  公开（公告）日：2020-12-17

  This compound which has excellent solvent solubility and compatibility with a resin, and which can generate bases and radicals with high efficiency by being irradiated with active energy rays, is represented by formula (1), where, in formula (1), R 1 , R 2 , R 3 , R 5 and R 6 represent a hydroxy group or an alkoxy group; the R 4 's independently represent an organic group containing a thioether bond; R 7 and R 9 independently represent a hydrogen atom or an alkyl group with 1 to 4 carbons; R 8 represents an alkylene group or an arylene group; and X represents an oxygen atom or a sulfur atom. A photopolymerization initiator can include said novel compound; and a photosensitive resin composition can include said photopolymerization initiator, from which a cured product can be obtained that has high sensitivity and no metal corrosion.

  这种化合物具有优异的溶剂溶解性和与树脂的兼容性，可以通过受到活性能量辐射而高效地产生碱基和自由基。该化合物由公式（1）表示，其中在公式（1）中，R1、R2、R3、R5和R6代表羟基或烷氧基；R4分别表示含硫醚键的有机基团；R7和R9分别代表氢原子或1至4个碳的烷基基团；R8代表烷基或芳基；X代表氧原子或硫原子。一种光聚合引发剂可以包括上述新化合物；一种光敏树脂组合物可以包括上述光聚合引发剂，从中可以得到高灵敏度且无金属腐蚀的固化产物。
• NOVEL COMPOUND, PHOTOPOLYMERIZATION INITIATOR COMPRISING SAID COMPOUND, AND PHOTOSENSITIVE RESIN COMPOSITION CONTAINING SAID PHOTOPOLYMERIZATION INITIATOR
  申请人：TOKYO UNIVERSITY OF SCIENCE FOUNDATION

  公开号：US20180370908A1

  公开（公告）日：2018-12-27

  The purpose of the present invention is to provide: a novel compound which can generate a base and radical upon the irradiation with an active energy ray; a photopolymerization initiator which comprises the novel compound; and a photosensitive resin composition which contains the photopolymerization initiator, has high sensitivity and excellent storage stability, and can be formed into a cured article that does not have a metal-corrosive property. The novel compound is represented by formula (1): (wherein R 1 to R 6 independently represent a hydrogen atom, a hydroxy group, an alkoxy group, an organic group other than the aforementioned substituents, or the like; X represents a residue having a structure such that n hydrogen atoms are removed from a saturated hydrocarbon containing a ring structure; and n represents an integer of 1 to 6).

  本发明的目的是提供一种新的化合物，该化合物可以在受到活性能量射线照射时产生碱和自由基；一种包含该新化合物的光聚合引发剂；以及一种含有光聚合引发剂的光敏树脂组合物，该组合物具有高灵敏度和良好的储存稳定性，并且可以形成不具有金属腐蚀性的固化物品。该新化合物由式（1）表示：（其中，R1至R6独立地表示氢原子、羟基、烷氧基、除上述取代基外的有机基团等；X表示从含有环结构的饱和碳氢化合物中去除n个氢原子后的结构残基；n表示1至6的整数）。
• PHOTOCURABLE COMPOSITION
  申请人：Cemedine Co., Ltd.

  公开号：EP3023462A1

  公开（公告）日：2016-05-25

  A rapid-curing photocurable composition exerting excellent adhesion performance even with a low cumulative light quantity and being curable in a short time, thus ensuring excellent workability, is provided. A photocurable composition is made to includes:(A) a crosslinkable silicon group-containing organic polymer; (B) a photobase generator; and (C1) a silicon compound having an Si-F bond and/or (C2) one or more fluorine-based compounds selected from the group consisting of boron trifluoride, a boron trifluoride complex, a fluorinating agent, and an alkali metal salt of a polyfluoro compound. The (B) photobase generator is preferably a photolatent tertiary amine.

  本发明提供了一种快速固化光固化组合物，该组合物即使在累积光量较低的情况下也能发挥出色的粘合性能，并能在短时间内固化，从而确保出色的施工性能。光固化组合物包括：(A) 可交联的含硅基团的有机聚合物；(B) 光基发生器；以及 (C1) 具有 Si-F 键的硅化合物和/或 (C2) 一种或多种氟基化合物，这些化合物选自由三氟化硼、三氟化硼络合物、氟化剂和多氟化合物的碱金属盐组成的组。(B)光碱发生器最好是具有光惰性的叔胺。
• CURABLE COMPOSITION, CURED COATING FILM USING SAME, AND PRINTED WIRING BOARD
  申请人：Taiyo Ink Mfg. Co., Ltd.

  公开号：EP3067374A1

  公开（公告）日：2016-09-14

  Provided are: a curable composition that shows good adhesion on a printed wiring board, particularly a flexible substrate or the like, and has a high hardness; a resist coating film of the curable composition; and a printed wiring board having a resist pattern of the resist coating film. The curable composition comprises: (A) a photobase generator; (B-1) an epoxy group-containing (meth)acrylate compound or (B-2) a carboxyl group-containing (meth)acrylate compound; (C) a photopolymerization initiator; and (D-1) a thermosetting component (excluding the (B-1) epoxy group-containing (meth)acrylate compound) or (D-2) a thermosetting component (excluding the (B-2) carboxyl group-containing (meth)acrylate compound).

  本文提供了：一种在印刷线路板（尤其是柔性基板或类似材料）上显示出良好附着性并具有高硬度的可固化组合物；该可固化组合物的抗蚀涂膜；以及具有该抗蚀涂膜的抗蚀图案的印刷线路板。可固化组合物包括：(A) 光基发生器；(B-1) 含环氧基的（甲基）丙烯酸酯化合物或 (B-2) 含羧基的（甲基）丙烯酸酯化合物；(C) 光聚合引发剂；以及 (D-1) 热固性成分（不包括 (B-1) 含环氧基的（甲基）丙烯酸酯化合物）或 (D-2) 热固性成分（不包括 (B-2) 含羧基的（甲基）丙烯酸酯化合物）。