methacrylic acid-[1-(2-chloro-phenyl)-ethyl ester]

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: methacrylic acid-[1-(2-chloro-phenyl)-ethyl ester]
• 英文别名: (+/-)-1-Methacryloyloxy-1-(2-chlor-phenyl)-aethan；Methacrylsaeure-[1-(2-chlor-phenyl)-aethylester]；1-(2-Chlorophenyl)ethyl 2-methylprop-2-enoate
• 化学式: C₁₂H₁₃ClO₂
• 分子量: 224.687
• InChiKey: NYYZJEUHEMGCKM-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.6
• 重原子数：
  15
• 可旋转键数：
  4
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.25
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

反应信息

• 作为产物：
  描述：

  甲基丙烯酸酐 、 1-(2-氯苯基)乙醇 在 吡啶 、 铜 作用下， 生成 methacrylic acid-[1-(2-chloro-phenyl)-ethyl ester]
  参考文献：
  名称：

  Methacrylic esters and copolymers thereof

  摘要：

  公开号：

  US02404267A1

文献信息

• COMPOSITION HAVING REFRACTIVE INDEX SENSITIVELY CHANGEABLE BY RADIATION AND METHOD FOR FORMING REFRACTIVE INDEX PATTERN
  申请人：JSR Corporation

  公开号：EP1235104A1

  公开（公告）日：2002-08-28

  A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a lower refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) a stabilizer. By exposing the composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion are decomposed and a refractive index difference is made between the exposed portion and unexposed portion, thereby forming a pattern having different refractive indices.

  一种对辐射敏感的折射率变化组合物，包括：（A）可分解化合物；（B）折射率低于可分解化合物（A）的不可分解化合物；（C）对辐射敏感的分解剂；以及（D）稳定剂。通过图案掩膜将组合物暴露在辐射下，暴露部分的上述成分（C）和（A）被分解，暴露部分和未暴露部分之间产生折射率差，从而形成具有不同折射率的图案。
• Radiation sensitive refractive index changing composition and refractive index changing method
  申请人：JSR Corporation

  公开号：EP1323742A2

  公开（公告）日：2003-07-02

  A radiation sensitive refractive index changing composition whose refractive index of a material is changed by a simple method, whose changed refractive index difference is sufficiently large, and which can provide a stable refractive index pattern and a stable optical material regardless of their use conditions. The radiation sensitive refractive index changing composition comprises (A) a polymerizable compound, (B) a non-polymerizable compound having a lower refractive index than the polymer of the polymerizable compound (A), and (C) a radiation sensitive polymerization initiator.

  一种辐射敏感折射率改变组合物，其材料的折射率可通过简单的方法改变，改变后的折射率差足够大，并且无论使用条件如何，都能提供稳定的折射率图案和稳定的光学材料。 辐射敏感折射率变化组合物包括：(A) 可聚合化合物；(B) 折射率低于可聚合化合物 (A) 聚合物的不可聚合化合物；(C) 辐射敏感聚合引发剂。
• RADIATION-SENSITIVE COMPOSITION CHANGING IN REFRACTIVE INDEX AND METHOD OF CHANGING REFRACTIVE INDEX
  申请人：JSR Corporation

  公开号：EP1350814A1

  公开（公告）日：2003-10-08

  A radiation sensitive refractive index changing composition comprising (A) a decomposable compound, (B) a non-decomposable compound having a higher refractive index than the decomposable compound (A), (C) a radiation sensitive decomposer and (D) astabilizer. By exposing this composition to radiation through a pattern mask, the above components (C) and (A) of an exposed portion decompose to create a refractive index difference between the exposed portion and an unexposed portion, thereby forming a pattern having different refractive indices.

  一种对辐射敏感的折射率变化组合物，包括：(A) 可分解化合物；(B) 折射率高于可分解化合物(A)的不可分解化合物；(C) 对辐射敏感的分解剂；(D) 稳定剂。通过图案掩膜将这种组合物暴露在辐射下，暴露部分的上述成分（C）和（A）分解，在暴露部分和未暴露部分之间产生折射率差，从而形成具有不同折射率的图案。
• RADIATION-SENSITIVE COMPOSITION CAPABLE OF HAVING REFRACTIVE INDEX DISTRIBUTION
  申请人：JSR Corporation

  公开号：EP1369459A1

  公开（公告）日：2003-12-10

  A method of forming a refractive index pattern or an optical material stable regardless of use conditions, which provides a sufficiently large change in refractive index by a simple method. The refractive index pattern or optical material is formed by exposing a refractive index changing composition which comprises (A) a decomposable compound, (B) a non-decomposable compound containing inorganic oxide particles and (C) a radiation sensitive decomposer to radiation and then treating it with (D) a stabilizer.

  一种形成折射率图案或光学材料的方法，无论使用条件如何，它都能保持稳定，并能通过简单的方法提供足够大的折射率变化。 折射率图案或光学材料的形成方法是：将由 (A) 可分解化合物、(B) 含无机氧化物颗粒的不可分解化合物和 (C) 辐射敏感分解物组成的折射率变化组合物暴露于辐射中，然后用 (D) 稳定剂处理。
• COMPOSITION HAVING PERMITIVITY BEING RADIATION-SENSITIVELY CHANGEABLE AND METHOD FOR FORMING PERMITIVITY PATTERN
  申请人：JSR Corporation

  公开号：EP1413924A1

  公开（公告）日：2004-04-28

  A radiation sensitive dielectric constant changing composition comprising (A) a decomposable compound, (B) a nondecomposable compound, (C) a radiation sensitive decomposer and (D) a stabilizer. The composition allows its dielectric constant to be changed by a simple method, has a sufficiently large difference between its changed dielectric constant and its original dielectric constant and can provide a dielectric constant pattern and an optical material which are stable regardless of their use conditions.

  一种对辐射敏感的介电常数变化组合物，包括 (A) 可分解化合物，(B) 不可分解化合物，(C) 对辐射敏感的分解剂和 (D) 稳定剂。 该组合物可通过简单的方法改变介电常数，其改变后的介电常数与原始介电常数之间有足够大的差值，并能提供介电常数模式和光学材料，无论其使用条件如何，均能保持稳定。