A novel polymeric thin film having a high density, high hardness and high toughness is prepared on the surface of a substrate by plasma polymerization. The gas used to provide the plasma contains a halogenated alkane and/or an alkane and optionally hydrogen and/or a halogen, the atomic ratio of halogen/hydrogen in the gas being from 0.1:1 to 5:1 and the electron temperature of the plasma in the reaction zone being 6,000K or higher and lower than 30,000K. The polymeric thin film obtained is useful on various articles for the purpose of protection, surface hardening, rust-proofing, scratch-proofing, providing a gas barrier, etc. In particular, it is suitable as the protective film for magnetic recording media. %
通过等离子聚合法在基材表面制备出一种具有高密度、高硬度和高韧性的新型聚合物薄膜。用于提供等离子体的气体包含卤代
烷烃和/或
烷烃,以及可选的氢和/或卤素,气体中卤素/氢的原子比为 0.1:1 至 5:1,反应区等离子体的电子温度为 6000K 或更高但低于 30000K。得到的聚合物薄膜可用于各种物品的保护、表面硬化、防锈、防刮伤、提供气体屏障等。尤其适合用作磁性记录介质的保护膜。%