申请人:Boudreault Pierre-Luc T.
公开号:US08927749B2
公开(公告)日:2015-01-06
A compound according to a formula I and devices incorporating the same are described. The compound according to the formula I can have the structure:
wherein X is Si or Ge; R1 and R2 represent mono, di, tri, tetra, or penta substitutions or no substitution; R3, R4 represent mono, di, tri, or tetra substitutions or no substitution; R1 and R2 are optionally joined to form a ring, which may be further substituted; L is a single bond or comprises an aryl or heteroaryl group having from 5-20 carbon atoms, which is optionally further substituted; and A is an aromatic group. A contains a group selected from the group consisting of indole, carbazole, benzofuran, dibenzofuran, benzothiophene, dibenzothiophene, benzoselenophene, dibenzoselenophene, triphenylene, azacarbazole, azadibenzofuran, azadibenzothiophene, azadibenzoselenophene, azatriphenylene, and combinations thereof, which are optionally further substituted. The device can include the compound according to Formula I in an organic layer.
本文描述了一种按公式I制备的化合物和包含该化合物的设备。公式I的化合物可以具有以下结构:其中X为Si或Ge;R1和R2代表单、双、三、四或五个取代基或无取代基;R3、R4代表单、双、三或四个取代基或无取代基;R1和R2可以选择结合形成环,该环可以进一步取代;L是单键或包括有5-20个碳原子的芳基或杂环芳基基团,可以选择进一步取代;A是芳香基团。A包含从吲哚、咔唑、苯并呋喃、二苯并呋喃、苯并噻吩、二苯并噻吩、苯并硒吩、二苯并硒吩、三苯基烯、氮杂咔唑、氮杂二苯并呋喃、氮杂二苯并噻吩、氮杂二苯并硒吩、氮杂三苯基烯和其组合物中选择的基团,可以选择进一步取代。该设备可以在有机层中包括公式I的化合物。