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1,4-diaminoanthraquinone | 4458-37-1

中文名称
——
中文别名
——
英文名称
1,4-diaminoanthraquinone
英文别名
anthracene-1,4-diyldiamine;Anthracen-1,4-diyldiamin;1.4-Diamino-anthracen;Anthradiamin-(1.4);1,4-Anthracenediamine;anthracene-1,4-diamine
1,4-diaminoanthraquinone化学式
CAS
4458-37-1
化学式
C14H12N2
mdl
——
分子量
208.263
InChiKey
QYOFUVIUFNSMFM-UHFFFAOYSA-N
BEILSTEIN
——
EINECS
——
  • 物化性质
  • 计算性质
  • ADMET
  • 安全信息
  • SDS
  • 制备方法与用途
  • 上下游信息
  • 反应信息
  • 文献信息
  • 表征谱图
  • 同类化合物
  • 相关功能分类
  • 相关结构分类

物化性质

  • 沸点:
    469.0±25.0 °C(Predicted)
  • 密度:
    1.283±0.06 g/cm3(Predicted)

计算性质

  • 辛醇/水分配系数(LogP):
    3
  • 重原子数:
    16
  • 可旋转键数:
    0
  • 环数:
    3.0
  • sp3杂化的碳原子比例:
    0.0
  • 拓扑面积:
    52
  • 氢给体数:
    2
  • 氢受体数:
    2

反应信息

  • 作为产物:
    描述:
    alkaline earth salt of/the/ methylsulfuric acid 在 盐酸 作用下, 生成 1,4-diaminoanthraquinone
    参考文献:
    名称:
    Pisovschi, Chemische Berichte, 1908, vol. 41, p. 1435
    摘要:
    DOI:
点击查看最新优质反应信息

文献信息

  • BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, AND PATTERN FORMING METHOD AND ARTICLE USING THE PHOTOSENSITIVE RESIN COMPOSITION
    申请人:Katayama Mami
    公开号:US20110086311A1
    公开(公告)日:2011-04-14
    A photosensitive resin composition which is excellent in resolution, low in cost, and usable in a wide range of structures of polymer precursors each of which is reacted into a final product by a basic substance or by heating in the presence of a basic substance. The photosensitive resin composition includes a base generator which has a specific structure and generates a base by exposure to electromagnetic radiation and heating, and a polymer precursor which is reacted into a final product by the base generator and by a basic substance or by heating in the presence of a basic substance.
    一种光敏树脂组合物,具有分辨率优良、成本低廉和可用于一系列聚合物前体结构的特点,其中每种聚合物前体都可以通过碱性物质或在碱性物质的存在下加热反应成为最终产物。该光敏树脂组合物包括一种具有特定结构并通过电磁辐射和加热产生碱性物质的基发生剂,以及一种聚合物前体,该聚合物前体通过基发生剂和碱性物质或在碱性物质的存在下加热反应成为最终产物。
  • BASE GENERATOR, PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING MATERIAL COMPRISING THE PHOTOSENSITIVE RESIN COMPOSITION, PATTERN FORMING METHOD USING THE PHOTOSENSITIVE RESIN COMPOSITION AND PRODUCTS COMPRISING THE SAME
    申请人:Katayama Mami
    公开号:US20120070781A1
    公开(公告)日:2012-03-22
    An object of the present invention is to provide a base generator which has sensitivity and is applicable to a wide range of applications, and a photosensitive resin composition which is applicable to a wide range of applications due to the structure of a polymer precursor in which reaction into a final product is promoted by a basic substance or by heating in the presence of a basic substance. The base generator generates a base by exposure to electromagnetic radiation and heating. The photosensitive resin composition comprises a polymer precursor in which reaction into a final product is promoted by the base generator and a basic substance or by heating in the presence of a basic substance.
    本发明的目的是提供一种具有灵敏度并适用于广泛应用的基础发生器,以及一种光敏树脂组合物,由于聚合物前体的结构在碱性物质的促进下或在碱性物质存在下加热反应成最终产物,因此适用于广泛的应用范围。基础发生器通过电磁辐射和加热生成碱性物质。光敏树脂组合物包括聚合物前体,其在基础发生器和碱性物质的促进下或在碱性物质存在下加热反应成最终产物。
  • THIN FILM TRANSISTOR SUBSTRATE
    申请人:FUKUDA Shunji
    公开号:US20130126860A1
    公开(公告)日:2013-05-23
    A main object of the present invention is to provide a TFT substrate having excellent switching characteristics. The object is attained by providing a thin film transistor substrate comprising: a substrate, and a thin film transistor having an oxide semiconductor layer that is formed on the substrate and is formed from an oxide semiconductor, and a semiconductor layer-adjoining insulating layer formed to be in contact with the oxide semiconductor layer, wherein at least one semiconductor layer-adjoining insulating layer included in the thin film transistor is a photosensitive polyimide insulating layer formed by using a photosensitive polyimide resin composition.
    本发明的主要目的是提供一种具有优异开关特性的TFT基板。该目标通过提供一种薄膜晶体管基板来实现,该基板包括:基板和薄膜晶体管,所述薄膜晶体管具有在基板上形成的氧化物半导体层,该氧化物半导体层由氧化物半导体形成,并且与氧化物半导体层接触的半导体层相邻的绝缘层,其中,在薄膜晶体管中包括的至少一个半导体层相邻的绝缘层是使用光敏聚酰亚胺树脂组合物形成的光敏聚酰亚胺绝缘层来实现的。
  • Process for production of vinyl chloride polymer
    申请人:Shin-Etsu Chemical Co., Ltd.
    公开号:EP0172427A2
    公开(公告)日:1986-02-26
    This process is a process for production of a vinyl chloride polymer by suspension polymerization or emulsion polymerization of vinyl chloride monomer or a mixture of vinyl chloride monomer with a vinyl monomer copolymerizable with said vinyl chloride monomer in an aqueous medium, characterized in that the polymerization is carried out in a polymerizer, the inner wall surface and portions of the auxiliary equipment thereof which may come into contact with the monomer during polymerization being previously coated with a scaling preventive comprising at least one selected from dyes, pigments and aromatic or heterocyclic compounds having at least 5 conjugated π bonds, while controlling the chloride ion concentration in the reaction mixture to not higher than 100 ppm. According to said process, scaling onto the inner wall surface of a polymerizer, etc. during polymerization can be prevented effectively and surely.
    该工艺是通过氯乙烯单体或氯乙烯单体与可与所述氯乙烯单体共聚的乙烯基单体混合物在水介质中进行悬浮聚合或乳液聚合来生产氯乙烯聚合物的工艺,其特征在于聚合是在聚合器中进行的、内壁表面及其辅助设备中可能在聚合过程中与单体接触的部分事先涂上一层防垢剂,该防垢剂至少包括一种选自染料、颜料和至少有 5 个共轭 π 键的芳香族或杂环化合物的防垢剂,同时控制反应混合物中的氯离子浓度不高于 100 ppm。根据上述工艺,可有效、可靠地防止聚合过程中聚合器等内壁表面结垢。
  • Polymer scale preventive agent, polymerization vessel for preventing polymer scale deposition, and process of producing polymer using said vessel
    申请人:SHIN-ETSU CHEMICAL CO., LTD.
    公开号:EP0482593A1
    公开(公告)日:1992-04-29
    A polymer scale preventive agent for use in polymerization of a monomer having an ethylenic double bond, comprising (A) a nitrogen-containing organic compound having at least five continuous conjugated π bonds, (B) an anionic organic compound having at least one group selected from the group consisting of the sulfonic acid group and the carboxylic group and having at least five continuous conjugated π bonds, and (C) a vinylpyrrolidone-based polymer. The agent is used for forming a coating on the inner wall, etc. of a polymerization vessel. Deposition of polymer scale can be effectively prevented not only in the liquid phase area but also in the vicinity of the interface between the gas and liquid phases. Products formed from polymer obtained have very few fish eyes.
    一种聚合物防垢剂,用于具有乙烯双键的单体的聚合,包括:(A) 至少具有五个连续共轭 π 键的含氮有机化合物;(B) 至少具有一个从磺酸基和羧酸基组成的组中选出的基团且至少具有五个连续共轭 π 键的阴离子有机化合物;以及 (C) 乙烯基吡咯烷酮基聚合物。该剂用于在聚合容器的内壁等处形成涂层。不仅在液相区域,而且在气相和液相界面附近都能有效防止聚合物垢的沉积。由聚合物形成的产品很少有鱼眼。
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