1-[(Ethanesulfonyl)oxy]pyrrolidine-2,5-dione | 64297-51-4

• 分子结构分类: 有机化合物 - 有机杂环化合物 - 吡咯烷类
• 英文名称: 1-[(Ethanesulfonyl)oxy]pyrrolidine-2,5-dione
• 英文别名: (2,5-dioxopyrrolidin-1-yl) ethanesulfonate
• CAS: 64297-51-4
• 化学式: C₆H₉NO₅S
• 分子量: 207.21
• InChiKey: DGNVKGKDGJOTKD-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -0.9
• 重原子数：
  13
• 可旋转键数：
  3
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.67
• 拓扑面积：
  89.1
• 氢给体数：
  0
• 氢受体数：
  5

文献信息

• SALT AND PHOTORESIST COMPOSITION CONTAINING THE SAME
  申请人：Ichikawa Koji

  公开号：US20110014566A1

  公开（公告）日：2011-01-20

  A salt represented by the formula (I-Pa): wherein X pa represents a single bond or a C1-C4 alkylene group, R pa represents a single bond, a C4-C36 divalent alicyclic hydrocarbon group or a C6-C36 divalent aromatic hydrocarbon group, and one or more methylene groups in the divalent alicyclic hydrocarbon group can be replaced by —O— or —CO—, Y pa represents a polymerizable group, and Z pa+ represents an organic cation.

  由公式(I-Pa)表示的盐，其中Xpa代表单一键或C1-C4亚烷基团，Rpa代表单一键、C4-C36二价脂环烃基团或C6-C36二价芳香烃基团，且脂环烃基团中的一个或多个亚甲基基团可以被—O—或—CO—替换，Ypa代表可聚合团，Zpa+代表有机阳离子。
• Novel tertiary (meth)acrylates having lactone structure, polymers, resist compositions and patterning process
  申请人：Watanabe Takeru

  公开号：US20050250924A1

  公开（公告）日：2005-11-10

  Novel tertiary (meth)acrylate compounds having a lactone structure are polymerizable into polymers having improved transparency, especially at the exposure wavelength of an excimer laser and dry etching resistance. Resist compositions comprising the polymers are sensitive to high-energy radiation, have a high resolution, and lend themselves to micropatterning with electron beams or deep-UV rays.

  新型含有内酯结构的三元（甲基）丙烯酸酯化合物可聚合成具有改善透明度的聚合物，特别是在准分子激光的照射波长下以及干法刻蚀抗性方面。包括这些聚合物的抗蚀组合物对高能辐射敏感，具有高分辨率，并适用于电子束或深紫外线微图案化。
• Compositions and Methods Incorporating Photocatalysts
  申请人：Baker Ellen Schmidt

  公开号：US20090285768A1

  公开（公告）日：2009-11-19

  The various embodiments provide a composition including an active material having functional groups capable of covalent attachment to a substrate in the presence of an acid or a base, a photocatalyst capable of generating an acid or a base upon exposure to light, and a vehicle. The compositions may also include surfactants, emulsifiers, oxidants, and other components. A method for treating a substrate is also disclosed. The method includes the steps of applying at least one active material having functional groups to the substrate, applying a photocatalyst to the substrate, and exposing the photocatalyst and the at least one active material to light for forming covalent attachments between the functional groups and constituent groups on the substrate. The compositions and methods described herein are useful in personal care product and consumer care product applications, for example.

  各种实施例提供了一种组合物，包括具有在酸或碱存在下能够与基底共价结合的功能基团的活性材料，能够在光照下生成酸或碱的光催化剂，以及载体。该组合物还可以包括表面活性剂、乳化剂、氧化剂和其他组分。还公开了一种处理基底的方法。该方法包括将至少一种具有功能基团的活性材料应用于基底，将光催化剂应用于基底，并将光照射到光催化剂和至少一种活性材料，以形成功能基团与基底上的成分基团之间的共价结合。这里描述的组合物和方法在个人护理产品和消费者护理产品应用中是有用的。
• COATING COMPOSITION
  申请人：Houlihan Francis

  公开号：US20100119972A1

  公开（公告）日：2010-05-13

  Developable bottom antireflective coating compositions are provided.

  提供可开发底部防反射涂层组合物。
• RESIST UNDERLAYER FILM COMPOSITION, PATTERNING PROCESS, AND METHOD FOR FORMING RESIST UNDERLAYER FILM
  申请人：SHIN-ETSU CHEMICAL CO., LTD.

  公开号：US20180284615A1

  公开（公告）日：2018-10-04

  Provided is a resist underlayer film composition which is excellent in resistance to a basic hydrogen peroxide aqueous solution, in gap-filling and planarization characteristics, and in dry etching characteristic, wherein the resist underlayer film composition is used for a multilayer resist method, comprising: (A1) a polymer (1A) comprising one, or two or more, of a repeating unit represented by following general formula (1); (A2) one, or two or more, of a polyphenol compound having a formula weight of 2,000 or less and not having a 3,4-dihydroxy phenyl group; and (B) an organic solvent.

  提供了一种抗碱性过氧化氢水溶液、填孔和平坦化特性以及干法蚀刻特性优异的抗蚀底层膜组合物，该抗蚀底层膜组合物用于多层光刻方法，包括：（A1）聚合物（1A），其包括由以下通式（1）表示的重复单元中的一个或两个或多个；（A2）一种或两种或多种分子量不超过2000且不具有3,4-二羟基苯基的多酚化合物；和（B）有机溶剂。