Adhesive for temporary bonding, adhesive layer, wafer work piece and method for manufacturing semiconductor device using same, rework solvent, polyimide copolymer, polyimide mixed resin, and resin composition
申请人:TORAY INDUSTRIES, INC.
公开号:US10177022B2
公开(公告)日:2019-01-08
The present invention provides a temporary-bonding adhesive having excellent heat resistance, whereby a semiconductor circuit formation substrate and a support substrate can be bonded by a single type of adhesive layer, the adhesive force thereof does not change over the course of steps for manufacturing a semiconductor device or the like, and the adhesive can subsequently be easily de-bonded at room temperature under mild conditions; and a method for manufacturing a semiconductor device using the temporary-bonding adhesive. The present invention includes a temporary-bonding adhesive wherein a polyimide copolymer having at least an acid dianhydride residue and a diamine residue, the diamine residue including both of (A1) a polysiloxane-based diamine residue represented by a general formula (1) in which n is a natural number from 1 to 15, and (B1) a polysiloxane-based diamine residue represented by a general formula (1) in which n is a natural number from 16 to 100, the polyimide copolymer containing 40-99.99 mol % of the (A1) residue and 0.01-60 mol % of the (B1) residue.
本发明提供了一种具有优异耐热性的临时粘接剂,据此可通过单一类型的粘接剂层粘接半导体电路形成基板和支撑基板,其粘接力在制造半导体器件或类似物的步骤过程中不会发生变化,并且该粘接剂随后可在室温温和条件下轻松脱粘;以及一种使用该临时粘接剂制造半导体器件的方法。本发明包括一种临时粘合粘合剂,其中聚酰亚胺共聚物至少具有酸二酐残基和二胺残基,二胺残基包括(A1)由通式(1)表示的聚硅氧烷基二胺残基(其中n为1至15的自然数)和(B1)由通式(1)表示的聚硅氧烷基二胺残基(其中n为16至100的自然数)中的两种,聚酰亚胺共聚物含有40-99.99摩尔%的(A1)残余物和0.01-60摩尔%的(B1)残余物。