5-pentafluorobenzylbicyclo[2.2.1]hept-2-ene

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 5-pentafluorobenzylbicyclo[2.2.1]hept-2-ene
• 英文别名: 5-[(2,3,4,5,6-Pentafluorophenyl)methyl]bicyclo[2.2.1]hept-2-ene
• 化学式: C₁₄H₁₁F₅
• 分子量: 274.233
• InChiKey: HCMKEKGUPMRUOO-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.5
• 重原子数：
  19
• 可旋转键数：
  2
• 环数：
  3.0
• sp3杂化的碳原子比例：
  0.43
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  5

反应信息

• 作为产物：
  描述：

  二聚环戊二烯 、 烯丙基五氟苯 反应 48.0h， 生成 5-pentafluorobenzylbicyclo[2.2.1]hept-2-ene
  参考文献：
  名称：

  [EN] ROMP WITH FLUORINATED GROUPS
  [FR] POLYMERISATION PAR METATHESE AVEC OUVERTURE DE CYCLE AVEC DES GROUPES FLUORES

  摘要：

  公开号：

  WO2005028402A3

文献信息

• GATE INSULATOR LAYER FOR ORGANIC ELECTRONIC DEVICES
  申请人：Mueller David Christoph

  公开号：US20120056183A1

  公开（公告）日：2012-03-08

  Embodiments in accordance with the present invention provide for the use of polycycloolefins in electronic devices and more specifically to the use of such polycycloolefins as gate insulator layers used in the fabrication of electronic devices, the electronic devices that encompass such polycycloolefin gate insulator and processes for preparing such polycycloolefin gate insulator layers and electronic devices encompassing such layers.

  本发明实施例提供了在电子设备中使用多环烯烃的方法，更具体地，提供了使用此类多环烯烃作为电子设备制造中用于制造栅绝缘层的栅绝缘层的方法，以及包括此类多环烯烃栅绝缘层的电子设备和制备此类多环烯烃栅绝缘层和包括此类层的电子设备的工艺。
• INTERLAYER FOR ELECTRONIC DEVICES
  申请人：Mueller David Christoph

  公开号：US20120056249A1

  公开（公告）日：2012-03-08

  Embodiments in accordance with the present invention provide for the use of polycycloolefins in electronic devices and more specifically to the use of such polycycloolefins as interlayers applied to fluoropolymer layers used in the fabrication of electronic devices, the electronic devices that encompass such polycycloolefin interlayers and processes for preparing such polycycloolefin interlayers and electronic devices.

  本发明的实施例提供了在电子设备中使用多环氧烷烃的方法，更具体地，是将这种多环氧烷烃用作在制造电子设备时应用于氟聚合物层的中间层，包括这种多环氧烷烃中间层的电子设备以及制备这种多环氧烷烃中间层和电子设备的方法。
• SEMICONDUCTOR DEVICE
  申请人：Sumitomo Bakelite Company, Limited

  公开号：EP1801872A1

  公开（公告）日：2007-06-27

  Disclosed is a semiconductor device having a wafer level package structure which is characterized by containing a resin layer composed of a resin composition which is curable at 250°C or less. Such a semiconductor device having a wafer level package structure is excellent in low stress properties, solvent resistance, low water absorbency, electrical insulation properties, adhesiveness and the like.

  本发明公开了一种具有晶圆级封装结构的半导体器件，其特点是含有由可在 250°C 或更低温度下固化的树脂组合物构成的树脂层。这种具有晶圆级封装结构的半导体器件在低应力特性、耐溶剂性、低吸水性、电绝缘特性、粘合性等方面都非常出色。
• SEMICONDUCTOR WAFER AND SEMICONDUCTOR DEVICE
  申请人：Sumitomo Bakelite Company, Limited

  公开号：EP1804291A1

  公开（公告）日：2007-07-04

  Disclosed is a semiconductor wafer which is characterized in that a resin layer composed of a resin composition containing a cyclic olefin resin (A) having an epoxy group and a photoacid generator (B) is arranged on a surface on which a circuit element is formed, and the residual stress of the resin layer after curing is 1-20 MPa. Also disclosed is a semiconductor device comprising such a semiconductor wafer.

  本发明公开了一种半导体晶片，其特征在于在形成电路元件的表面上布置了由包含具有环氧基团的环烯烃树脂（A）和光酸发生器（B）的树脂组合物构成的树脂层，固化后树脂层的残余应力为 1-20 兆帕。此外，还公开了一种由这种半导体晶片组成的半导体器件。
• Fluorine free photopatternable phenol functional group containing polymer compositions
  申请人：PROMERUS, LLC

  公开号：US10054854B2

  公开（公告）日：2018-08-21

  Various polycycloolefinic polymers containing phenolic pendent groups and compositions thereof useful for forming self-imageable films encompassing such polymers are disclosed. Such polymers encompass norbornene-type repeating units containing phenolic pendent groups which contain very low levels of fluorine containing monomers. The films formed from such polymer compositions provide self imageable, low-k, thermally stable layers for use in microelectronic and optoelectronic devices.

  本发明公开了各种含酚醛悬垂基团的聚环烯烃聚合物及其用于形成包含此类聚合物的自成像薄膜的组合物。此类聚合物包含降冰片烯类重复单元，其中含有含氟单体含量极低的酚醛悬垂基团。由此类聚合物组合物形成的薄膜具有自成像、低 K 值、热稳定的特性，可用于微电子和光电设备。