1-(全氟-n-己基)十四烷 | 154628-00-9

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 有机氟化物
• 中文名称: 1-(全氟-n-己基)十四烷
• 英文名称: 1,1,1,2,2,3,3,4,4,5,5,6,6-Tridecafluoroicosane
• CAS: 154628-00-9
• 化学式: C₂₀H₂₉F₁₃
• 分子量: 516.4
• InChiKey: BREOHRVZEZMFOB-UHFFFAOYSA-N

物化性质

• 熔点：
  67.5 °C
• 沸点：
  481 °C
• 密度：
  1.201

计算性质

• 辛醇/水分配系数(LogP)：
  11.9
• 重原子数：
  33
• 可旋转键数：
  17
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  13

安全信息

• 危险等级：
  IRRITANT
• 危险品标志：
  Xi

文献信息

• MICRO AND NANO SCALE FABRICATION AND MANUFACTURE BY SPATIALLY SELECTIVE DEPOSITION
  申请人：Raustech Pty Ltd.

  公开号：EP1644517A1

  公开（公告）日：2006-04-12
• CHARGED EMULSIONS FOR SITE-SPECIFIC DEPOSITION OF MATTER AT MICRO AND NANO SCALE
  申请人：Raustech Pty Ltd.

  公开号：EP1648965A1

  公开（公告）日：2006-04-26
• SUBSTRATES FOR SPATIALLY SELECTIVE MICRON AND NANOMETER SCALE DEPOSITION AND COMBINATORIAL MODIFICATION AND FABRICATION
  申请人：Raustech Pty Ltd.

  公开号：EP1644518A1

  公开（公告）日：2006-04-12
• Substrates for spatially selective micron and nanometer scale deposition and combinatorial modification and fabrication
  申请人：Hastwell John Peter

  公开号：US20070065822A1

  公开（公告）日：2007-03-22

  A substrate ( 1 ) for spatially selective micron and nanometer scale deposition and/or reaction, which has a support ( 3 ), a conductive layer ( 5 ) on the support, a dielectric layer ( 7 ) to hold an electrostatic charge pattern such as a photoconductive layer of a material which dissipates an electric charge upon receiving incident radiation thereon, and a chemically functional layer ( 9 ), such that electrostatic charge patterns may be formed in a predetermined manner upon the substrate to influence the movement of charged droplets in an emulsion ( 15 ) on the substrate. The chemically functional layer either provides a surface for chemical functionalisation of the substrate or prevents access or reaction to the dielectric or photoconductive layer.
• Micro and nano scale fabrication and manufacture by spatially selective deposition
  申请人：Hastwell John Peter

  公开号：US20070134930A1

  公开（公告）日：2007-06-14

  A method of fabrication or manufacture at micrometer and nanometer scale by spatially selective deposition of chemical substances so as to form a solid phase array on a substrate ( 10 ) which includes the steps of defining a region ( 15 ) on the substrate by forming an electrostatic charge on that region which is different from the electrostatic charge on other regions of the substrate such as by formation of a latent electrostatic image thereon, applying an emulsion to the substrate. The emulsion ( 16 ) has an electrically charged discontinuous phase and a component to be selectively deposited carried in or comprising the discontinuous phase. The discontinuous phase of the emulsion is attracted to the preselected region by attraction by the electrostatic charge on the region and deposition obtained with or without reaction. The electrostatic image may be formed by the use of photoconductor. The array formed may be for flat screen display panels, for manufacture of DNA chips, printed circuits, semiconductor chips, nanotechnology, micro-electromechanical systems, flexible printed circuits or the like.