A method of producing a patterned substrate includes the steps of: providing, on a substrate, a coating film of a resin composition including (A) an alkali-soluble resin selected from the group consisting of polyimides, polyamideimides, polyimide precursors, polyamideimide precursors, polybenzoxazoles, polybenzoxazole precursors, copolymers of at least two of the resins, and copolymers of at least one of the resins and another structural unit, (B) a photoacid generator, and (C) at least one compound selected from the group consisting of epoxy compounds and oxetane compounds; forming a pattern of the coating film; patterning the substrate through etching using the pattern of the coating film as a mask; and removing the coating film of the resin composition.
一种生产图案化基底的方法包括以下步骤在基底上提供一层
树脂组合物涂膜,该
树脂组合物包括 (A) 碱溶性
树脂,该
树脂选自由聚
酰亚胺、聚酰胺
酰亚胺、聚
酰亚胺前体、聚酰胺
酰亚胺前体、聚
苯并恶唑、聚
苯并恶唑前体、至少两种
树脂的共聚物和至少一种
树脂与另一结构单元的共聚物组成的组(A) 至少两种
树脂的共聚物,以及至少一种
树脂和另一种结构单元的共聚物; (B) 光酸发生器;以及 (C) 至少一种选自由环氧化合物和氧杂
环丁烷化合物组成的组中的化合物;形成涂膜图案;使用涂膜图案作为掩膜,通过蚀刻对基底进行图案化;以及去除
树脂组合物的涂膜。