十三烷基苯磺酸TEA盐 | 59599-58-5

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 中文名称: 十三烷基苯磺酸TEA盐
• 英文名称: 2-[Bis(2-hydroxyethyl)amino]ethanol;4-tridecylbenzenesulfonic acid
• CAS: 59599-58-5
• 化学式: C25H47NO6S
• 分子量: 489.7
• InChiKey: MQQNFMZFQZVCDC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4.05
• 重原子数：
  33
• 可旋转键数：
  19
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.76
• 拓扑面积：
  127
• 氢给体数：
  4
• 氢受体数：
  7

文献信息

• PHOTORESIST STRIPPING SOLUTIONS
  申请人：LEE WAI MUN

  公开号：US20110146724A1

  公开（公告）日：2011-06-23

  The present invention discloses a photoresist stripper for removing positive and negative tone photoresist, bonding adhesive, ink mark and post etch residue etc. from semiconductor substrates. The photoresist stripper comprises: a) one or more organic sulfonic acids with a structure of where R can be alkyl, substituted alkyl, aryl, substituted aryl and alkylaryl, and n is 1 or higher; and b) one or more alkanolamine; one or more alkanolamine with the structure of wherein R1 and R2 can be H, alkyl, aryl, alkylaryl, arylalkyl, alkyl alcohol, aryl alcohol, alkyaryl alcohol or arylalkyl alcohol and R3 is alkyl alcohol, aryl alcohol, alkyaryl alcohol or arylalkyl alcohol or the like. c) Optionally, one or more halogen free organic solvents. d) Optionally, one or more corrosion inhibitors Optionally, the photoresist stripper further comprises other surfactants.