(三丙氧基甲基)苯 | 6946-85-6

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 中文名称: (三丙氧基甲基)苯
• 英文名称: (Tripropoxymethyl)benzene
• 英文别名: tripropoxymethylbenzene
• CAS: 6946-85-6
• 化学式: C₁₆H₂₆O₃
• 分子量: 266.38
• InChiKey: HHQBZNIYNCLALC-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  4
• 重原子数：
  19
• 可旋转键数：
  10
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.62
• 拓扑面积：
  27.7
• 氢给体数：
  0
• 氢受体数：
  3

安全信息

• 海关编码：
  2909309090

文献信息

• Tantalum oxide film, use thereof, and method and composition for forming the same
  申请人：——

  公开号：US20030003235A1

  公开（公告）日：2003-01-02

  A composition for forming a high-quality tantalum film which is advantageously used as an capacitor insulating film and a process for forming the high-quality tantalum film. The composition for forming a tantalum oxide film, which comprises at least one tantalum compound selected from the group consisting of a reaction product of a compound capable of reacting with a tantalum alkoxide and a tantalum alkoxide and a hydrolyzate of the reaction product, and a solvent, and the process for forming the tantalum oxide film by applying this composition to a substrate and heating it.

  一种用于形成优质钽膜的组合物，该膜可作为电容器绝缘膜使用。用于形成氧化钽薄膜的组合物，其中包含至少一种钽化合物，该化合物选自由能与氧化钽烷氧基化合物和氧化钽烷氧基化合物反应的化合物的反应产物和该反应产物的水解物以及溶剂组成的组，以及将该组合物涂在基底上并加热以形成氧化钽薄膜的工艺。
• Composition for forming a coating film, method of preparing the composition, tantalum oxide film and method of forming the tantalum oxide film
  申请人：Yonekura Isamu

  公开号：US20050003085A1

  公开（公告）日：2005-01-06

  A composition for forming a coating film, comprising a reaction product of a tantalum alkoxide and at least one compound selected from carbamic acid, carboxylic acid and carboxylic anhydride and a solvent. A tantalum oxide film is obtained by forming a coating film of this composition and thermally and/or optically treating the coating film. This tantalum oxide film has a large dielectric constant and a small leak current.

  一种用于形成涂膜的组合物，由钽烷氧基化合物和至少一种选自氨基甲酸、羧酸和羧酸酐的化合物的反应产物以及溶剂组成。用这种组合物形成涂膜，并对涂膜进行热处理和/或光学处理，即可获得氧化钽膜。这种氧化钽薄膜具有较大的介电常数和较小的泄漏电流。
• IMINOETHER COMPOUND, POLYESTER RESIN COMPOSITION, METHOD FOR PRODUCING CARBOXYLIC ACID ESTER, POLYESTER FILM, BACK SHEET FOR SOLAR CELL MODULE, AND SOLAR CELL MODULE
  申请人：FUJIFILM Corporation

  公开号：US20160280851A1

  公开（公告）日：2016-09-29

  A polyester resin composition is provided with which irritant gases do not occur in production and no increase in the viscosity of a polyester resin is exhibited even when a terminal blocking agent is contained. The composition includes an iminoether compound of Formula (1) and a polyester. Further provided are an iminoether compound, a method for producing a carboxylic acid ester, a polyester film, a back sheet for a solar cell module, and a solar cell module. R 2 represents an optionally substituted alkyl, cycloalkyl, aryl or alkoxy group; R 3 represents a specific alkyl or aryl group; and R 11 , R 12 and R 13 each independently represents a hydrogen atom or an optionally substituted alkyl or aryl group.
• US4311782A
  申请人：——

  公开号：US4311782A

  公开（公告）日：1982-01-19