2,5-二甲基-2,5-双(间甲苯甲酸过氧化)己烷 | 106519-15-7

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 中文名称: 2,5-二甲基-2,5-双(间甲苯甲酸过氧化)己烷
• 英文名称: 2,5-Dimethyl-2,5-bis(m-methylbenzoylperoxy)hexane
• 英文别名: [2,5-dimethyl-5-(3-methylbenzoyl)peroxyhexan-2-yl] 3-methylbenzenecarboperoxoate
• CAS: 106519-15-7
• 化学式: C₂₄H₃₀O₆
• 分子量: 414.5
• InChiKey: UNKQAWPNGDCPTE-UHFFFAOYSA-N

物化性质

• 沸点：
  562.3±50.0 °C(Predicted)
• 密度：
  1.118±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  6.1
• 重原子数：
  30
• 可旋转键数：
  11
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.42
• 拓扑面积：
  71.1
• 氢给体数：
  0
• 氢受体数：
  6

文献信息

• ASYMMETRIC ORGANIC PEROXIDE, CROSSLINKING AGENT COMPRISING THE SAME, AND METHOD OF CROSSLINKING WITH THE SAME
  申请人：NOF CORPORATION

  公开号：EP1233014A1

  公开（公告）日：2002-08-21

  A crosslinking agent comprising an asymmetry organic peroxide having at least one structure unit of (substituted)benzoylcarbonyloxy group represented by the following formula (1) in the molecule thereof. Environmentally friendly crosslinking agents and crosslinked silicone rubber moldings are provided thereby. Specifically, useful crosslinking agents and crosslinking processes for silicone rubber are provided.

  一种交联剂，包括至少具有分子中表示为以下式（1）的（取代）苯甲酰羰氧基结构单元的不对称有机过氧化物。因此提供了环保的交联剂和交联硅橡胶成型品。具体提供了用于硅橡胶的有用交联剂和交联工艺。
• ONIUM SALT AND COMPOSITION COMPRISING THE SAME
  申请人：ASAHI KASEI E-MATERIALS CORPORATION

  公开号：US20160229801A1

  公开（公告）日：2016-08-11

  The onium salt of the present invention contains predetermined compound A represented by the general formula (1). The composition of the present invention contains the onium salt of the present invention, and an onium salt containing predetermined compound B represented by the general formula (2). The onium salt and the composition of the present invention exert well-balanced excellent physical properties in terms of cold curing properties, storage stability, thermal shock resistance after curing, and moisture resistance.

  本发明的季铵盐包含由通式（1）表示的预定化合物A。本发明的组合物包含本发明的季铵盐，以及由通式（2）表示的含有预定化合物B的季铵盐。本发明的季铵盐和组合物在冷固化性能、储存稳定性、固化后的耐热冲击性和耐湿性方面表现出良好的平衡优异物理性能。
• COMPOUND, RESIN, COMPOSITION AND PATTERN FORMATION METHOD
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20210070727A1

  公开（公告）日：2021-03-11

  The present invention provides a compound represented by following formula (0):

  本发明提供了以下式（0）表示的化合物。
• COMPOUND, RESIN, COMPOSITION, RESIST PATTERN FORMATION METHOD AND CIRCUIT PATTERN FORMATION METHOD
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20210070685A1

  公开（公告）日：2021-03-11

  The present invention provides a compound having a specific structure represented by the following formula (0), a resin having a constituent unit derived from the compound, various compositions containing the compound and/or the resin, and various methods using the compositions.

  本发明提供一种具有以下式（0）所代表的特定结构的化合物，具有从该化合物衍生的组分单元的树脂，含有该化合物和/或树脂的各种组合物，以及使用这些组合物的各种方法。
• FILM FORMING MATERIAL FOR LITHOGRAPHY, COMPOSITION FOR FILM FORMATION FOR LITHOGRAPHY, UNDERLAYER FILM FOR LITHOGRAPHY, AND METHOD FOR FORMING PATTERN
  申请人：Mitsubishi Gas Chemical Company, Inc.

  公开号：US20200166844A1

  公开（公告）日：2020-05-28

  The present invention provides a film forming material for lithography comprising a compound having a group of the following formula (0):

  本发明提供了一种用于光刻的薄膜形成材料，包括具有以下公式（0）中的基团的化合物。