4-dimethylamino-3-iodo-benzoic acid | 98952-63-7

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 英文名称: 4-dimethylamino-3-iodo-benzoic acid
• 英文别名: 4-Dimethylamino-3-jod-benzoesaeure；4-(Dimethylamino)-3-iodobenzoic acid
• CAS: 98952-63-7
• 化学式: C₉H₁₀INO₂
• 分子量: 291.088
• InChiKey: SIBQOMKKIJDSDW-UHFFFAOYSA-N

物化性质

• 熔点：
  190-191 °C(Solv: ethanol (64-17-5))
• 沸点：
  376.9±37.0 °C(Predicted)
• 密度：
  1.796±0.06 g/cm3(Predicted)

计算性质

• 辛醇/水分配系数(LogP)：
  2.2
• 重原子数：
  13
• 可旋转键数：
  2
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.22
• 拓扑面积：
  40.5
• 氢给体数：
  1
• 氢受体数：
  3

反应信息

• 作为产物：
  描述：

  4-(methoxycarbonyl)-2-nitro-N,N-dimethylaniline 在 盐酸 、 tin 作用下， 生成 4-dimethylamino-3-iodo-benzoic acid
  参考文献：
  名称：

  Reverdin, Chemische Berichte, 1907, vol. 40, p. 3690

  摘要：

  DOI：

文献信息

• Resist composition and patterning process
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US10295904B2

  公开（公告）日：2019-05-21

  A resist composition comprising a base polymer and a sulfonium salt of iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.

  抗蚀剂组合物由基质聚合物和碘化苯甲酸锍盐组成，具有高灵敏度和最小 LWR，与正负色调无关。
• Roushdi; El Sebai, 1958, vol. 40, # 12, p. 83
  作者：Roushdi、El Sebai

  DOI：——

  日期：——
• RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20170351177A1

  公开（公告）日：2017-12-07

  A resist composition comprising a base polymer and a sulfonium salt of iodized benzoic acid offers a high sensitivity and minimal LWR independent of whether it is of positive or negative tone.
• POSITIVE RESIST COMPOSITION AND PATTERNING PROCESS
  申请人：Shin-Etsu Chemical Co., Ltd.

  公开号：US20200241418A1

  公开（公告）日：2020-07-30

  A positive resist composition comprising a base polymer comprising recurring units (a) having the structure of an ammonium salt of a carboxylic acid having an iodized or brominated aromatic ring exhibits a high sensitivity, high resolution, low edge roughness (LER, LWR) and small size variation, and forms a pattern of good profile after exposure and development.
• RADIATION-SENSITIVE RESIN COMPOSITION, AND METHOD FOR FORMING PATTERN
  申请人：JSR CORPORATION

  公开号：US20220299875A1

  公开（公告）日：2022-09-22

  A radiation-sensitive resin composition includes: a resin including a structural unit represented by formula (1); and a solvent containing propylene glycol monomethyl ether and alkyl lactate. The solvent does not contain propylene glycol monomethyl ether acetate or contains propylene glycol monomethyl ether acetate in a content of 5% by mass or less in the solvent. The radiation-sensitive resin composition further includes a radiation-sensitive acid generator, or the resin further includes a structural unit having a radiation-sensitive acid generating structure. In the formula (1), R T is a hydrogen atom, a fluorine atom, a methyl group, or a trifluoromethyl group. R X is a monovalent hydrocarbon group having 1 to 20 carbon atoms. Cy represents an alicyclic structure having 3 to 20 ring members formed together with the carbon atom to which Cy is bonded.