N,N-dihydroxyethylaniline

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: N,N-dihydroxyethylaniline
• 英文别名: 2-ethyl-N,N-dihydroxyaniline
• 化学式: C₈H₁₁NO₂
• 分子量: 153.181
• InChiKey: GUXQOHMLFVAZAH-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  1.9
• 重原子数：
  11
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.25
• 拓扑面积：
  43.7
• 氢给体数：
  2
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  N,N-dihydroxyethylaniline 、 manganese(II) benzoate 在 phosphotungstic acid 作用下， 以96.1%的产率得到4-苯基吗啉
  参考文献：
  名称：

  一种连续化生产4-苯基吗啉的方法

  摘要：

  为了解决现有合成工艺的诸多缺陷，本发明的目的在于提供一种以N,N‑二羟乙基苯胺为原料，磷钨酸作为催化剂，在苯甲酸锰盐介质中高温反应获得4‑苯基吗啉的方法，与已经报道的方法相比较，反应原料经济易得、操作简单、安全环保、催化剂循环使用、可连续化生产、生产效率高。

  公开号：

  CN109422706A

文献信息

• DENTAL ADHESIVE COMPOSITION
  申请人：Matsushige Koji

  公开号：US20120238658A1

  公开（公告）日：2012-09-20

  [Problems] To provide a liquid dental adhesive composition which contains a phosphoric acid-type compound having a hydrogenphosphoric diester group as an acidic group-containing polymerizable monomer and, further, contains polyvalent metal ions, effectively preventing not only the gelation but also the formation of precipitates (cloudiness) during the storage. [Means for Solution] A dental adhesive composition which is acidic and contains an acidic group-containing polymerizable monomer (A), polyvalent metal ions (B), water (C), a water-soluble organic solvent (D) and fluoride ions (E), wherein at least 35% by mole of the acidic group-containing polymerizable monomer (A) is a phosphoric acid-type compound having a hydrogenphosphoric diester group, and the contents of the fluoride ions (E) and the polyvalent metal ions (B) are so set that a valence number ratio (R F ) defined by the following formula (1): R F =V F /TV P (1) wherein V F is a valence number of the fluoride ions (E) contained in the composition, and TV P is a total valence number of the polyvalent metal ions (B) contained in the composition, satisfies a range of 0.2 to 2.0.

  提供一种液体牙科粘合剂组合物，其中包含具有氢磷酸二酯基团作为酸性基团的聚合可单体的磷酸型化合物，并且进一步含有多价金属离子，有效地防止在储存期间不仅凝胶化，还防止沉淀（混浊）的形成。解决方案是一种含有酸性和含有酸性基团的聚合可单体（A）、多价金属离子（B）、水（C）、水溶性有机溶剂（D）和氟离子（E）的牙科粘合剂组合物，其中至少35%的含有酸性基团的聚合可单体（A）是具有氢磷酸二酯基团的磷酸型化合物，并且氟离子（E）和多价金属离子（B）的含量设置得使得以下公式（1）定义的价数比率（RF）满足0.2至2.0的范围：RF=VF/TVP（1）其中VF是组合物中含有的氟离子（E）的价数，而TVP是组合物中含有的多价金属离子（B）的总价数。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PHOTOMASK, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, COMPOUND, AND METHOD FOR PRODUCING COMPOUND
  申请人：FUJIFILM Corporation

  公开号：US20160280621A1

  公开（公告）日：2016-09-29

  The composition contains an alkali-soluble resin and a crosslinking agent that is represented by the following General Formula (I). In the formula, each of R 1 and R 6 independently represents a hydrogen atom or a hydrocarbon group having 5 or less carbon atoms; each of R 2 and R 5 independently represents an alkyl group, a cycloalkyl group, an aryl group, or an acyl group; and each of R 3 and R 4 independently represents a hydrogen atom or an organic group having 2 or more carbon atoms, and R 3 and R 4 may be bonded to each other to form a ring.

  该组合物包含一种碱溶性树脂和一种由下列通式（I）表示的交联剂。在该式中，R1和R6各自独立地表示氢原子或具有5个或更少碳原子的碳氢基团；R2和R5各自独立地表示烷基、环烷基、芳基或酰基；R3和R4各自独立地表示氢原子或具有2个或更多碳原子的有机基团，且R3和R4可以结合形成环。
• COMPOUND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20160024005A1

  公开（公告）日：2016-01-28

  There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a compound represented by the following formula (1) or (2), and the formula (1) and (2) are defined as herein, and a resist film comprising the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method comprising a step of exposing the resist film, and a step of developing the exposed film, and a method for manufacturing an electronic device, comprising the pattern forming method, and an electronic device manufactured by the manufacturing method of an electronic device.

  提供了一种包含下列式子（1）或（2）所代表的化合物的光致射线敏感或辐射敏感的树脂组合物，其中式（1）和（2）的定义如本文所述，以及包括该光致射线敏感或辐射敏感的树脂组合物的光阻膜，以及包括曝光光阻膜的步骤和显影曝光膜的步骤的图案形成方法，以及包括图案形成方法的制造电子装置的方法，以及由电子装置的制造方法制造的电子装置。
• ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, MASK BLANK PROVIDED WITH ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, ELECTRONIC DEVICE, AND COMPOUND
  申请人：FUJIFILM Corporation

  公开号：US20160280675A1

  公开（公告）日：2016-09-29

  The actinic ray-sensitive or radiation-sensitive resin composition includes a crosslinking agent having a polarity converting group and an alkali-soluble resin, in which the polarity converting group is a group capable of decomposing by the action of an alkaline aqueous solution to generate a carboxylic acid or sulfonic acid on the side having a crosslinking group.

  感光树脂或辐射敏感树脂组合物包括具有极性转换基团和可溶于碱性树脂的交联剂，其中极性转换基团是一种能够通过碱性水溶液作用分解并在具有交联基团的侧面生成羧酸或磺酸的基团。
• ACTINIC-RAY- OR RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD OF FORMING PATTERN USING THE COMPOSITION
  申请人：Takahashi Hidenori

  公开号：US20120156618A1

  公开（公告）日：2012-06-21

  According to one embodiment, an actinic-ray- or radiation-sensitive resin composition includes a resin (P) containing not only at least one repeating unit (A) that when exposed to actinic rays or radiation, is decomposed to thereby generate an acid and is expressed by any of general formulae (I) to (III) below but also a repeating unit (B) containing at least an aromatic ring group provided that the repeating unit (B) does not include any of those of general formulae (I) to (III). (The characters used in general formulae (I) to (III) have the meanings mentioned in the description.)

  根据一种实施例，一种感光射线或辐射敏感的树脂组合物包括树脂（P），该树脂不仅包含至少一个重复单元（A），当暴露于感光射线或辐射时，分解从而产生酸，并由下列任一通式（I）至（III）表示，而且还包括一个重复单元（B），其中至少包含一个芳香环基团，前提是重复单元（B）不包括通式（I）至（III）中的任何一个。（通式（I）至（III）中使用的字符在描述中有所提及。）