申请人:RAHMAN M. Dalil
公开号:US20140370444A1
公开(公告)日:2014-12-18
The present invention relates to an absorbing hard mask antireflective coating composition comprising a novel polymer, where the novel polymer comprises in the backbone of the polymer four repeat units -A-, -B-, -C- and -D-, where A is repeat unit which comprises a fused aromatic ring in its backbone, B has the structure (1), C is a hydroxylbiphenyl of structure (2) and D is a derivatized fluorene of structure (3),
where R
1
is C
1
-C
4
alkyl, R
2
is C
1
-C
4
alkyl, R
3
and R
4
are independently hydrogen or C
1
-C
4
alkyl, and Ar′ and Ar″ are independently phenylenic, or naphthalenic derived moieties, R
5
and R
6
are independently —OH or —CH
2
)
n
OH where n=2-4, and R
7
and R
8
are independently hydrogen or C
1
-C
4
alkyl. This invention also relates to a process for forming an image using the novel antireflective coating composition.
本发明涉及一种吸收硬掩膜抗反射涂层组合物,其包括一种新型聚合物,其中该新型聚合物在其聚合物骨架中包含四个重复单元-A-,-B-,-C-和-D-,其中A是包含融合芳香环的重复单元,B具有结构(1),C是结构(2)的羟基联苯,D是结构(3)的衍生物芴,其中R1是C1-C4烷基,R2是C1-C4烷基,R3和R4独立地为氢或C1-C4烷基,Ar′和Ar″独立地为苯基或萘基衍生物,R5和R6独立地为—OH或—CH2)nOH,其中n=2-4,R7和R8独立地为氢或C1-C4烷基。本发明还涉及使用新型抗反射涂层组合物形成图像的过程。