2-甲基-丁酸 1-苯基乙基酯 | 87708-44-9

• 分子结构分类: 有机化合物 - 苯类化合物 - 苯和取代衍生物
• 中文名称: 2-甲基-丁酸 1-苯基乙基酯
• 中文别名: 2-甲基-丁酸1-苯基乙基酯；苯丁酸,b-[[(9H-芴-9-基甲氧基)羰基]氨基]-2-氟-,(bR)-
• 英文名称: (R)-1-phenylethyl-(S)-2-methylbutanoate
• 英文别名: 1-Phenylethyl 2-methylbutanoate；Phenylethyl 2-methylbutanoate；Phenylethyl 2-methylbutyrate；1-Phenylethyl 2-methylbutyrate
• CAS: 87708-44-9
• 化学式: C₁₃H₁₈O₂
• 分子量: 206.285
• InChiKey: KOQHMJIFZXCPNR-UHFFFAOYSA-N

计算性质

• 辛醇/水分配系数(LogP)：
  3.4
• 重原子数：
  15
• 可旋转键数：
  5
• 环数：
  1.0
• sp3杂化的碳原子比例：
  0.46
• 拓扑面积：
  26.3
• 氢给体数：
  0
• 氢受体数：
  2

文献信息

• BITTER TASTE MODIFIERS INCLUDING SUBSTITUTED 1-BENZYL-3-(1-(ISOXAZOL-4-YLMETHYL)-1H-PYRAZOL-4-YL)IMIDAZOLIDINE-2,4-DIONES AND COMPOSITIONS THEREOF
  申请人：SENOMYX, INC.

  公开号：US20160376263A1

  公开（公告）日：2016-12-29

  The present invention includes compounds and compositions known to modify the perception of bitter taste, and combinations of said compositions and compounds with additional compositions, compounds, and products. Exemplary compositions comprise one or more of the following: cooling agents; inactive drug ingredients; active pharmaceutical ingredients; food additives or foodstuffs; flavorants, or flavor enhancers; food or beverage products; bitter compounds; sweeteners; bitterants; sour flavorants; salty flavorants; umami flavorants; plant or animal products; compounds known to be used in pet care products; compounds known to be used in personal care products; compounds known to be used in home products; pharmaceutical preparations; topical preparations; cannabis-derived or cannabis-related products; compounds known to be used in oral care products; beverages; scents, perfumes, or odorants; compounds known to be used in consumer products; silicone compounds; abrasives; surfactants; warming agents; smoking articles; fats, oils, or emulsions; and/or probiotic bacteria or supplements.

  本发明涵盖已知用于改变苦味感知的化合物和组合物，以及所述组合物和化合物与额外的组合物、化合物和产品的组合。示例组合物包括以下一种或多种：冷却剂；无活性药物成分；活性药用成分；食品添加剂或食品；调味剂或调味增强剂；食品或饮料产品；苦味化合物；甜味剂；苦味剂；酸味调味剂；咸味调味剂；鲜味调味剂；植物或动物产品；已知用于宠物护理产品中的化合物；已知用于个人护理产品中的化合物；已知用于家用产品中的化合物；制药制剂；局部制剂；大麻衍生或与大麻相关的产品；已知用于口腔护理产品中的化合物；饮料；香味、香水或除臭剂；已知用于消费品中的化合物；硅化合物；磨料；表面活性剂；发热剂；吸烟物品；脂肪、油脂或乳化剂；和/或益生菌或补充剂。
• [EN] 4-HEPTEN-2-YL SALICYLATE AND ITS USE AS FRAGRANCE INGREDIENT<br/>[FR] 4-HEPTENE-2-YLE SALICYLATE ET SON UTILISATION COMME AGENT PARFUMANT
  申请人：GIVAUDAN SA

  公开号：WO2006007755A1

  公开（公告）日：2006-01-26

  The present invention is related to 4-hepten-2-yl salicylate and its use as fragrance ingredient.

  本发明涉及4-庚烯-2-基水杨酸酯及其作为香料成分的用途。
• COMPOUNDS USEFUL AS MODULATORS OF TRPM8
  申请人：Senomyx, Inc.

  公开号：US20170096418A1

  公开（公告）日：2017-04-06

  The present disclosure relates to compounds which are useful as cooling sensation compounds.

  本公开涉及作为冷感化合物有用的化合物。
• RESIST COMPOSITION CONTAINING NOVEL SULFONIUM COMPOUND, PATTERN-FORMING METHOD USING THE RESIST COMPOSITION, AND NOVEL SULFONIUM COMPOUND
  申请人：KAMIMURA Sou

  公开号：US20090042124A1

  公开（公告）日：2009-02-12

  A resist composition includes (A) a compound represented by the following formula (I): wherein each of R 1 to R 13 independently represents a hydrogen atom or a substituent, provided that at least one of R 1 to R 13 is a substituent containing an alcoholic hydroxyl group; Z represents a single bond or a divalent linking group; and X − represents an anion containing a proton acceptor functional group.

  一种抗性组合物包括(A)由以下公式（I）所代表的化合物：其中R1至R13中的每一个独立地代表氢原子或取代基，前提是R1至R13中至少有一个是含有醇羟基的取代基；Z代表单键或二价连接基团；X-代表含有质子受体功能基团的阴离子。
• COMPOUND, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, RESIST FILM, AND PATTERN FORMATION METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE USING SAME, AND ELECTRONIC DEVICE
  申请人：FUJIFILM CORPORATION

  公开号：US20160024005A1

  公开（公告）日：2016-01-28

  There is provided an actinic ray-sensitive or radiation-sensitive resin composition containing a compound represented by the following formula (1) or (2), and the formula (1) and (2) are defined as herein, and a resist film comprising the actinic ray-sensitive or radiation-sensitive resin composition, and a pattern forming method comprising a step of exposing the resist film, and a step of developing the exposed film, and a method for manufacturing an electronic device, comprising the pattern forming method, and an electronic device manufactured by the manufacturing method of an electronic device.

  提供了一种包含下列式子（1）或（2）所代表的化合物的光致射线敏感或辐射敏感的树脂组合物，其中式（1）和（2）的定义如本文所述，以及包括该光致射线敏感或辐射敏感的树脂组合物的光阻膜，以及包括曝光光阻膜的步骤和显影曝光膜的步骤的图案形成方法，以及包括图案形成方法的制造电子装置的方法，以及由电子装置的制造方法制造的电子装置。