Polymer, resist composition containing polymer, and method for manufacturing device using same
申请人:TOYO GOSEI CO., LTD.
公开号:US10781276B2
公开(公告)日:2020-09-22
An object of the present invention is to provide a polymer used for a resist composition having high absorption efficiency for a particle beam or an electromagnetic wave, and excellence in sensitivity, resolution and pattern performance characteristics, and provide a resist composition containing the polymer and a method of manufacturing a device using thereof.
The polymer comprises: a unit A; and a unit B, wherein the unit A has an onium salt structure and generates a first radical by irradiation with a particle beam or an electromagnetic wave, the unit B has a radical generating structure containing at least one multiple bond which is between a carbon atom and a carbon atom or between a carbon atom and a heteroatom, and generates a second radical by irradiation with a particle beam or an electromagnetic wave, and the multiple bond is not one contained in a benzenoid aromatic.
本发明的目的是提供一种用于抗蚀剂组合物的聚合物,该聚合物对粒子束或电磁波具有较高的吸收效率,并具有优异的灵敏度、分辨率和图案性能特征,同时还提供一种含有该聚合物的抗蚀剂组合物以及使用该聚合物制造设备的方法。
该聚合物包括:单元 A 和单元 B,其中单元 A 具有鎓盐结构,通过粒子束或电磁波的辐照产生第一自由基;单元 B 具有自由基生成结构,其中包含至少一个位于碳原子和碳原子之间或碳原子和杂原子之间的多重键,通过粒子束或电磁波的辐照产生第二自由基,且该多重键不包含在苯环芳香族中。
SYNTHESIS OF STABLE, WATER-SOLUBLE CHEMILUMINESCENT 1,2-DIOXETANES AND INTERMEDIATES THEREFOR