Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography
申请人:Feiring E. Andrew
公开号:US20060167284A1
公开(公告)日:2006-07-27
The present invention provides novel fluorine-containing copolymers which comprise at least one fluorinated olefin, at least one polycyclic ethylenically unsaturated monomer with a fused 4-membered heterocyclic ring and, optionally, other components. The copolymers are useful for photoimaging compositions and, in particular, photoresist compositions (positive-working and/or negative-working) for imaging in the production of semiconductor devices. The copolymers are especially useful in photoresist compositions having high UV transparency (particularly at short wavelengths, e.g., 157 nm) which are useful as base resins in resists and potentially in many other applications.
本发明提供了一种新型的含氟共聚物,其包括至少一种含氟烯烃,至少一种具有融合的4-成员杂环环的多环乙烯不饱和单体,以及可选的其他组分。这些共聚物对于光刻成分特别是用于半导体器件生产中成像的光刻成分(正作用和/或负作用)非常有用。这些共聚物在具有高紫外透明度的光刻成分中特别有用(特别是在短波长,例如157纳米处),这些光刻成分可用作光刻胶的基础树脂,并且潜在地在许多其他应用中也很有用。