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十五烷酸钙 | 4211-44-3

中文名称
十五烷酸钙
中文别名
——
英文名称
1,3-Bis(hydroxymethyl)-4,5-dimethoxyimidazolidin-2-one
英文别名
——
十五烷酸钙化学式
CAS
4211-44-3
化学式
C7H14N2O5
mdl
——
分子量
206.2
InChiKey
HLMMQBJMGNRPFQ-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

计算性质

  • 辛醇/水分配系数(LogP):
    -1.1
  • 重原子数:
    14
  • 可旋转键数:
    4
  • 环数:
    1.0
  • sp3杂化的碳原子比例:
    0.86
  • 拓扑面积:
    82.5
  • 氢给体数:
    2
  • 氢受体数:
    5

文献信息

  • Method of manufacturing a bonded particulate article by reacting a polyol and a heterocyclic compound
    申请人:AMERICAN CYANAMID COMPANY
    公开号:EP0223113A2
    公开(公告)日:1987-05-27
    Disclosed herein is a method of manufacturing a bonded particulate article by admixing particulate material with a binder system, the binder system being formed by admixing a polyol selected from the group comprising a saccharide, a saccharide polymer, and a glyco protein with a heterocyclic compound of the formula wherein R1 and R2 are, independently, aryl of from 6 to 12 carbon atoms, alkyl of from 1 to 6 carbon atoms or substituted alkyl of from 1 to 6 carbon atoms wherein the substituting group is hydroxy, alkoxy of from 1 to 6 carbon atoms, hydroxyalkoxy of from 1 to 6 carbon atoms, cyano, carboxy, carbalkoxy of from 1 to 7 carbon atoms or carbamoyl, or when R1 is -CxH2x-, R2 is -CxH2xO-, x being from 1 to 6, X is oxygen, sulfur or imino and Z is a divalent bridging radical, with a solvent, and an acid effective to control the rate of crosslinking between said polyol and said heterocyclic compound; forming the admixture in a shape; and curing to form the bonded article.
    本发明公开了一种通过将微粒材料与粘合剂体系混合来制造粘合微粒制品的方法,该粘合剂体系是通过将选自包括糖、糖聚合物和糖蛋白的多元醇与式中的杂环化合物混合而形成的。 其中 R1 和 R2 独立地为 6 至 12 个碳原子的芳基、1 至 6 个碳原子的烷基或 1 至 6 个碳原子的取代烷基,其中取代基为羟基、1 至 6 个碳原子的烷氧基、1 至 6 个碳原子的羟基烷氧基、基、羧基、1 至 7 个碳原子的羧基烷氧基、当 R1 为-CxH2x-,R2 为-CxH2xO-,x 为 1 至 6,X 为氧、或亚基,Z 为二价桥基时;将混合物制成一定形状;并固化以形成粘合制品。
  • Positive photosensitive resin composition, patterned cured film production method, patterned cured film, and electronic component
    申请人:Hitachi Chemical Dupont Microsystems, Ltd.
    公开号:US11048167B2
    公开(公告)日:2021-06-29
    A positive photosensitive resin composition comprising (a) polybenzoxazole precursor, (b) a cross-linking agent, (c) a diazonaphoquinone compound, (d) an iodonium compound and (e) a solvent.
    一种正性光敏树脂组合物,包括 (a) 聚苯并恶唑前体,(b) 交联剂,(c) 重氮醌化合物,(d) 鎓化合物和 (e) 溶剂。
  • PHOTOSENSITIVE RESIN COMPOSITION, PROCESS FOR PRODUCING PATTERNED HARDENED FILM WITH USE THEREOF AND ELECTRONIC PART
    申请人:Hitachi Chemical DuPont Microsystems, Ltd.
    公开号:EP2133743B1
    公开(公告)日:2018-01-24
  • ANTIMICROBIAL POROUS SILICON OXIDE PARTICLES
    申请人:Bujard Patrice
    公开号:US20090214606A1
    公开(公告)日:2009-08-27
    The present invention relates to antimicrobial, porous particles, especially porous, non-platelet-like SiO2 particles, comprising an organic, or inorganic antimicrobial compound, or composition, with the proviso that the porous particles are not porous SiOz flakes, wherein 0.70
  • SPIN-ON SPACER MATERIALS FOR DOUBLE- AND TRIPLE-PATTERNING LITHOGRAPHY
    申请人:Lin Qin
    公开号:US20100170868A1
    公开(公告)日:2010-07-08
    Novel double- and triple-patterning methods are provided. The methods involve applying a shrinkable composition to a patterned template structure (e.g., a structure having lines) and heating the composition. The shrinkable composition is selected to possess properties that will cause it to shrink during heating, thus forming a conformal layer over the patterned template structure. The layer is then etched to leave behind pre-spacer structures, which comprise the features from the pattern with remnants of the shrinkable composition adjacent the feature sidewalls. The features are removed, leaving behind a doubled pattern. In an alternative embodiment, an extra etch step can be carried out prior to formation of the features on the template structure, thus allowing the pattern to be tripled rather than doubled.
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