1,3-dibromo adamantane | 34341-85-0

• 分子结构分类: 有机化合物 - 有机卤素化合物 - 有机溴化物
• 英文名称: 1,3-dibromo adamantane
• 英文别名: 2,4-(diaxial)-Dibromadamantan；2,4-(diequatorial)-Dibromadamantan；2,4-(axial, equatorial)-Dibromadamantan；2,4-Dibromoadamantane
• CAS: 34341-85-0
• 化学式: C₁₀H₁₄Br₂
• 分子量: 294.029
• InChiKey: JMUHFZKGEKKJLY-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.7
• 重原子数：
  12
• 可旋转键数：
  0
• 环数：
  4.0
• sp3杂化的碳原子比例：
  1.0
• 拓扑面积：
  0
• 氢给体数：
  0
• 氢受体数：
  0

文献信息

• Process for producing oxygen-bearing compound
  申请人：Yamanaka Ichiro

  公开号：US20060235245A1

  公开（公告）日：2006-10-19

  Provided is a process for industrially advantageously producing an oxygen-bearing compound (e.g., an alcohol, a diol, a polyol, or a ketone) through oxidation of an alkane or an alcohol, which process requires no treatment for separation/removal of a catalyst and causes no equipment corrosion. Specifically, there are provided a process for producing an oxygen-bearing compound, including oxidizing an alkane in the presence of a catalyst containing at least one element selected from among transition metal elements belonging to Groups 5 and 8 to 10 of the periodic table, wherein the oxygen-bearing compound is an alcohol, a diol, a polyol, or a ketone; and a process for producing an oxygen-bearing compound, including oxidizing an alcohol in the presence of a catalyst containing at least one element selected from among transition metal elements belonging to Groups 5 and 8 to 10 of the periodic table, wherein the oxygen-bearing compound is a diol, a polyol, or a ketone.

  提供的是一种工业上有利的生产含氧化合物（例如醇、二醇、多元醇或酮）的过程，通过氧化烷烃或醇来实现，该过程无需进行催化剂的分离/去除处理，也不会导致设备腐蚀。具体来说，提供了一种生产含氧化合物的过程，包括在催化剂的存在下氧化烷烃，所述催化剂含有周期表5、8至10族过渡金属元素中至少一种元素，其中所述含氧化合物为醇、二醇、多元醇或酮；以及一种生产含氧化合物的过程，包括在催化剂的存在下氧化醇，所述催化剂含有周期表5、8至10族过渡金属元素中至少一种元素，其中所述含氧化合物为二醇、多元醇或酮。
• Coating solution for forming insulating film
  申请人：SUMITOMO CHEMICAL COMPANY, LIMITED

  公开号：US20030143332A1

  公开（公告）日：2003-07-31

  An object of the present invention is to provide a coating solution which is capable of forming an insulating film exhibiting a low dielectric constant and superior insulating performance. The object is achieved by a coating solution for forming insulating film comprising at least one selected from the group consisting of a compound represented by the formula (1) and a resin resulting from polymerization of the compound of the formula (1). 1

  本发明的一个目的是提供一种能够形成具有低介电常数和优越绝缘性能的绝缘膜的涂层溶液。该目的通过一种用于形成绝缘膜的涂层溶液实现，所述涂层溶液包括至少选自以下群组中的一种的化合物，该群组由式（1）表示的化合物和由式（1）的化合物聚合而成的树脂。
• Benzoxazole Resin Precursor, Polybenzoxazole Resin, Resin Film And Semiconductor Device
  申请人：Enoki Takashi

  公开号：US20080206548A1

  公开（公告）日：2008-08-28

  A benzoxazole resin precursor comprising a first repeating unit which is obtained by the reaction of a bisaminophenol compound and a dicarboxylic acid compound, at least one of which has the diamondoid structure; a benzoxazole resin precursor further comprising a second repeating unit which is obtained by the reaction of a bisaminophenol compound having no diamondoid structure and a dicarboxylic acid compound having no diamondoid structure; a polybenzoxazole resin obtained by the ring-closing reaction with dehydration of the above benzoxazole resin precursor; a resin film constituted with the benzoxazole resin precursor or the polybenzoxazole resin. A polybenzoxazole resin and a resin film having excellent heat resistance and a small permittivity and a semiconductor device using the resin film can be obtained from the benzoxazole resin precursor.

  一种苯并噁唑树脂前体，包括第一重复单元，该单元由双氨基酚化合物和二羧酸化合物反应得到，其中至少一个具有金刚烷结构；一种苯并噁唑树脂前体，进一步包括第二重复单元，该单元由不具有金刚烷结构的双氨基酚化合物和不具有金刚烷结构的二羧酸化合物反应得到；通过上述苯并噁唑树脂前体的环合反应和脱水反应得到的聚苯并噁唑树脂；由苯并噁唑树脂前体或聚苯并噁唑树脂构成的树脂膜。可以从苯并噁唑树脂前体中获得具有优异耐热性和小介电常数的聚苯并噁唑树脂和树脂膜，以及使用树脂膜的半导体器件。
• Invention Concerning Aminoadamantane Compounds
  申请人：Schreiner Peter R.

  公开号：US20080275112A1

  公开（公告）日：2008-11-06

  The present invention describes 1-aminoadamantane derivatives and 3-aminoadamantane-1-carboxylic derivatives in which the 5- or 7-position of the basic adamantane structure can be optionally substituted, methods for the production of the compounds based on the present invention, and methods for the coupling of the monomeric 3-aminoadamantane-1-carboxylic derivatives thus obtained to oligomers. The compounds based on the present invention are suitable for the utilisation as antiviral active ingredients, artificial ion channels, as well as for the therapy, diagnostics and prophylaxis of diseases in which a dysfunction of the GABA system occurs.

  本发明描述了1-氨基金刚烷衍生物和3-氨基金刚烷-1-羧酸衍生物，其中基本金刚烷结构的5-或7-位可以选择性地被取代，基于本发明的化合物的制备方法，以及将单体3-氨基金刚烷-1-羧酸衍生物耦合到寡聚体的方法。基于本发明的化合物适用于作为抗病毒活性成分、人工离子通道，以及治疗、诊断和预防GABA系统功能障碍性疾病。
• POLYMER FOR FORMING INSULATING FILM, COMPOSITION FOR FORMING INSULATING FILM, INSULATING FILM, AND ELECTRONIC DEVICE HAVING SAME
  申请人：SANO Yohko

  公开号：US20100130672A1

  公开（公告）日：2010-05-27

  A polymer and composition useful in forming an insulating film provided with a low permittivity, a high heat resistance, and a high mechanical strength and an insulating film obtained from these and an electronic device having the same are provided. The polymer for forming an insulating film according to the present invention is characterized by being obtained by polymerizing a reactive compound represented by Formula (1). The insulating film according to the present invention is formed using a composition for forming an insulating film including that polymer, has molecular spaces having an average space size of 0.7 nm to 5 nm, and has a permittivity of 2.3 or less. The electronic device according to the present invention has the insulating film. (wherein R 1 , R 2 , and R 3 are the same or different from each other and respectively represent an organic group having a ring structure; X and Y are the same or different from each other and respectively represent an aromatic organic group having a reactive group; and n represents 0 or 1).

  本发明提供了一种聚合物和组合物，用于形成具有低介电常数、高耐热性和高机械强度的绝缘膜，以及由此获得的绝缘膜和具有相同绝缘膜的电子设备。根据本发明，用于形成绝缘膜的聚合物的特点在于通过聚合由式（1）表示的反应性化合物获得。根据本发明，使用包括该聚合物的形成绝缘膜的组合物形成绝缘膜，具有平均空间尺寸为0.7nm至5nm的分子空间，并具有介电常数小于2.3。根据本发明的电子设备具有该绝缘膜。（其中，R1、R2和R3彼此相同或不同，分别表示具有环状结构的有机基团；X和Y彼此相同或不同，分别表示具有反应性基团的芳香有机基团；n表示0或1）。