A system having a deposition chamber comprising a xenon excimer lamp and an inlet for deposition of a lubricant into the deposition chamber, wherein the deposition chamber has an ability to perform both a vapor deposition of the lubricant and an in-situ UV exposure of the lubricant is disclosed. Also, a method including depositing a lubricant on a magnetic recording medium in a deposition chamber and in-situ UV exposing of the lubricant to irradiation from a xenon excimer lamp is disclosed.
Ex-situ vapor phase lubrication for magnetic recording media
申请人:Stirniman Michael J.
公开号:US20080075854A1
公开(公告)日:2008-03-27
The embodiments of the invention relate to a lubrication system and a lubrication method, wherein the system contains pre-lubrication chamber for pre-treating a surface of a magnetic recording medium prior to deposition of a lubricant and a deposition chamber having an inlet for deposition of the lubricant on the surface of the magnetic recording medium in the deposition chamber, wherein the lubrication system is a stand alone lubrication system that is seperate from a magnetic layer deposition system for depositing a magnetic layer of the magnetic recording medium.
ADVANCED LUBRICANT FOR THIN FILM STORAGE MEDIUM
申请人:Liu Jianwei
公开号:US20080305975A1
公开(公告)日:2008-12-11
A magnetic recording medium comprising a lubricant film comprising a photosynthesized lubricant having a single phase composition of at least a lubricant moiety and an additive moiety is disclosed.
POSITIVE RESIST COMPOSITION, METHOD OF FORMING RESIST PATTERN, POLYMERIC COMPOUND, AND COMPOUND
申请人:Utsumi Yoshiyuki
公开号:US20100273106A1
公开(公告)日:2010-10-28
A positive resist composition including a base component (A) which exhibits increased solubility in an alkali developing solution under the action of acid and an acid generator component (B) which generates acid upon exposure, wherein the base component (A) includes a polymeric compound (A1) having a structural unit (a0) containing an acid-dissociable, dissolution-inhibiting group, and the acid-dissociable, dissolution-inhibiting group has a 1,3-dioxole skeleton.