4,4,5-Trimethyl-3,6-dioxa-bicyclo[3.1.0]hexan-2-one | 149522-08-7

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 二恶烷
• 英文名称: 4,4,5-Trimethyl-3,6-dioxa-bicyclo[3.1.0]hexan-2-one
• 英文别名: 2,3-Epoxy-3,4,4-trimethyl-gamma-butyrolactone；4,4,5-trimethyl-3,6-dioxabicyclo[3.1.0]hexan-2-one
• CAS: 149522-08-7
• 化学式: C₇H₁₀O₃
• 分子量: 142.155
• InChiKey: DKZXCOVJJLBDAK-UHFFFAOYSA-N

物化性质

• 沸点：
  210.1±23.0 °C(Predicted)
• 密度：
  1.192±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  0.5
• 重原子数：
  10
• 可旋转键数：
  0
• 环数：
  2.0
• sp3杂化的碳原子比例：
  0.86
• 拓扑面积：
  38.8
• 氢给体数：
  0
• 氢受体数：
  3

反应信息

• 作为反应物：
  描述：

  4,4,5-Trimethyl-3,6-dioxa-bicyclo[3.1.0]hexan-2-one 在 K-10 作用下， 以 四氯乙烯 为溶剂， 反应 2.0h， 以50%的产率得到3-Hydroxy-4,5,5-trimethyl-5H-furan-2-one
  参考文献：
  名称：

  Synthesis of 3-Hydroxy-4,5-dimethyl-2(5H)-furanone and its analogues; utilisation of an intramolecular darzens reaction

  摘要：

  The intramolecular Darzens reaction of chloroacetates of hydroxy ketones leads to alpha, beta-epoxy-gamma- and delta-lactones. Acid catalysed rearrangement of the latter furnished the alpha-keto lactones 1, 10, 16 and 20.

  DOI：

  10.1016/s0040-4039(00)73553-2
• 作为产物：
  描述：

  3-羟基-3-甲基-2-丁酮 在 potassium tert-butylate 作用下， 以 四氢呋喃 、 乙醚 为溶剂， 生成 4,4,5-Trimethyl-3,6-dioxa-bicyclo[3.1.0]hexan-2-one
  参考文献：
  名称：

  Synthesis of 3-Hydroxy-4,5-dimethyl-2(5H)-furanone and its analogues; utilisation of an intramolecular darzens reaction

  摘要：

  The intramolecular Darzens reaction of chloroacetates of hydroxy ketones leads to alpha, beta-epoxy-gamma- and delta-lactones. Acid catalysed rearrangement of the latter furnished the alpha-keto lactones 1, 10, 16 and 20.

  DOI：

  10.1016/s0040-4039(00)73553-2

文献信息

• Polymeric compound and resin composition for photoresist
  申请人：——

  公开号：US20020169266A1

  公开（公告）日：2002-11-14

  A photoresist polymeric compound includes a monomer unit represented by following Formula (I): 1 The polymeric compound may further include at least one of monomer units represented by following Formulae (IIa) to 2 wherein R 1 , R 13 , R 14 and R 15 are each a hydrogen atom or methyl group; R 2 and R 3 are each a hydrocarbon group having from 1 to 8 carbon atoms; R 4 , R 5 and R 6 are each a hydrogen atom, hydroxyl group or a methyl group; R 7 and R 8 are each a hydrogen atom, hydroxyl group or —COOR 9 group, where R 9 is a t-butyl group, 2-tetrahydropyranyl group, etc.; R 10 and R 11 are each a hydrogen atom, hydroxyl group or oxo group; R 12 is a hydrocarbon group having a tertiary carbon atom at a bonding site with an oxygen atom indicated in the formula; R 16 is a t-butyl group, 2-tetrahydropyranyl group, etc.; and n denotes an integer from 1 to 3. The photoresist polymeric compound can exhibit high adhesion to substrates and can highly precisely form fine patterns.

  一种光阻聚合物化合物包括以下式(I)所表示的单体单元：1该聚合物化合物还可以包括以下式(IIa)至(IIb)所表示的至少一种单体单元中的至少一种：其中，R1、R13、R14和R15均为氢原子或甲基基团；R2和R3均为具有1至8个碳原子的碳氢基团；R4、R5和R6均为氢原子、羟基或甲基基团；R7和R8均为氢原子、羟基或-COOR9基团，其中R9为叔丁基基团、2-四氢呋喃基团等；R10和R11均为氢原子、羟基或酮基；R12为具有在公式中指示的氧原子与三级碳原子成键位的碳氢基团；R16为叔丁基基团、2-四氢呋喃基团等；n表示1至3的整数。该光阻聚合物化合物可以表现出对基材的高粘附性，并可以高精度地形成细小图案。
• Photoresist polymeric compound and photoresist resin composition
  申请人：Daicel Chemical Industries, Ltd.

  公开号：US06692889B1

  公开（公告）日：2004-02-17

  A polymeric compound of the invention includes at least one monomer unit selected from the following formulae (I), (II), (III) and (IV): (wherein R1 is a hydrogen atom or a methyl group, R2 and R3 are each a hydrogen atom, a hydroxyl group or a —COOR4 group, where R4 is, e.g., a t-butyl group or a 2-tetrahydropyranyl group; R5 and R6 are each a hydrogen atom, a hydroxyl group or an oxo group; R7, R8 and R9 are each a hydrogen atom or a methyl group; R10 and R11 are each a hydrocarbon group having 1 to 8 carbon atoms; R12, R13 and R14 are each a hydrogen atom, a hydroxyl group or a methyl group, where if all of R12 to R14 are each a hydrogen atom or a hydroxyl group, R10 and R11 are not coincidentally methyl groups) [wherein, when the compound includes, for example, a monomer unit of Formula (III), the compound further includes at least one monomer unit selected from among, for example, a monomer unit represented by the following Formula (V): (wherein R15 and R16 are each a hydrogen atom, a hydroxyl group or a carboxyl group; R17 is a hydroxyl group, an oxo group or a carboxyl group; and R1 has the same meaning as defined above)]. This polymeric compound has high etching resistance, as well as satisfactory transparency, alkali-solubility and adhesion, and is therefore useful as a photoresist resin.

  本发明的聚合物化合物包括至少一种单体单元，所述单体单元选自以下式子（I）、（II）、（III）和（IV）：（其中R1是氢原子或甲基基团，R2和R3分别是氢原子、羟基或—COOR4基团，其中R4是例如叔丁基基团或2-四氢吡喃基团；R5和R6分别是氢原子、羟基或酮基；R7、R8和R9分别是氢原子或甲基基团；R10和R11分别是具有1至8个碳原子的碳氢基团；R12、R13和R14分别是氢原子、羟基或甲基基团，其中如果R12至R14全部为氢原子或羟基，则R10和R11不是重合的甲基基团）[其中，当化合物包括例如公式（III）的单体单元时，化合物还包括至少一种单体单元，所述单体单元选自例如由以下公式（V）表示的单体单元：（其中R15和R16分别是氢原子、羟基或羧基；R17是羟基、酮基或羧基；R1具有上述定义的相同含义）]。该聚合物化合物具有高蚀刻抗性，同时具有令人满意的透明度、碱溶性和附着力，因此可用作光刻胶树脂。
• POLYMERIC COMPOUND FOR PHOTORESIST AND RESIN COMPOSITION FOR PHOTORESIST
  申请人：Daicel Chemical Industries, Ltd.

  公开号：EP1172694A1

  公开（公告）日：2002-01-16

  A photoresist polymeric compound includes a monomer unit represented by following Formula (I) : The polymeric compound may further include at least one of monomer units represented by following Formulae (IIa) to (IIg): wherein R1, R13, R14 and R15 are each a hydrogen atom or methyl group; R2 and R3 are each a hydrocarbon group having from 1 to 8 carbon atoms; R4, R5 and R6 are each a hydrogen atom, hydroxyl group or a methyl group; R7 and R8 are each a hydrogen atom, hydroxyl group or -COOR9 group, where R9 is a t-butyl group, 2-tetrahydropyranyl group, etc.; R10 and R11 are each a hydrogen atom, hydroxyl group or oxo group; R12 is a hydrocarbon group having a tertiary carbon atom at a bonding site with an oxygen atom indicated in the formula; R16 is a t-butyl group, 2-tetrahydropyranyl group, etc.; and n denotes an integer from 1 to 3. The photoresist polymeric compound can exhibit high adhesion to substrates and can highly precisely form fine patterns.

  一种光致抗蚀剂聚合化合物包括下式（I）所代表的单体单元： 该聚合化合物还可进一步包括下式（IIa）至（IIg）所代表的单体单元中的至少一种： 其中 R1、R13、R14 和 R15 各为氢原子或甲基；R2 和 R3 各为具有 1 至 8 个碳原子的烃基；R4、R5 和 R6 各为氢原子、羟基或甲基；R7 和 R8 各为氢原子、羟基或-COOR9 基，其中 R9 为叔丁基、2-四氢吡喃基等。R10 和 R11 分别是氢原子、羟基或氧代基团；R12 是烃基，其上的三级碳原子与式中所示的氧原子成键；R16 是叔丁基、2-四氢吡喃基等；n 表示 1 至 3 的整数。 这种光致抗蚀剂聚合物化合物对基底有很高的附着力，并能高度精确地形成精细图案。
• POLYMER FOR PHOTORESISTS AND RESIN COMPOSITIONS FOR PHOTORESISTS
  申请人：Daicel Chemical Industries, Ltd.

  公开号：EP1172384A1

  公开（公告）日：2002-01-16

  A polymeric compound of the invention includes at least one monomer unit selected from the following formulae (I), (II), (III) and (IV): (wherein R1 is a hydrogen atom or a methyl group, R2 and R3 are each a hydrogen atom, a hydroxyl group or a -COOR4 group, where R4 is, e.g., a t-butyl group or a 2-tetrahydropyranyl group; R5 and R6 are each a hydrogen atom, a hydroxyl group or an oxo group; R7, R8 and R9 are each a hydrogen atom or a methyl group; R10 and R11 are each a hydrocarbon group having 1 to 8 carbon atoms; R12, R13 and R14 are each a hydrogen atom, a hydroxyl group or a methyl group, where if all of R12 to R14 are each a hydrogen atom or a hydroxyl group, R10 and R11 are not coincidentally methyl groups) [wherein, when the compound includes, for example, a monomer unit of Formula (III), the compound further includes at least one monomer unit selected from among, for example, a monomer unit represented by the following Formula (V): (wherein R15 and R16 are each a hydrogen atom, a hydroxyl group or a carboxyl group; R17 is a hydroxyl group, an oxo group or a carboxyl group; and R1 has the same meaning as defined above)]. This polymeric compound has high etching resistance, as well as satisfactory transparency, alkali-solubility and adhesion, and is therefore useful as a photoresist resin.

  本发明的聚合化合物包括至少一种选自下式 (I)、(II)、(III) 和 (IV) 的单体单元： (其中 R1 为氢原子或甲基，R2 和 R3 各为氢原子、羟基或-COOR4 基团，其中 R4 例如为R5和R6各自为氢原子、羟基或氧代基团；R7、R8和R9各自为氢原子或甲基；R10和R11各自为具有1至8个碳原子的烃基；R12、R13 和 R14 各为氢原子、羟基或甲基，其中如果所有 R12 至 R14 各为氢原子或羟基，则 R10 和 R11 不同时为甲基）[其中，当该化合物包括例如式（III）的单体单元时，该化合物进一步包括至少一个选自例如下式（V）所代表的单体单元的单体单元： (其中 R15 和 R16 各为氢原子、羟基或羧基；R17 为羟基、氧代基团或羧基；R1 的含义与上述定义相同）]。这种聚合化合物具有很高的抗蚀刻性，以及令人满意的透明度、碱溶解性和粘附性，因此可用作光阻树脂。
• US6440636B1
  申请人：——

  公开号：US6440636B1

  公开（公告）日：2002-08-27