NOVEL FLUOROPOLYMER HAVING ACID-REACTIVE GROUP AND CHEMICAL AMPLIFICATION TYPE PHOTORESIST COMPOSITION CONTAINING THE SAME
申请人:Daikin Industries, Ltd.
公开号:EP1275666A1
公开(公告)日:2003-01-15
There is provided a novel fluorine-containing polymer having an acid-reactive group which has a high transparency against energy rays (radioactive rays) in a vacuum ultraviolet region (157 nm), and further there are provided a material for fluorine-containing base polymer prepared from the polymer and suitable for a photoresist and a chemically amplifying type resist composition obtained therefrom.
The polymer has a number average molecular weight of from 1,000 to 1,000,000 and represented by the formula: -(M1)-(M2)-(A)-, wherein M1 is a structural unit having an acid-labile or acid-degradable functional group, M2 is a structural unit of fluorine-containing acryl ester, A is a structural unit derived from other copolymerizable monomer, the percent by mole ratio M1/M2 is 1 to 99/99 to 1 and the polymer comprises from 1 to 99 % by mole of the structural unit M1, from 1 to 99 % by mole of the structural unit M2 and from 0 to 98 % by mole of the structural unit A1. The material for fluorine-containing base polymer comprises a fluorine-containing polymer having an acid-reactive group such as the above-mentioned polymer and is suitable for a photoresist, and the chemically amplifying type resist composition is obtained from those polymer and material.
本发明提供了一种具有酸反应基团的新型含氟聚合物,该聚合物对真空紫外线区域(157 纳米)的能量射线(放射性射线)具有高透明度,此外还提供了一种由该聚合物制备的、适用于光刻胶的含氟基础聚合物材料,以及由该聚合物制备的化学放大型抗蚀剂组合物。
该聚合物的平均分子量为 1,000 到 1,000,000 之间,由式表示:-(M1)-(M2)-(A)-,其中 M1 是具有酸性或酸性可降解官能团的结构单元,M2 是含氟丙烯酸酯的结构单元,A 是来自其他可共聚单体的结构单元,M1/M2 的摩尔比为 1 至 99/99 至 1,聚合物包括 1 至 99 %(以摩尔计)的结构单元 M1、1 至 99 %(以摩尔计)的结构单元 M2 和 0 至 98 %(以摩尔计)的结构单元 A1。含氟基聚合物的材料包括具有酸反应基团的含氟聚合物,如上述聚合物,并适用于光刻胶,化学放大型抗蚀剂组合物由这些聚合物和材料获得。