2,4,5,6-四氯间二甲苯-alpha,alpha'-二醇 | 39568-89-3

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 中文名称: 2,4,5,6-四氯间二甲苯-alpha,alpha'-二醇
• 英文名称: 2,4,5,6-tetrachloro-m-xylene-α
• 英文别名: 2,4,5,6-tetrachloro-m-xylene-α,α'-diol；m-Xylene-alpha,alpha'-diol, 2,4,5,6-tetrachloro-；[2,3,4,6-tetrachloro-5-(hydroxymethyl)phenyl]methanol
• CAS: 39568-89-3
• 化学式: C₈H₆Cl₄O₂
• 分子量: 275.946
• InChiKey: JYLBVCKNJDTYGB-UHFFFAOYSA-N

物化性质

• 熔点：
  230-232 °C(Solv: 2-ethoxyethanol (110-80-5))
• 沸点：
  401.7±40.0 °C(Predicted)
• 密度：
  1.673±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.7
• 重原子数：
  14
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.25
• 拓扑面积：
  40.5
• 氢给体数：
  2
• 氢受体数：
  2

安全信息

• 海关编码：
  2906299090

反应信息

• 作为产物：
  描述：

  Alpha,Alpha,2,4,5,6-六氯间二甲苯 、 sodium acetate 、 甲醇 以95%的产率得到
  参考文献：
  名称：

  ENDGLAENDER F.; FUENTEN H. AUS DER; STEFFEN K.-D.; WEISGERBER G.; ZOCHE G+, CHEM.-ZTG., 1979, 103, NO 1, 9-17

  摘要：

  DOI：

文献信息

• Method of producing a crosslinked coating in the manufacture of integrated circuits
  申请人：Hessell T. Edward

  公开号：US20050215713A1

  公开（公告）日：2005-09-29

  The present invention is directed to a method of providing a thermally curable coating composition for to provide positive photoresists layers, underlayers for multiple layer resists, antireflective coatings, bottom layer antireflective coatins, dielectric layers, photoresist layers, hard mask etch stops, in the manufacture of integrated circuits. More particularly, the present invention is directed to a method of using a thermally activable latent acid or a thermal acid generator, a N-benzylpyridinium or N-benzylanilinium salt of a strong acid, as a catalyst in a polymerizable composition suitable for preparing such coatings and layers. The present invention is also directed to novel compositions comprising benzylpyridinium and benzylanilinium salts of a strong acid, such as sulfonic acid or disulfonic acid as thermal acid generators.

  本发明涉及一种提供热固性涂层组合物的方法，用于提供正向光刻层、多层光刻底层、抗反射涂层、底层抗反射涂层、介电层、光刻层、硬膜层刻停等，用于集成电路的制造。更具体地，本发明涉及一种使用热活性潜酸或热酸发生剂、强酸的N-苄基吡啶或N-苄基苯胺盐作为催化剂的聚合物组合物的方法，适用于制备这种涂层和层。本发明还涉及一种新型组合物，包括苄基吡啶和苄基苯胺盐，作为热酸发生剂的强酸，如磺酸或二磺酸。
• Coating compositions for use with an overcoated photoresist
  申请人：Shipley Co. L.L.C.

  公开号：EP1298492A2

  公开（公告）日：2003-04-02

  In a first aspect, organic coating compositions are provided, particularly spin-on antireflective coating compositions, that contain a polyester resin component. In a further aspect, coating compositions are provided that contain a resin component obtained by polymerization of a multi-hydroxy compound. Coating compositions of the invention are particularly useful employed in combination with an overcoated photoresist layer to manufacture integrated circuits.

  第一方面，提供了含有聚酯树脂成分的有机涂层组合物，特别是旋涂型减反射涂层组合物。再一方面，本发明提供的涂层组合物含有通过聚合多羟基化合物获得的树脂成分。本发明的涂层组合物与覆膜光刻胶层结合使用，特别适用于制造集成电路。
• LINKED CYCLIC POLYAMINES WITH ACTIVITY AGAINST HIV
  申请人：AnorMED Inc.

  公开号：EP0619813B1

  公开（公告）日：2004-08-18
• NEW ORGANIC BOTTOM ANTIREFLECTIVE POLYMER COMPOSITIONS
  申请人：AZ Electronic Materials USA Corp.

  公开号：EP1915411A1

  公开（公告）日：2008-04-30
• New organic bottom antireflective polymer compositions
  申请人：Yao Huirong

  公开号：US20070020557A1

  公开（公告）日：2007-01-25

  The present invention relates to bottom antireflective coating compositions, polymers useful in making such compositions, and their use in image processing by forming a thin layer between a reflective substrate and a photoresist coating.