Polymeric thin film and products containing the same
申请人:JAPAN SYNTHETIC RUBBER CO., LTD.
公开号:EP0176636A1
公开(公告)日:1986-04-09
A novel polymeric thin film having a high density, high hardness and high toughness is prepared on the surface of a substrate by plasma polymerization. The gas used to provide the plasma contains a halogenated alkane and/or an alkane and optionally hydrogen and/or a halogen, the atomic ratio of halogen/hydrogen in the gas being from 0.1:1 to 5:1 and the electron temperature of the plasma in the reaction zone being 6,000K or higher and lower than 30,000K. The polymeric thin film obtained is useful on various articles for the purpose of protection, surface hardening, rust-proofing, scratch-proofing, providing a gas barrier, etc. In particular, it is suitable as the protective film for magnetic recording media. %
Bekhazi, Michel; Warkentin, John, Canadian Journal of Chemistry, 1983, vol. 61, p. 619 - 624
作者:Bekhazi, Michel、Warkentin, John
DOI:——
日期:——
McElvain; Stevens, Journal of the American Chemical Society, 1947, vol. 69, p. 2669
作者:McElvain、Stevens
DOI:——
日期:——
Dichloromethylallyl Compounds. II. The Catalytic and Non-catalytic Substitution of Certain Chloroallylic Groups in the Ring and on the Oxygen in Phenols
作者:D. G. Kundiger、H. Pledger
DOI:10.1021/ja01604a041
日期:1956.12
Spring; Lecrenier, Bulletin de la Societe Chimique de France, 1887, vol. <2>48, p. 629