There is disclosed a fluorine-containing polymer compound comprising a repeating unit (a) of the following general formula (2) and having a weight-average molecular weight of 1000 to 1000000
where R
1
represents a polymerizable double bond-containing group; R
2
represents a fluorine atom or a fluorine-containing alkyl group; R
3
represents a hydrogen atom, an acid labile group, a cross-linking site or the other monovalent organic group; and W
1
represents a linking moiety.
When the fluorine-containing polymer compound is used in a resist compound for pattern formation by high energy radiation of 300 nm or less wavelength or electron beam radiation, it is possible to form a resist pattern with a good rectangular profile.
本发明公开了一种含
氟聚合物化合物,其包括下述通式(2)的重复单元(a),并且具有1000至1000000的重均分子量,其中R1表示聚合双键含有基团;R2表示
氟原子或含氟烷基;R3表示氢原子、酸敏基团、交联位点或其他一价有机基团;W1表示连接基。当将该含
氟聚合物化合物用于300纳米或更短波长的高能辐射或电子束辐射的图案形成的光阻化合物中时,可以形成具有良好矩形轮廓的光阻图案。