RESIST COMPOSITION, PATTERNING PROCESS AND POLYMER
申请人:SHIN-ETSU CHEMICAL CO., LTD.
公开号:US20140178820A1
公开(公告)日:2014-06-26
An additive polymer comprising recurring styrene units having an ester group bonded to a CF
3
—C(OR
2
)—R
3
group (wherein R
2
is H, acyl or acid labile group, R
3
is H, CH
3
or CF
3
) such as 1,1,1,3,3,3-hexafluoro-2-propanol is added to a polymer capable of increasing alkali solubility under the action of acid to formulate a resist composition. The resist composition can minimize outgassing from a resist film during the EUV lithography and form a resist film having a hydrophilic surface sufficient to prevent formation of blob defects on the film after development.
US9040223B2
申请人:——
公开号:US9040223B2
公开(公告)日:2015-05-26
US9760010B2
申请人:——
公开号:US9760010B2
公开(公告)日:2017-09-12
US9846360B2
申请人:——
公开号:US9846360B2
公开(公告)日:2017-12-19
Reppe et al., Justus Liebigs Annalen der Chemie, 1956, vol. 601, p. 81,104