Microwave plasma torch operating in a chamber at a low pressure
作者:Han S. Uhm、Soon C. Cho、Yong C. Hong
DOI:10.1063/1.2965459
日期:2008.8.4
A microwaveplasmatorch was operated in a chamber at a reduced pressure, and the properties of the torchplasma were investigated. The argon torchplasma at a reduced pressure of 150Torr was observed to be well diffused in the discharge tube instead of the filamentary structures at the atmospheric pressure. The typical torchplasma density and electron temperature are measured to be ne=2×1014∕cm3
NF3 decomposition behind shock waves in the intermediate pressure range
作者:N.N. Kudriavtsev、A.M. Sukhov、D.P. Shamshev
DOI:10.1016/0009-2614(92)80103-i
日期:1992.12
Rates of NF3 thermal decomposition in the temperature range 1450–2050 K and pressure range 1.2–4.2 atm were measured by a shock tube technique. NF3 decomposition was monitored by UVabsorption of the produced NF2 radicals. The bimolecular rate constant of the NF3 decomposition reaction essentially depends upon pressure. An empirical formula was obtained from the experimental data which correctly expresses
Reactions forming electronically-excited free radicals. Part 2.—Formation of N<sup>4</sup>S, N<sup>2</sup>D and N<sup>2</sup>P atoms in the H + NF<sub>2</sub>reaction, and N atom reactions
作者:Chew Toong Cheah、Michael A. A. Clyne
DOI:10.1039/f29807601543
日期:——
The kinetics of reactions (at 298 K) involving ground-state N 4S and excited-state N 2D, 2P atoms have been studied using resonance-fluorescence detection in a discharge-flow system. The N 4S+ NO reaction has been studied as a reference reaction: N 4S+ NO [graphicomitted] N2+ O; k1=(3.4 ± 0.3)× 10–11 cm3 molecule–1 s–1(1σ). Also, the rate constant k2 for the N 4S+ NF2 reaction has been determined:
在放电流系统中使用共振荧光检测研究了涉及基态N 4 S和激发态N 2 D,2 P原子的反应动力学(在298 K下)。已经研究了N 4 S + NO反应作为参考反应:N 4 S + NO [省略图示] N 2 + O; k 1 =(3.4±0.3)×10 –11 cm 3分子–1 s –1(1σ)。另外,N 4 S + NF的速率常数k 2已确定2反应:N 4 S + NF 2 [图中省略] 2 NF; k 2 =(4.6±0.3)×10 –12 cm 3分子–1 s –1( 1σ)。将反应ħ 2小号+ NF 2给出了NF的基团一个1个Δ状态与分支比0.9:H 2小号+ NF 2 →NF一个1 Δ+ HF X 1 Σ +。该结论是根据对N 4浓度分布的研究得出的。小号和N 2个d的状态下-选择性的反应原子(4一),(4 b):H 2小号+ NF一个1 Δ→Ñ 2 d + HF X 1 Σ +(4一),H
作者:Chew Toong Cheah、Michael A. A. Clyne、Philip D. Whitefield
DOI:10.1039/f29807600711
日期:——
and secondary processes in the overall reaction of H 2S atoms with NF2 radicals from 298 to 550 K. Rate constants for the following elementary reactions have been determined directly [k298/cm3 molecule–1 s–1(1 σ)]: H + NF2 [graphic omitted] HF + NF; k1=(1.5 ± 0.2)× 10–11; O + NF2 [graphic omitted] NF + FO; k5=(1.8 ± 0.9)× 10–12; N + NF2 [graphic omitted] NF + NF; k8=(3.0 ± 1.2)× 10–12.
远真空紫外线中的原子共振吸收和原子共振荧光已被用于研究H 2 S原子与298 2至550 K的NF 2自由基整体反应中一级和二级过程的动力学。以下基本反应的速率常数已直接确定[ k 298 / cm 3分子– 1 s – 1(1σ)]:H + NF 2 [未显示图形] HF + NF;k 1 =(1.5±0.2)×10 –11 ; O + NF 2 [省略图示] NF + FO;k 5 =(1.8±0.9)×10–12 ; N + NF 2 [省略图示] NF + NF;k 8 =(3.0±1.2)×10 –12。