申请人:Fujisawa Pharmaceutical Co., Ltd.
公开号:US04650804A1
公开(公告)日:1987-03-17
The invention relates to novel quinolizinone compounds having inhibitory activity on allergies and ulcers, of the formula: ##STR1## wherein R.sup.1 is tetrazolylcarbamoyl; R.sup.7 is hydrogen or aryl selected from phenyl, tolyl, xylyl, cumenyl, naphthyl and biphenylyl; R.sup.2 is hydrogen, hydroxy, lower alkyl or lower alkoxy; R.sup.3 is hydrogen, hydroxy, lower alkyl, lower alkoxy, lower alkenyloxy, phenyl, napthyl, biphenylyl, phenyl having one or more substituent(s) selected from halogen, lower alkyl and lower alkoxy, arylthio selected from phenylthio, tolylthio, xylylthio, cumenylthio, naphthylthio and biphenylthio, aroyl selected from benzoyl, toluoyl and naphthoyl, ar(lower)alkyl selected from phenyl(lower)alkyl, tolyl(lower)alkyl, xylyl(lower)alkyl, cumenyl(lower)alkyl, naphthyl(lower)alkyl and biphenylyl(lower)alkyl, arenesulfonyl selected from benzenesulfonyl and p-toluenesulfonyl, arylamino selected from phenylamino, naphthylamino, biphenylylamino, phenylamino having lower alkyl on the nitrogen atom or aryloxy selected from phenoxy and tolyloxy; or pharmaceutically acceptable salts thereof.
该发明涉及一种具有对过敏和溃疡具有抑制活性的新型喹诺利酮化合物,其化学式为:其中R.sup.1为四唑基甲酰基;R.sup.7为氢或苯基,所述苯基选自苯基、甲苯基、二甲苯基、辛基、萘基和联苯基;R.sup.2为氢、羟基、低碳基或低烷氧基;R.sup.3为氢、羟基、低碳基、低烷氧基、低烯烷氧基、苯基、萘基、联苯基、苯基具有一个或多个取代基所选自卤素、低烷基和低烷氧基、芳基硫基所选自苯硫基、甲苯硫基、二甲苯硫基、辛基硫基、萘硫基和联苯硫基、芳酰基所选自苯甲酰基、甲苯甲酰基和萘甲酰基、芳基烷基所选自苯基烷基、甲苯基烷基、二甲苯基烷基、辛基烷基、萘基烷基和联苯基烷基、芳基磺酰基所选自苯磺酰基和对甲苯磺酰基、芳基氨基所选自苯氨基、萘氨基、联苯基氨基、苯氨基氮原子上具有低碳基或芳氧基所选自苯氧基和甲苯氧基;或其药学上可接受的盐。