Ethanol, 2-[[2-(2-aminoethoxy)ethyl]amino]- | 91598-32-2

• 分子结构分类: 有机化合物 - 有机氮化合物
• 英文名称: Ethanol, 2-[[2-(2-aminoethoxy)ethyl]amino]-
• 英文别名: 2-[2-(2-aminoethoxy)ethylamino]ethanol
• CAS: 91598-32-2
• 化学式: C₆H₁₆N₂O₂
• mdl: MFCD19214619
• 分子量: 148.2
• InChiKey: MBWAKTVBXOPVNZ-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  -2
• 重原子数：
  10
• 可旋转键数：
  7
• 环数：
  0.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  67.5
• 氢给体数：
  3
• 氢受体数：
  4

反应信息

• 作为产物：
  描述：

  2,2'-氧双(乙胺) 、 环氧乙烷 生成 Ethanol, 2-[[2-(2-aminoethoxy)ethyl]amino]-
  参考文献：
  名称：

  WADDILL, H. G.;ZIMMERMAN, R. L.

  摘要：

  DOI：

文献信息

• [EN] NOVEL IMIDAZOPYRAZINE DERIVATIVES<br/>[FR] NOUVEAUX DÉRIVÉS D'IMIDAZOPYRAZINE
  申请人：HOFFMANN LA ROCHE

  公开号：WO2020126954A1

  公开（公告）日：2020-06-25

  The invention provides novel imidazopyrazine derivatives having the general formula (I), wherein A and R1 to R11 are as described herein (I) and pharmaceutically acceptable salts thereof. Further provided are pharmaceutical compositions including the compounds, processes of manufacturing the compounds and methods of using the compounds as medicaments, in particular methods of using the compounds as antibiotics for the treatment or prevention of bacterial infections and related diseases.

  该发明提供了具有通式（I）的新型咪唑吡嗪衍生物，其中A和R1至R11如本文所述（I），以及其药学上可接受的盐。还提供了包括这些化合物的药物组合物、制造这些化合物的方法以及将这些化合物用作药物的方法，特别是将这些化合物用作抗生素治疗或预防细菌感染和相关疾病的方法。
• Selective cellular targeting: multifunctional delivery vehicles, multifunctional prodrugs, use as antineoplastic drugs
  申请人：Drug Innovation & Design, Inc.

  公开号：US20030138432A1

  公开（公告）日：2003-07-24

  The present invention relates to the compositions, methods, and applications of a novel approach to selective cellular targeting. The purpose of this invention is to enable the selective delivery and/or selective activation of effector molecules to target cells for diagnostic or therapeutic purposes. The present invention relates to multi-functional prodrugs or targeting vehicles wherein each functionality is capable of enhancing targeting selectivity, affinity, intracellular transport, activation or detoxification. The present invention also relates to ultra-low dose, multiple target, multiple drug chemotherapy and targeted immunotherapy for cancer treatment.

  本发明涉及一种新的选择性细胞靶向的组合物、方法和应用。本发明的目的是为了实现对目标细胞的选择性输送和/或选择性激活效应分子，以进行诊断或治疗。本发明涉及多功能前药或靶向载体，其中每个功能都能增强靶向选择性、亲和力、细胞内转运、激活或解毒。本发明还涉及超低剂量、多靶点、多药物化疗和靶向免疫疗法，用于癌症治疗。
• Cleaning composition for post-etch or post ash residue removal from a semiconductor substrate and corresponding manufacturing process
  申请人：BASF SE

  公开号：US11377624B2

  公开（公告）日：2022-07-05

  A cleaning composition for post-etch or post ash residue removal from a substrate used in semiconductor industry and a corresponding use of said cleaning composition is described. Further described is a process for the manufacture of a semiconductor device from a semiconductor substrate, comprising the step of post-etch or post ash residue removal from a substrate by contacting the substrate with a cleaning composition according to the invention.

  本发明描述了一种用于清除半导体工业中基底上的蚀刻后或灰烬后残留物的清洁组合物，以及所述清洁组合物的相应用途。进一步描述了一种利用半导体衬底制造半导体器件的工艺，包括通过将衬底与根据本发明的清洁组合物接触来去除衬底上的蚀刻后或灰烬后残留物的步骤。
• Semiconductor process residue removal composition and process
  申请人：——

  公开号：US20030228990A1

  公开（公告）日：2003-12-11

  A residue remover for removing polymeric material and etch residue includes 2-(2-aminoethylamino)-ethanol and optionally another two-carbon atom linkage alkanolamine compound, gallic acid or catechol, water, a polar organic solvent, and hydroxylamine. A process for removing photoresist or other residue from a substrate, such as an integrated circuit semiconductor wafer including titanium metallurgy, includes the steps of contacting the substrate with the above composition for a time and at a temperature sufficient to remove the photoresist or other residue from the substrate. Use of 2-(2-aminoethylamino)-ethanol in the composition and process provides superior residue removal without attacking titanium or other metallurgy on the substrate. The composition preferably has a flash point greater than about 130° C.

  一种用于去除聚合物材料和蚀刻残留物的残留物去除剂包括 2-(2-氨基乙基氨基)-乙醇和可选的另一种双碳原子连接的烷醇胺化合物、没食子酸或儿茶酚、水、极性有机溶剂和羟胺。从基底（如包括钛冶金的集成电路半导体晶片）上去除光阻或其他残留物的工艺包括以下步骤：在足以从基底上去除光阻或其他残留物的时间和温度下，将基底与上述组合物接触。在组合物和工艺中使用 2-（2-氨基乙基氨基）-乙醇，可以在不破坏基底上的钛或其他金属的情况下，出色地去除残留物。组合物的闪点最好高于约 130 摄氏度。
• Abrasive-free chemical mechanical polishing composition and polishing process containing same
  申请人：——

  公开号：US20040134873A1

  公开（公告）日：2004-07-15

  The present invention relates generally to a chemical mechanical polishing composition for polishing a metal, a metal oxide, and/or a metal nitride layer of a substrate, which composition is substantially free of abrasive particles and comprises: a hydroxylamine derivative; a corrosion inhibitor; and water, wherein water comprises the majority of the composition. The composition may optionally include, or alternately be substantially free from, one or more of the following: hydroxylamine, acid and/or base to adjust pH, two carbon atom linkage alkanolamine compounds, quaternary ammonium salts, chelating agents, organic solvents, non-hydroxyl-containing amine compounds, surfactants, additional oxidizing agents, and non-abrasive additives. A process for chemically mechanically polishing a substrate using such a polishing composition is also provided herein.

  本发明一般涉及一种化学机械抛光组合物，用于抛光基底的金属、金属氧化物和/或金属氮化物层，该组合物基本上不含研磨颗粒，包括：羟胺衍生物；腐蚀抑制剂；水，其中水占组合物的大部分。该组合物可选择性地包括或基本上不包括以下一种或多种：羟胺、调节 pH 值的酸和/或碱、两个碳原子连接的烷醇胺化合物、季铵盐、螯合剂、有机溶剂、非含羟胺化合物、表面活性剂、附加氧化剂和非研磨添加剂。本文还提供了一种使用这种抛光组合物对基底进行化学机械抛光的工艺。