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(1-甲基乙亚基)二(4,1-亚苯基氧基-2,1-乙二基氧基-2,1-乙二基)二丙烯酸酯 | 56361-55-8

中文名称
(1-甲基乙亚基)二(4,1-亚苯基氧基-2,1-乙二基氧基-2,1-乙二基)二丙烯酸酯
中文别名
——
英文名称
bisphenol A diacrylate, ethoxylated
英文别名
(1-Methylethylidene)bis(4,1-phenyleneoxy-2,1-ethanediyloxy-2,1-ethanediyl) diacrylate;2-[2-[4-[2-[4-[2-(2-prop-2-enoyloxyethoxy)ethoxy]phenyl]propan-2-yl]phenoxy]ethoxy]ethyl prop-2-enoate
(1-甲基乙亚基)二(4,1-亚苯基氧基-2,1-乙二基氧基-2,1-乙二基)二丙烯酸酯化学式
CAS
56361-55-8
化学式
C29H36O8
mdl
——
分子量
512.6
InChiKey
DTCQGQSGPULSES-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 沸点:
    614.0±55.0 °C(Predicted)
  • 密度:
    1.117±0.06 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    5.3
  • 重原子数:
    37
  • 可旋转键数:
    20
  • 环数:
    2.0
  • sp3杂化的碳原子比例:
    0.38
  • 拓扑面积:
    89.5
  • 氢给体数:
    0
  • 氢受体数:
    8

反应信息

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文献信息

  • Scratching-resistant resin plate and process for producing the same
    申请人:SUMITOMO CHEMICAL COMPANY, LIMITED
    公开号:US20030216497A1
    公开(公告)日:2003-11-20
    A scratching-resistant resin plate is provided, the plate comprising a cured coating and a methyl methacrylate-styrene copolymer substrate. The cured coating comprises resin composition (i) which contains a compound having an alicyclic ring and one or two (meth) acryloyloxy group(s) in its molecule, and a compound having at least three (meth)acryloyloxy groups in its molecule; and/or resin composition (ii) which contains a compound having an aromatic ring and a (meth)acryloyloxy group in a ratio of (meth)acryloyloxy group to aromatic ring of at least three. The scratching-resistant resin plate has a sufficient adhesion of the cured coating with to the methyl methacrylate-styrene copolymer substrate and has a sufficient surface hardness.
    提供了一种抗划痕的树脂板,该板包括一个固化涂层和一个甲基丙烯酸甲酯-苯乙烯共聚物基板。固化涂层包括树脂组分(i),其含有一个脂环状环和一个或两个(甲)丙烯酰氧基团的化合物,并含有至少三个(甲)丙烯酰氧基团的化合物;和/或树脂组分(ii),其含有一个芳香环和一个(甲)丙烯酰氧基团,(甲)丙烯酰氧基团与芳香环的比例至少为三。这种抗划痕的树脂板具有足够的固化涂层与甲基丙烯酸甲酯-苯乙烯共聚物基板的附着力,并具有足够的表面硬度。
  • Antifouling material using hydroxyl group-containing acrylamide derivative and use thereof
    申请人:OKAZAKI Kouju
    公开号:US20080305292A1
    公开(公告)日:2008-12-11
    An antifouling material and an antifouling film, which are excellent in hydrophilicity and have such a characteristic that the surface is self-cleaned with rain water or the like, or can be easily cleaned up even when a contaminant adheres to the surface thereof, can be obtained by copolymerizing a composition containing an acrylamide derivative having at least one hydroxyl group in the molecule and a compound having at least two (meth)acryloyloxy groups in the molecule.
    一种防污材料和防污膜,具有极佳的亲水性,并具有这样的特性,即表面可以通过雨水等自我清洁,或者即使污染物附着在其表面上,也可以轻松清洁,通过共聚合含有至少一个羟基的丙烯酰胺衍生物和在分子中具有至少两个(甲基)丙烯酰氧基团的化合物的组合物可以获得该防污材料和防污膜。
  • Durable polysulfide composition for optical material
    申请人:MITSUI TOATSU CHEMICALS, INC.
    公开号:EP0742244A2
    公开(公告)日:1996-11-13
    Disclosed herein are a composition for polysulfide-based resin comprising a polythiol having 4 or more functional groups and a compound having a reactive unsaturated bond(s) and/or b epoxy group(s) and/or c iso(thio)cyanato group(s) in one molecule (however, a+b+c≥2, and a and b are not simultaneously 0), and a polysulfide-based resin obtained by curing the composition, an optical material comprising the resin, a lens consisting of the optical material and a method for producing the polysulfide-based resin.
    本文公开了一种用于聚硫基树脂的组合物,该组合物包含一个具有 4 个或更多官能团的聚硫醇和一个分子中具有反应性不饱和键和/或 b 环氧基团和/或 c 异(硫)氰基团的化合物(然而,a+b+c≥2,且 a 和 b 不同时为 0),以及通过固化该组合物获得的聚硫基树脂、包含该树脂的光学材料、由该光学材料组成的透镜和生产该聚硫基树脂的方法。
  • Sulfur-containing urethane-based resin composition, optical element and lens comprising this resin
    申请人:MITSUI TOATSU CHEMICALS, Inc.
    公开号:EP0751161A2
    公开(公告)日:1997-01-02
    The present invention discloses a sulfur-containing urethane-based resin composition    which comprises a polythiol compound represented by formula (1):    wherein X1, X2 and X3 each is a hydrogen atom or a mercapto group; x, y and z each is an integer of 0 to 8; and in their combinations, formula (1) has at least two mercapto groups, a polyiso(thio)cyanate compound, and a compound having two or more reactive unsaturated groups in an amount of 30 to 70% by weight based on the total weight of the composition, or a sulfur-containing urethane-based resin composition which comprises the polythiol compound represented by formula (1), the polyiso(thio)cyanate compound, the compound having two or more reactive unsaturated groups in an amount of 10 to 70% by weight based on the total weight, and a photopolymerization catalyst.
    本发明公开了一种含硫聚氨酯基树脂组合物,它包括由式(1)表示的聚硫醇化合物 它包括由式(1)表示的聚硫醇化合物: 其中X1、X2和X3各自为氢原子或巯基;x、y和z各自为0至8的整数;在它们的组合中,式(1)至少有两个巯基、 一种聚异(硫)氰酸酯化合物和一种具有两个或两个以上反应性不饱和基团的化合物,其用量为组合物总重量的 30% 至 70%;或一种含硫聚氨酯基树脂组合物,它包括式(1)表示的聚硫醇化合物、聚异(硫)氰酸酯化合物、具有两个或两个以上反应性不饱和基团的化合物(其用量为组合物总重量的 10% 至 70%)和一种光聚合催化剂。
  • Resin composition for polymerization casting and optical material
    申请人:NOF CORPORATION
    公开号:EP0828167A2
    公开(公告)日:1998-03-11
    A resin composition for polymerization casting containing : 20 to 60 % by weight of a monomer (1) represented by the formula (1) wherein R1 stands for a hydrogen atom or a methyl group, R2 stands for an alkylene group having 2 to 4 carbon atoms, m and n each is an integer of 2 to 5; 10 to 40 % by weight of a monomer (2) represented by the formula (2) wherein R3 stands for a hydrogen atom or a methyl group, R4 and R5 are the same or different groups and each stands for an alkylene group having 2 to 4 carbon atoms, j and k each is 0 or 1; and 5 to 70 % by weight of a monomer (3), the monomer (3) being identical with neither monomers (1) nor (2), and containing at least one vinyl group in a molecule thereof.
    一种用于聚合浇注的树脂组合物,含有 : 20% 至 60% (重量百分比)由式(1)表示的单体(1 其中 R1 代表氢原子或甲基,R2 代表具有 2 至 4 个碳原子的亚烷基,m 和 n 均为 2 至 5 的整数; 10%至 40%(重量百分比)由式(2)代表的单体(2 其中 R3 代表氢原子或甲基,R4 和 R5 为相同或不同的基团,各自代表具有 2 至 4 个碳原子的亚烷基,j 和 k 分别为 0 或 1;以及 5% 至 70% (重量百分比)的单体 (3),单体 (3) 与单体 (1) 和 (2) 都不相同,其分子中至少含有一个乙烯基。
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