Salt suitable for an acid generator and a chemically amplified resist composition containing the same
申请人:Harada Yukako
公开号:US20070100158A1
公开(公告)日:2007-05-03
The present invention provides a salt of the formula (I):
wherein ring X represents polycyclic hydrocarbon group having tricycle or more and having 10 to 30 carbon atoms, and one or more hydrogen atom in the ring X is optionally substituted with alkyl group having 1 to 6 carbon atoms, alkoxy group having 1 to 6 carbon atoms, perfluoroalkyl group having 1 to 4 carbon atoms or cyano group; Q
1
and Q
2
each independently represent fluorine atom or perfluoroalkyl group having 1 to 6 carbon atoms; n shows an integer of 1 to 12; and A
+
represents a cation selected from the group consist of a cation of the following formulae (IIa), (IIb) and (IIc):
The present invention also provides a chemically amplified resist composition comprising the salt of the formula (I).
The present invention provides a sulfonium salt of the formula (Ia)
a polymeric compound comprising a structural unit of the formula (Ib)
and a chemical amplification type positive resist composition comprising (A) an acid generator comprising at least one compound selected from the group consisting of a sulfonium salt of the formula (Ia), a polymeric compound comprising a structural unit of the formula (Ib), and a sulfonium salt of the formula (Ic); and
(B) resin which contains a structural unit having an acid labile group and which itself is insoluble or poorly soluble in an alkali aqueous solution but becomes soluble in an alkali aqueous solution by the action of an acid.
A metal-free direct trifluoromethylthiolation of sulfonium ylides with an electrophilic trifluoromethylthiolating reagent has been established, in which sulfonium salt or α-bromoacetic ester is employed as sulfonium ylide precursors. This trifluoromethylthiolation enables the straightforward construction of SCF3-substituted sulfonium ylides from a wide range of substrates, including ketones, esters
Photosensitive composition, compound for use in the photosensitive composition, and method of pattern formation with the photosensitive composition
申请人:FUJIFILM Corporation
公开号:US07449573B2
公开(公告)日:2008-11-11
A compound which generates a sulfonic acid having one or more —SO3H groups and one or more —SO2— bonds upon irradiation with an actinic ray or a radiation; a photosensitive composition containing the compound; and a method of pattern formation with the photosensitive composition.
Photoacid generator containing two kinds of sulfonium salt compound, chemically amplified resist containing the same and pattern transfer method
申请人:——
公开号:US20020182535A1
公开(公告)日:2002-12-05
A chemically amplified photo-resist contains a photoacid generator for changing the solubility of resin after exposure to 130-220 nanometer wavelength light, and the photoacid generator contains two kinds of sulfonium salt compound expressed by general formulae [1] and [2]
1
so that the chemically amplified photo-resist is improved in resolution, sensitivity and smoothness on side surfaces of a transferred pattern.