The present invention relates to an aqueous cleaning composition used to remove unwanted organic and inorganic residues and contaminants from a substrate such as, for example, a semiconductor substrate. The cleaning composition comprises from about 0.01 % to about 40 % by weight of a salt selected from a guanidinium salt, an acetamidinium salt, a formamidinium salt, and mixtures thereof; water; and optionally a water soluble organic solvent. Compositions according to the present invention are free of an oxidizer and abrasive particles and are capable of removing residues from a substrate and, particularly, a substrate having silicon-containing BARC and/or photoresist residue.
本发明涉及一种
水性清洗组合物,用于去除基底(例如半导体基底)上不需要的有机和无机残留物和污染物。该清洁组合物包含按重量计约 0.01 % 至约 40 % 的盐(选自
胍盐、乙酰胺盐、甲酰胺盐及其混合物);
水;以及可选的
水溶性有机溶剂。根据本发明的组合物不含氧化剂和研磨颗粒,能够去除基底上的残留物,特别是含有含
硅 BARC 和/或光刻胶残留物的基底。