1-十二烷基乙内酰脲 | 85391-28-2

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 唑烷类
• 中文名称: 1-十二烷基乙内酰脲
• 中文别名: 1-正十二烷基乙内酰脲
• 英文名称: 1-Dodecylimidazolidine-2,4-dione
• CAS: 85391-28-2
• 化学式: C₁₅H₂₈N₂O₂
• mdl: MFCD00142675
• 分子量: 268.39
• InChiKey: IHWNCNSXOZBQBX-UHFFFAOYSA-N

物化性质

• 熔点：
  100 °C
• 密度：
  0.988±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  4.7
• 重原子数：
  19
• 可旋转键数：
  11
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.866
• 拓扑面积：
  49.4
• 氢给体数：
  1
• 氢受体数：
  2

安全信息

• 海关编码：
  2933990090

文献信息

• [EN] PROCESS FOR FORMING AN AROMATIC AMINE COMPOUND<br/>[FR] PROCEDE DE FORMATION D'UN COMPOSE AMINE AROMATIQUE
  申请人：EASTMAN KODAK CO

  公开号：WO2006011879A1

  公开（公告）日：2006-02-02

  A process for forming an aromatic amine product comprises the steps of (a) combining an aromatic primary or secondary initial amine with an aromatic halide compound in the presence of a palladium complex and a phosphine compound catalyst to form a mixture; (b) heating the mixture to a first temperature of at least 60°C; (c) adding a base material to the heated mixture; and (d) maintaining the temperature of the mixture at or above the first temperature for a period of time sufficient to form as a product an aromatic substituted form of the aromatic primary or secondary initial amine. The process provides products of high purity in good yields.

  一种形成芳香胺产品的方法，包括以下步骤：(a)在钯配合物和膦化合物催化剂的存在下，将芳香初级或次级胺与芳香卤代化合物结合形成混合物；(b)将混合物加热至至少60°C的第一温度；(c)向加热的混合物中加入碱性物质；(d)将混合物的温度保持在第一温度或以上一段足够的时间，以形成芳香初级或次级胺的芳香取代产物。该方法提供高纯度的产物收率良好。
• [EN] AROMATIC AMINES WITH LOW SOLVATION<br/>[FR] AMINES AROMATIQUES A FAIBLE SOLVATATION
  申请人：EASTMAN KODAK CO

  公开号：WO2006011880A1

  公开（公告）日：2006-02-02

  A process for preparing a polymorph of a N,N,N',N'-tetraaryldiamine having low solvation comprises: a) crystallizing the diamine from a solvent comprising a hydrocarbon to form a solvated polymorph; b) mixing the amine with an alcohol; c) distilling the mixture to remove a portion of the solvent; and d) repeating steps b and c until the desired level of low solvation is achieved. The process enables reduced solvation levels in the polymorph.

  一种制备具有低溶解度的N,N,N',N'-四芳基二胺的多晶形态的方法包括：a）从包含碳氢化合物的溶剂中结晶出二胺以形成溶剂化的多晶形态；b）将胺与醇混合；c）蒸馏混合物以去除部分溶剂；和d）重复步骤b和c直到达到所需的低溶解度水平。该过程使多晶形态的溶解度降低。
• POLISHING COMPOSITION AND POLISHING METHOD USING THE SAME
  申请人：FUJIMI INCORPORATED

  公开号：EP2237311A1

  公开（公告）日：2010-10-06

  A polishing composition according to a first aspect of the present invention contains a nitrogen-containing compound and abrasive grains, and the pH of the composition is in the range of 1 to 7. The nitrogen-containing compound in the polishing composition preferably has a structure expressed by a formula: R1-N(-R2)-R3 in which R1, R2, and R3 each represent an alkyl group with or without a characteristic group, two of R1 to R3 may form a part of a heterocycle, and two of R1 to R3 may be identical and form a part of a heterocycle with the remaining one, Alternatively, the nitrogen-containing compound is preferably selected from a group consisting of a carboxybetaine type ampholytic surfactant, a sulfobetaine type ampholytic surfactant, an imidazoline type ampholytic surfactant, and an amine oxide type ampholytic surfactant. A polishing composition according to a second aspect of the present invention contains a water-soluble polymer and abrasive grains, and the pH of the composition is in the range of 1 to 8.

  根据本发明第一方面的抛光组合物含有含氮化合物和磨粒，组合物的 pH 值在 1 至 7 之间。抛光组合物中的含氮化合物最好具有由式表示的结构：R1-N(-R2)-R3，其中 R1、R2 和 R3 各代表一个带或不带特征基团的烷基，R1 至 R3 中的两个可构成杂环的一部分，R1 至 R3 中的两个可相同并与其余一个构成杂环的一部分，或者，R1 至 R3 中的两个可相同并与其余一个构成杂环的一部分，或者，R1 至 R3 中的两个可相同并与其余一个构成杂环的一部分、含氮化合物最好选自由羧基甜菜碱型两性表面活性剂、磺基甜菜碱型两性表面活性剂、咪唑啉型两性表面活性剂和氧化胺型两性表面活性剂组成的组。根据本发明第二方面的抛光组合物含有水溶性聚合物和磨粒，组合物的 pH 值在 1 至 8 之间。
• Polishing composition and polishing method using the same
  申请人：Mizuno Takahiro

  公开号：US10144849B2

  公开（公告）日：2018-12-04

  A polishing composition contains a nitrogen-containing compound and abrasive grains, and the pH of the composition is in the range of 1 to 7. The nitrogen-containing compound in the polishing composition preferably has a structure expressed by a formula: R1—N(—R2)—R3 in which R1, R2, and R3 each represent an alkyl group with or without a characteristic group, two of R1 to R3 may form a part of a heterocycle, and two of R1 to R3 may be identical and form a part of a heterocycle with the remaining one. Alternatively, the nitrogen-containing compound is preferably selected from a group consisting of a carboxybetaine type ampholytic surfactant, a sulfobetaine type ampholytic surfactant, an imidazoline type ampholytic surfactant, and an amine oxide type ampholytic surfactant. A polishing composition may contain a water-soluble polymer and abrasive grains, and the pH of the composition is in the range of 1 to 8.

  一种抛光组合物含有一种含氮化合物和磨粒，组合物的 pH 值在 1 至 7 之间。抛光组合物中的含氮化合物最好具有由式表示的结构：R1-N(-R2)-R3，其中 R1、R2 和 R3 各代表一个带或不带特征基团的烷基，R1 至 R3 中的两个可构成杂环的一部分，R1 至 R3 中的两个可相同并与其余一个构成杂环的一部分。另外，含氮化合物最好选自羧基甜菜碱型两性表面活性剂、磺基甜菜碱型两性表面活性剂、咪唑啉型两性表面活性剂和氧化胺型两性表面活性剂组成的组。抛光组合物可包含水溶性聚合物和磨粒，组合物的 pH 值范围为 1 至 8。
• PHOTOGRAPHIC ELEMENTS CONTAINING 2-EQUIVALENT PYRAZOLONE COUPLERS AND PROCESS FOR THEIR USE
  申请人：EASTMAN KODAK COMPANY

  公开号：EP0548347A1

  公开（公告）日：1993-06-30